1992-48-9Relevant articles and documents
Pentacoordinate dihydridosilicates: Synthesis, structure, and aspects of their reactivity
Corriu, Robert J. P.,Guérin, Christian,Henner, Bernard J. L.,Wang, Qunjie
, p. 3574 - 3581 (1991)
The reactions of H- with trialkoxysilanes provide a unique and facile entry to anionic pentacoordinate dihydridosilicates [H2Si(OR)3]-, isolated as stable crystalline products in the case of bulky R groups (R = i-Pr, s-Bu, c-C6H11). Their dynamic behavior (R = i-Pr and s-Bu) has been investigated by 29Si and variable-temperature 1H NMR. Intramolecular exchange of H atoms between axial and equatorial sites is indicated and was found to be significantly dependant on the nature of the solvent. Compared to HSi(OR)3, K[H2Si(OR)3] are versatile reagents: (1) the silicon atom is an electrophilic center and this leads to nucleophilic displacements of the alkoxy groups with Grignard reagents and organolithiums; (2) they are able to reduce very easily carbonyl derivatives to alcohols without any catalyst; (3) they react with primary halides through an ionic mechanism leading to the alkane; (4) the reaction with benzylic halides is more complex and affords the dimer as the major product, the formation of which can be explained by a SET process; (5) the ability to donate one electron is confirmed in the reaction with Cp(CO)2FeI and by direct ESR observation of stable radical intermediates.
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Okawara et al.
, p. 189,190 (1955)
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Reaction of silicon with alcohols in autoclave
Krylova,Egorov,Nefedov
, p. 260 - 266 (2017/07/11)
A reaction of activated silicon with alcohols in an autoclave at 240—270 °C was studied. It was found that primary alcohols form tetraalkoxysilanes Si(OR)4 with high selectivity (up to 97%), while the secondary PriOH gave a mixture of compounds HSi(OPri)3, Si(OPri)4, HSi(OPri)2OSi(OPri)2H, HSi(OPri)2OSi(OPri)3, and Si(OPri)3OSi(OPri)3 with the predominance of trialkoxysilane (up to 67%). Carrying out the reaction under the indicated conditions has the advantage of experimental simplicity, reagent availability, high conversion of silicon, good isolated yields of products.
PRECURSORS FOR SILICA OR METAL SILICATE FILMS
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Page/Page column 2, (2008/06/13)
A composition selected from the group consisting of bis(tert-butoxy)(isopropoxy)silanol, bis(isopropoxy)(tert-butoxy)silanol, bis(tert-pentoxy)(isopropoxy)silanol, bis(isopropoxy)(tert-pentoxy)silanol, bis(tert-pentoxy)(tert-butoxy)silanol, bis(tert-butoxy)(tert-pentoxy)silanol and mixtures thereof; its use to form a metal or metalloid silicate layer on a substrate and the synthesis of the mixed alkoxysilanols.