21331-86-2

Basic information

• Product Name: TRIS(DIMETHYLSILYL)AMINE
• Synonyms: TRIS(DIMETHYLSILYL)AMINE;N,N-bis(dimethylsilyl)-1,1-dimethylsilylamine;TRIS(DIMETHYLSILYL)AMINE 97%;tris(dimethylsilyl)amine,95%;N,N-Bis(dimethylsilyl)-α,α-dimethylsilanamine;Einecs 244-336-8;Silanamine, N,N-bis(dimethylsilyl)-1,1-dimethyl-;Tri(Dimethylsilyl)Amine
• CAS NO: 21331-86-2
• Molecular Formula: C₆H₂₁NSi₃
• Molecular Weight: 191.49
• EINECS: 244-336-8
• Mol File: 21331-86-2.mol
• Article Data: 3

Chemical Properties

• Boiling Point: 152-5°C
• Flash Point: 46.3°C
• Appearance: /
• Density: 0,804 g/cm3
• Refractive Index: 1.423
• PKA: 8.75±0.70(Predicted)
• CAS DataBase Reference: TRIS(DIMETHYLSILYL)AMINE(CAS DataBase Reference)
• NIST Chemistry Reference: TRIS(DIMETHYLSILYL)AMINE(21331-86-2)
• EPA Substance Registry System: TRIS(DIMETHYLSILYL)AMINE(21331-86-2)

Safety Data

• TSCA: No
• Hazardous Substances Data: 21331-86-2(Hazardous Substances Data)

Usage

General Description

Tris(dimethylsilyl)amine, also known as Me3Si3N1, is a chemical compound featuring silicon, nitrogen and carbon elements. This liquid solution belongs to the category of silamines and its chemical formula is (CH3)3Si3NH. It is a clear, colorless to light yellow hydrophobic solvent with high thermal stability and is often used as a reducing agent or silylating agent in chemical reactions due to its reactivity with strong acids. Additionally due to its low toxicity and ready availability, it is commonly used in analytical chemistry and organic synthesis processes. Prolonged exposure of Tris(dimethylsilyl)amine can cause skin, eyes, and respiratory tract irritation.

InChI:InChI=1/C6H18NSi3/c1-8(2)7(9(3)4)10(5)6/h1-6H3

Upstream product

• 1066-35-9 dimethylmonochlorosilane 
• 15933-59-2 1,1,3,3-tetramethyldisilazane 
• 677-27-0 methylvinyldifluorosilane 
• 999-97-3 1,1,1,3,3,3-hexamethyl-disilazane 
• 368-47-8 phenyltrifluorosilane 

Relevant articles and documents

NOVEL TRISILYL AMINE DERIVATIVE, METHOD FOR PREPARING THE SAME AND SILICON-CONTAINING THIN FILM USING THE SAME

Provided are a novel trisilyl amine derivative, a method for preparing the same, and a siliconcontaining thin film using the same, wherein the trisilyl amine derivative, which is a compound having thermal stability, high volatility, and high reactivity and being present in a liquid state at room temperature and under pressure where handling is possible, may form a high purity siliconcontaining thin film having excellent physical and electrical properties by various deposition methods.

REACTIONS OF ORGANYLHALOSILANES WITH 1,1,3,3-TETRA- AND HEXAMETHYLDISILAZANE

Organylchlorosilanes, and also SiCl4, decompose 1,1,3,3-tetra- and hexamethyldisilazanes with formation of hitherto unknown organylchlorosilazanes of general formulas R4-nSiCln-1NHSiH(CH3)2 and R4-nSiCln-1NHSi(CH3)3 (n = 2-4) in yields of 54-98percent.The IR and mass spectra of the prepared compounds were studied.