13465-71-9Relevant articles and documents
Etching silicon with HF-HNO3-H2SO4/H 2O mixtures- unprecedented formation of trifluorosilane, hexafluorodisiloxane, and Si-F surface groups
Lippold, Marcus,Boehme, Uwe,Gondek, Christoph,Kronstein, Martin,Patzig-Klein, Sebastian,Weser, Martin,Kroke, Edwin
, p. 5714 - 5721 (2013/02/25)
The etching behaviour of sulfuric-acid-containing HF-HNO3 solutions towards crystalline silicon surfaces has been studied over a wide range of H2SO4 concentrations. For mixtures with low sulfuric acid concentration, NO2/N2O4, N 2O3, NO and N2O have been detected by means of FTIR spectroscopy. Increasing concentrations of nitric acid lead to high etching rates and to an enhanced formation of NO2/N2O 4. Different products were observed for the etching of silicon with sulfuric-acid-rich mixtures [c(H2SO4) > 13 mol L -1]. Trifluorosilane and hexafluorodisiloxane were identified by FTIR spectroscopy as additional reaction products. In contrast to the commonly accepted wet chemical etching mechanism, the formation of trifluorosilane is not accompanied by the formation of molecular hydrogen (according to Raman spectroscopy). Thermodynamic calculations and direct reactions of F 3SiH with the etching solution support an intermediate oxidation of trifluorosilane and the formation of hexafluorodisiloxane. The etched silicon surfaces were investigated by diffuse reflection FTIR and X-ray photoelectron spectroscopy (XPS). Surprisingly, no SiH terminations were observed after etching in sulfuric-acid-rich mixtures. Instead, a fluorine-terminated surface was found.
Synthesis and Properties of Trimethyl(trifluorosilyl)stannane
D'Errico, John,Sharp, Kenneth G.
, p. 1879 - 1882 (2007/10/02)
Trimethyltin hydride reacts with SiF3SiF3 or SiF3SiF2H to give the new compound SnMe3(SiF3) in 75-80 percent yield.No reaction was observed between SnMe3H and SiF3SiH3.Hydrogen-deuterium exchange was observed between tin and silicon during the course of deuterium-labelling experiments.Dimethylstannylene (SnMe2) was implicated as an intermediate by trapping experiments in the thermolysis of SnMe3(SiF3).
