bis[(dimethyl(benzyl)silyl)methyl]tin dichloride

Base Information

Chemical Name:bis[(dimethyl(benzyl)silyl)methyl]tin dichloride
CAS No.:1322150-93-5
Molecular Formula:C₂₀H₃₀Cl₂Si₂Sn
Molecular Weight:516.245
Hs Code.:

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Business phase:: The product has achieved commercial mass production^*data from LookChem market partment

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Chemical Property of bis[(dimethyl(benzyl)silyl)methyl]tin dichloride

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Technology Process of bis[(dimethyl(benzyl)silyl)methyl]tin dichloride

There total 1 articles about bis[(dimethyl(benzyl)silyl)methyl]tin dichloride which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield:

: 7646-78-8
tin(IV) chloride

: 7439-95-4
magnesium

: 77861-50-8
benzyl(bromomethyl)dimethylsilane

: 215363-09-0
tris[(benzyldimethylsilyl)methylene]tin chloride

: 1322150-93-5
bis[(dimethyl(benzyl)silyl)methyl]tin dichloride

Guidance literature:: In diethyl ether; benzene; Ar, Et2O soln. of ligand (0.0217 mmol) added to Mg turnings in Et2O, mixt. stirred for 15 h at room temp., benzene soln. of SnCl4 (0.088 mmol) added dropwise at 0°C, mixt. stirred at room temp. for 1 h, refluxed for 4 h; cooled to room temp., treated with satd. aq. NH4Cl, org. layer septd., aq. layer washed (Et2O), combined org. soln. dried (MgSO4), evapd., chromd. (SiO2, 30% ethylacetate in n-hexane), elem. anal.;
DOI:10.1016/j.jorganchem.2011.05.011

Reference yield: 93.0%

: 215363-09-0
tris[(benzyldimethylsilyl)methylene]tin chloride

: 1322150-93-5
bis[(dimethyl(benzyl)silyl)methyl]tin dichloride

: 1310-73-2
sodium hydroxide

: hexakis[(dimethyl(benzyl)silyl)methyl]distannoxane

Guidance literature:: In diethyl ether; water; Et2O soln. of Sn compd. treated with aq. NaOH, stirred for 30 min at room temp.; org. layer washed (aq. NaOH, H2O), dried (MgSO4), evapd., dissolved (n-hexane), treated (Al2O3), evapd. (vac.);
DOI:10.1016/j.jorganchem.2011.05.011