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1719-53-5

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1719-53-5 Usage

Chemical Properties

colourless liquid

Uses

Different sources of media describe the Uses of 1719-53-5 differently. You can refer to the following data:
1. Used primarily as an intermediate for silicones.
2. Dichlorodiethylsilane is used in ethchlorvynol assay. It is used in Organic Synthesis, Pharmaceuticals, Agrochemicals and Dyestuffs.

Production Methods

Produced by reaction of powdered silicon and ethyl chloride at 300℃, in the presence of copper powder.

General Description

A colorless liquid with a pungent odor. Flash point 77°F. Corrosive to metals and tissue. Vapors are heavier than air.

Reactivity Profile

Chlorosilanes, such as Dichlorodiethylsilane, are compounds in which silicon is bonded to from one to four chlorine atoms with other bonds to hydrogen and/or alkyl groups. Chlorosilanes react with water, moist air, or steam to produce heat and toxic, corrosive fumes of hydrogen chloride. They may also produce flammable gaseous H2. They can serve as chlorination agents. Chlorosilanes react vigorously with both organic and inorganic acids and with bases to generate toxic or flammable gases.

Health Hazard

TOXIC; inhalation, ingestion or contact (skin, eyes) with vapors, dusts or substance may cause severe injury, burns or death. Bromoacetates and chloroacetates are extremely irritating/lachrymators. Reaction with water or moist air will release toxic, corrosive or flammable gases. Reaction with water may generate much heat that will increase the concentration of fumes in the air. Fire will produce irritating, corrosive and/or toxic gases. Runoff from fire control or dilution water may be corrosive and/or toxic and cause pollution.

Fire Hazard

HIGHLY FLAMMABLE: Will be easily ignited by heat, sparks or flames. Vapors form explosive mixtures with air: indoors, outdoors and sewers explosion hazards. Most vapors are heavier than air. They will spread along ground and collect in low or confined areas (sewers, basements, tanks). Vapors may travel to source of ignition and flash back. Substance will react with water (some violently) releasing flammable, toxic or corrosive gases and runoff. Contact with metals may evolve flammable hydrogen gas. Containers may explode when heated or if contaminated with water.

Safety Profile

Poison by intraperitoneal route. Moderately toxic by ingestion. Corrosive to tissue. Dangerous fire hazard when exposed to heat, flame, or oxidzers. Can react vigorously with oxidizing materials. To fight fire, use foam, Con, dry chemical. When heated to decomposition or in reaction with water or steam it emits toxic and corrosive fumes of Cl-. See also CHLOROSILANES.

Check Digit Verification of cas no

The CAS Registry Mumber 1719-53-5 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 1,7,1 and 9 respectively; the second part has 2 digits, 5 and 3 respectively.
Calculate Digit Verification of CAS Registry Number 1719-53:
(6*1)+(5*7)+(4*1)+(3*9)+(2*5)+(1*3)=85
85 % 10 = 5
So 1719-53-5 is a valid CAS Registry Number.
InChI:InChI=1/C4H10Cl2Si/c1-3-7(5,6)4-2/h3-4H2,1-2H3

1719-53-5 Well-known Company Product Price

  • Brand
  • (Code)Product description
  • CAS number
  • Packaging
  • Price
  • Detail
  • TCI America

  • (D1976)  Dichlorodiethylsilane  >98.0%(GC)

  • 1719-53-5

  • 5g

  • 295.00CNY

  • Detail
  • TCI America

  • (D1976)  Dichlorodiethylsilane  >98.0%(GC)

  • 1719-53-5

  • 25g

  • 880.00CNY

  • Detail
  • Alfa Aesar

  • (L03239)  Dichlorodiethylsilane, 94%   

  • 1719-53-5

  • 10g

  • 371.0CNY

  • Detail
  • Alfa Aesar

  • (L03239)  Dichlorodiethylsilane, 94%   

  • 1719-53-5

  • 50g

  • 1236.0CNY

  • Detail
  • Aldrich

  • (274208)  Dichlorodiethylsilane  97%

  • 1719-53-5

  • 274208-25G

  • 1,272.96CNY

  • Detail

1719-53-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 10, 2017

Revision Date: Aug 10, 2017

1.Identification

1.1 GHS Product identifier

Product name Dichlorodiethylsilane

1.2 Other means of identification

Product number -
Other names dichloro(diethyl)silane

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:1719-53-5 SDS

1719-53-5Synthetic route

ethyltrichlorosilane
115-21-9

ethyltrichlorosilane

ethyltriethoxy silane
78-07-9

ethyltriethoxy silane

chloroethane
75-00-3

chloroethane

A

ethoxytriethylsilane
597-67-1

ethoxytriethylsilane

B

diethyldiethoxysilane
5021-93-2

diethyldiethoxysilane

C

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With magnesium at 60℃; for 1h;A 18.5%
B 74.2%
C 5.2%
chloroethane
75-00-3

