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Methyldifluorosilane (CH3SiF3) is a colorless, volatile, and highly toxic chemical compound belonging to the family of organosilicon compounds. It is composed of one carbon atom, one silicon atom, and three fluorine atoms, with the molecular formula CH3SiF3. Methyldifluorosilane is primarily used in the production of various silicon-based materials, such as electronic-grade silicon and specialty glass, due to its ability to react with other chemicals to form these materials. It is also employed as a precursor in the synthesis of other organosilicon compounds. Due to its hazardous nature, it requires careful handling and storage to prevent exposure and potential health risks.

420-34-8

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420-34-8 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 420-34-8 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 4,2 and 0 respectively; the second part has 2 digits, 3 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 420-34:
(5*4)+(4*2)+(3*0)+(2*3)+(1*4)=38
38 % 10 = 8
So 420-34-8 is a valid CAS Registry Number.
InChI:InChI=1/CH4F2Si/c2-1(3)4/h1H,4H3

420-34-8SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 14, 2017

Revision Date: Aug 14, 2017

1.Identification

1.1 GHS Product identifier

Product name difluoro(methyl)silicon

1.2 Other means of identification

Product number -
Other names methyl difluorosilane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:420-34-8 SDS

420-34-8Relevant academic research and scientific papers

The synthesis and properties of (CH2F)SiH3 and related monofluoromethylsilanes

Buerger, H.,Moritz, P.

, p. 293 - 308 (2007/10/02)

The reduction of (CFCl2)SiCl3 by LiAlH4, Me3SnH, and (nBu)3SnH has been studied.The compound (CH2F)SiH3 (I) and all the compounds of the series (CFCl2-mHm)SiCl3-nHn, m = 0, 1 and n = 0-3 were detected and characterized by NMR spectroscopy.Conditions for the synthesis of I, (CHFCl)SiH3 (IX) and (CFCl2)SiH3 (V) with acceptable yields have been optimized.These novel compounds were studied by 1H, 19F, 13C and 29Si NMR spectroscopy; their infrared and Raman spectra were recorded and assigned with the assistance of a normal coordinate analysis of 1 and its isotopomer (CD2F)SiD3.The thermolyses of I, IX and (CHF2)SiH3 (X) which start at about 120, 200 and 180 deg C, respectively, have been studied.Whereas I decomposes by a migration of F from C to Si, compound X undergoes elimination of the carbene CHF, insertion of which into SiH bonds ultimately gives CH3Si derivatives.

Thermolysis of trifluoromethylsilanes. Novel fluoromethylsilanes by insertion of CF2 and CHF into Si-H bonds

Beckers, H.,Buerger, H.

, p. 207 - 219 (2007/10/02)

The thermal decomposition in the gas phase of CF3SiH3 and (CF3)2SiH2 begins at ca. 200 and ca. 100 deg C, respectively.It is catalyzed by KF, and involves as initial step a clean CF2 elimination with an α-fluorine shift.Reactive species such as HBr trap CF2 quantitatively (to give in this case CHF2Br), while addition to the less reactive cyclohexene (to give 7,7-difluorobicycloheptane) is accompanied by secondary reactions.These dominate in the absence of an efficient CF2 trapping agent, and spectroscopic product analyses reveal that they mainly arise from insertion of the carbenes CHnF(2-n) into Si-H bonds followed by CH(n+1)F(1-n) elimination (n = 0, 1).This sequence corresponds to H/F exchange at the Si atom.Insertion of CF2 (generated by thermolysis of CF3SiF3 below 100 deg C) into an Si-H bond of H3SiF to give CHF2SiH2F in good yield is the first example of such a reaction and demonstrates its usefulness for the selective synthesis of CHF2Si compounds.In addition, some dismutation of SiHnF(3-n) moieties accompanies the carbene elimination/insertion reactions and the resulting novel fluoromethylsilanes were characterized by 1H and 19F NMR and (in part) IR spectroscopy.The synthesis of (CF3)2SiHBr by cleavage of (CF3)2Si(H)N(i-Pr)2 with BBr3 and its conversion with LiAlH4 to (CF3)2SiH2 are reported.The mechanism of the CF2/SiH insertion reaction is discussed.

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