33287-52-4 Usage
Uses
Used in Semiconductor and Electronics Industry:
BIS(DIMETHYLAMINO)DIETHYLSILANE is used as a surface modifier and adhesion promoter for enhancing the performance and reliability of electronic components and devices.
Used in Silicone Production:
BIS(DIMETHYLAMINO)DIETHYLSILANE is used as a low-temperature curing agent for silicones, allowing for the formation of stable and durable silicone materials at lower temperatures.
Used in Laboratory Settings:
BIS(DIMETHYLAMINO)DIETHYLSILANE is used as a drying agent for moisture-sensitive reagents, ensuring the accuracy and reliability of experimental results by removing trace amounts of water.
Used in Lithography Processes:
BIS(DIMETHYLAMINO)DIETHYLSILANE is used as a protective coating to shield sensitive surfaces from unwanted reactions or contamination during lithography processes.
Used in Silicon-Based Material Production:
BIS(DIMETHYLAMINO)DIETHYLSILANE is used as a precursor in the synthesis of various silicon-based materials, contributing to the development of new materials with unique properties and applications.
Used in Organic Synthesis:
BIS(DIMETHYLAMINO)DIETHYLSILANE is used as a reagent for the functionalization of surfaces in organic synthesis, enabling the creation of novel compounds and improving the efficiency of chemical reactions.
Check Digit Verification of cas no
The CAS Registry Mumber 33287-52-4 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 3,3,2,8 and 7 respectively; the second part has 2 digits, 5 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 33287-52:
(7*3)+(6*3)+(5*2)+(4*8)+(3*7)+(2*5)+(1*2)=114
114 % 10 = 4
So 33287-52-4 is a valid CAS Registry Number.
InChI:InChI=1/C8H22N2Si/c1-7-11(8-2,9(3)4)10(5)6/h7-8H2,1-6H3
33287-52-4Relevant academic research and scientific papers
Compounds useful as chemical precursors in chemical vapor deposition of silicon-based ceramic materials
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, (2008/06/13)
In order to reduce the rate of coke formation during the industrial pyrolysis of hydrocarbons, the interior surface of a reactor is coated with a thin layer of a ceramic material, the layer being deposited by thermal decomposition of a non-oxygen containing silicon-nitrogen precursor in the vapor phase, tin an inert or reducing gas atmosphere in order to minimize the formation of oxide ceramics.
