Welcome to LookChem.com Sign In|Join Free

CAS

  • or

13587-51-4

Post Buying Request

13587-51-4 Suppliers

Recommended suppliersmore

  • Product
  • FOB Price
  • Min.Order
  • Supply Ability
  • Supplier
  • Contact Supplier

13587-51-4 Usage

General Description

[2H]silane, also known as deuterated silane, is a chemical compound that is composed of one silicon atom and four deuterium atoms. It is a heavy isotope of the more commonly occurring compound, silane (SiH4), in which the hydrogen atoms are replaced by deuterium. Deuterium is a stable, non-radioactive isotope of hydrogen that has a higher atomic mass. [2H]silane is often used in research and industrial applications as a source of deuterium in various chemical reactions. Its heavy isotopic composition can cause differences in the physical and chemical properties of compounds in which it is incorporated, making it useful for certain experimental and analytical purposes. Additionally, [2H]silane is also used in the production of specialized materials and chemicals, such as deuterated silicon compounds and semiconductors.

Check Digit Verification of cas no

The CAS Registry Mumber 13587-51-4 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,3,5,8 and 7 respectively; the second part has 2 digits, 5 and 1 respectively.
Calculate Digit Verification of CAS Registry Number 13587-51:
(7*1)+(6*3)+(5*5)+(4*8)+(3*7)+(2*5)+(1*1)=114
114 % 10 = 4
So 13587-51-4 is a valid CAS Registry Number.

13587-51-4SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name deuteriosilicon

1.2 Other means of identification

Product number -
Other names (2H)Silane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:13587-51-4 SDS

13587-51-4Downstream Products

13587-51-4Relevant articles and documents

Buerger, H.,Rahner, A.,Tarrago, G.,Kauppinen, J.

, p. 137 - 156 (1986)

Direct kinetic studies of SiH3 + SiH3, H, CCl4, SiD4, Si2H6, and C3H6 by tunable infrared diode laser spectroscopy

Loh, S. K.,Jasinski, J. M.

, p. 4914 - 4926 (1991)

Gas phase reactions of silyl radical, SiH3, are investigated at room temperature using tunable diode laser flash kinetic spectroscopy.Photolytic generation of silyl at 193 and 248 nm is demonstrated using several different precursor systems.The silyl recombination reaction, SiH3 + SiH3 -> Si2H6, is studied by quantitative measurement of SiH3 and attendant product densities.Analysis yields a refinement of the rate constant, krc = (7.9 +/- 2.9) * 10-11 cm3 molecule-1 s-1.By modeling silyl densities following photolysis of HCl in SiH4, bimolecular rate constants for H + SiH3 and H + SiH4 are determined to be (2 +/- 1) * 10-11 and (2.5 +/- 0.5) * 10-13 cm3 molecule-1 s-1, respectively.Reactions of SiH3 with SiD4, Si2H6, CCl4, and C3H6 (propylene) are studied under pseudo-first-order conditions.Derived upper limits to the rate constants show these reactions to be slow at room temperature.The data demonstrate the reactivity of silyl with open-shell (radical) species and the general inertness of silyl toward closed shell molecules.Under typical chemical vapor deposition conditions, SiH3 is, therefore, a kinetically long-lived species in the gas phase and consequently a potentially important film forming species under plasma and photochemical deposition conditions.

Proton Affinity and Heat of Formation of Silylene

Shin, Seung Koo,Beauchamp, J. L.

, p. 1507 - 1509 (2007/10/02)

Using the techniques of Fourier transform ion cyclotron resonance spectroscopy, we determined the proton affinity of silylene to be 201 +/- 3 kcal*mol-1 from a study of the kinetics and thermochemistry of proton transfer from SiH3+ to a series of n-donor bases with well-established gas-phase base strengths.This value leads to ΔHfo298(SiH2) = 69 +/- 3 kcal*mol-1, which is 11 kcal*mol-1 higher than the previously accepted value (Wals, R.Acc.Chem.Res. 1981, 14, 246-252), but in excellent agreement with the recent theoretically recommended value of 68.1 kcal*mol-1 (Ho, P.; Coltrin, M.E.; Binkely, J.S.; Melius, C.F.J.Phys.Chem. 1985, 89, 4647-4654).

Post a RFQ

Enter 15 to 2000 letters.Word count: 0 letters

Attach files(File Format: Jpeg, Jpg, Gif, Png, PDF, PPT, Zip, Rar,Word or Excel Maximum File Size: 3MB)

1

What can I do for you?
Get Best Price

Get Best Price for 13587-51-4