chloroethane

A

ethyltrichlorosilane
115-21-9

ethyltrichlorosilane

B

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With copper; silicon In neat (no solvent) C2H5Cl and Si-Cu (8:2; heating of the pressed mixt. at 900-930°C in vac. for 2 h) at about 275°C;;A 17%
B 71%
With Si-Cu In neat (no solvent) C2H5Cl and Si-Cu (8:2; heating of the pressed mixt. at 900-930°C in vac. for 2 h) at about 275°C;;A 17%
B 71%
With copper; silicon at 300 - 325℃;
With copper; silicon at 300 - 325℃;
ethyldichlorosilane
1789-58-8

ethyldichlorosilane

acetylene
74-86-2

acetylene

A

(dichloro)(ethyl)vinylsilane
10138-21-3

(dichloro)(ethyl)vinylsilane

B

1,2-bis(dichloroethylsilyl)ethane

1,2-bis(dichloroethylsilyl)ethane

C

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With bis(tributylphosphine)dichloropalladium(II) In xylene at 80℃; for 3h;A 23%
B 70%
C 5%
With bis-triphenylphosphine-palladium(II) chloride In xylene at 80℃; for 3h; Product distribution; other silanes, var. paladdium complexes and reaction time;A 62%
B 23%
C 12%
With bis-triphenylphosphine-palladium(II) chloride In xylene at 80℃; for 3h;A 62%
B 23%
C 12%
With palladium(II) acetylacetonate In xylene at 80℃; for 3h;A 6%
B 7%
C 25%
ethyltrichlorosilane
115-21-9

ethyltrichlorosilane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

chloroethane
75-00-3

chloroethane

A

ethyltriethoxy silane
78-07-9

ethyltriethoxy silane

B

ethoxytriethylsilane
597-67-1

ethoxytriethylsilane

C

diethyldiethoxysilane
5021-93-2

diethyldiethoxysilane

D

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With magnesium at 50 - 100℃;A 5.7%
B 17.9%
C 63.3%
D 9.4%
With magnesium at 60℃; for 1h; Temperature;A 15.1%
B 21.7%
C 46.3%
D 14.1%
ethyltrichlorosilane
115-21-9

ethyltrichlorosilane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

chloroethane
75-00-3

chloroethane

A

ethoxytriethylsilane
597-67-1

ethoxytriethylsilane

B

diethyldiethoxysilane
5021-93-2

diethyldiethoxysilane

C

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With magnesium at 50 - 100℃;A 18.4%
B 49.8%
C 15.6%
With magnesium at 60℃; for 1h; Temperature;A 27.3%
B 33.7%
C 24.7%
ethylmagnesium bromide
925-90-6

ethylmagnesium bromide

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With tetrachlorosilane45%
With tetrachlorosilane
With tetrachlorosilane; diethyl ether
ethyltrichlorosilane
115-21-9

ethyltrichlorosilane

ethyltriethoxy silane
78-07-9

ethyltriethoxy silane

chloroethane
75-00-3

chloroethane

A

triethylsilyl chloride
994-30-9

triethylsilyl chloride

B

ethoxytriethylsilane
597-67-1

ethoxytriethylsilane

C

diethyldiethoxysilane
5021-93-2

diethyldiethoxysilane

D

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With magnesium at 60℃; for 1h;A 5.2%
B 18%
C 43.4%
D 29.7%
chloroethane
75-00-3

chloroethane

A

ethyldichlorosilane
1789-58-8

ethyldichlorosilane

B

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With Si-Cu-Co In neat (no solvent) byproducts: (CH3)3SiCl, HSiCl3, SiCl4; C2H5Cl and Si-Cu-Co (88:10:2) activated with CuCl-CuCl2 at 340-360°C;;A 30%
B 40%
With Si-Cu-Co In neat (no solvent) byproducts: (CH3)3SiCl, HSiCl3, SiCl4; C2H5Cl and Si-Cu-Co (88:10:2) activated with CuCl-CuCl2 at 340-360°C;;A 30%
B 40%
ethyltrichlorosilane
115-21-9

ethyltrichlorosilane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

chloroethane
75-00-3

chloroethane

A

triethylsilyl chloride
994-30-9

triethylsilyl chloride

B

ethoxytriethylsilane
597-67-1

ethoxytriethylsilane

C

diethyldiethoxysilane
5021-93-2

diethyldiethoxysilane

D

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With magnesium at 50 - 100℃;A 8.5%
B 20.7%
C 39.4%
D 28.8%
chloroethane
75-00-3

chloroethane

A

ethyltrichlorosilane
115-21-9

ethyltrichlorosilane

B

tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

C

triethylsilyl chloride
994-30-9

triethylsilyl chloride

D

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With Si-Cu In neat (no solvent) Si-Cu (9:1) and C2H5Cl at 300-325°C;;A 27%
B 37%
C n/a
D 26%
With Si-Cu In neat (no solvent) Si-Cu (9:1) and C2H5Cl at 300-325°C;;A 27%
B 37%
C n/a
D 26%
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

chloroethane
75-00-3

chloroethane

A

ethyltrichlorosilane
115-21-9

ethyltrichlorosilane

B

ethyltriethoxy silane
78-07-9

ethyltriethoxy silane

C

ethoxytriethylsilane
597-67-1

ethoxytriethylsilane

D

diethyldiethoxysilane
5021-93-2

diethyldiethoxysilane

E

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With magnesium at 60℃; for 1h;A 5.6%
B 12.3%
C 21.9%
D 33.6%
E 15.3%
ethyltrichlorosilane
115-21-9

ethyltrichlorosilane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

chloroethane
75-00-3

chloroethane

A

ethoxytriethylsilane
597-67-1

ethoxytriethylsilane

B

diethyldiethoxysilane
5021-93-2

diethyldiethoxysilane

C

hexaethyl disiloxane
994-49-0

hexaethyl disiloxane

D

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With magnesium at 60℃; for 1h; Temperature;A 29.2%
B 25.6%
C 11.6%
D 13.1%
tetrachlorosilane
10026-04-7, 53609-55-5

tetrachlorosilane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

chloroethane
75-00-3

chloroethane

A

ethyltrichlorosilane
115-21-9

ethyltrichlorosilane

B

triethylsilyl chloride
994-30-9

triethylsilyl chloride

C

ethoxytriethylsilane
597-67-1

ethoxytriethylsilane

D

diethyldiethoxysilane
5021-93-2

diethyldiethoxysilane

E

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With magnesium at 60℃; for 1h;A 28.5%
B 7.6%
C 7.6%
D 14.6%
E 21.6%
triethylsilyl chloride
994-30-9

triethylsilyl chloride

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With aluminum (III) chloride at 120℃; for 3h; Time; Temperature;22%
diethylchlorosilane
1609-19-4

diethylchlorosilane

A

H2SiEt2
542-91-6

H2SiEt2

B

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With aluminium trichloride
ethyl bromide
74-96-4

ethyl bromide

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With tetrachlorosilane; diethyl ether; sodium
With tetrachlorosilane; diethyl ether; magnesium
ethene
74-85-1

ethene

ethyldichlorosilane
1789-58-8

ethyldichlorosilane

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
at 300℃; unter Druck;
ethene
74-85-1

ethene

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With dihydrogen hexachloroplatinate; Dichlorosilane
With Pt/Al2O3; Dichlorosilane
ethene
74-85-1

ethene

A

ethyldichlorosilane
1789-58-8

ethyldichlorosilane

B

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With dihydrogen hexachloroplatinate; Dichlorosilane
With platinum(0)-1,3-divinyl-1,1,3,3-tetramethyldisiloxane complex; Dichlorosilane at 20 - 60℃; under 4500.45 Torr; Autoclave; Cooling with liquid nitrogen;A 40 %Chromat.
B 45 %Chromat.
With platinum on activated charcoal; Dichlorosilane
chloroethane
75-00-3

chloroethane

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With copper; silicon at 300 - 325℃;
With copper; silicon In neat (no solvent) C2H5Cl and Si-Cu (85:15; prepared from Si and Cu(OH)2 by reduction with H2 at 200°C);;
With Si-Cu In neat (no solvent) C2H5Cl and Si-Cu (85:15; prepared from Si and Cu(OH)2 by reduction with H2 at 200°C);;
With copper; silicon at 300 - 325℃;
diethylsilyl difluoride
358-06-5

diethylsilyl difluoride

A

diethyl-chloro-fluoro-silane
10132-65-7

diethyl-chloro-fluoro-silane

B

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With aluminium trichloride; diethyl ether
diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With aluminium trichloride
ethyllithium
811-49-4

ethyllithium

A

ethyltrichlorosilane
115-21-9

ethyltrichlorosilane

B

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With tetrachlorosilane; diethyl ether
diethyldiethoxysilane
5021-93-2

diethyldiethoxysilane

benzoyl chloride
98-88-4

benzoyl chloride

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

tetraethoxy orthosilicate
78-10-4

tetraethoxy orthosilicate

ethylmagnesium chloride
2386-64-3

ethylmagnesium chloride

A

ethyltrichlorosilane
115-21-9

ethyltrichlorosilane

B

triethylsilane
631-36-7

triethylsilane

C

triethylsilyl chloride
994-30-9

triethylsilyl chloride

D

diethyldiethoxysilane
5021-93-2

diethyldiethoxysilane

E

hexaethyl disiloxane
994-49-0

hexaethyl disiloxane

F

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With tetrachlorosilane Product distribution; multistep reaction;
benzoyl chloride
98-88-4

benzoyl chloride

diethoxydiethylmonosilane

diethoxydiethylmonosilane

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
at 250℃; im Druckrohr;
ethyl bromide
74-96-4

ethyl bromide

diethyl ether
60-29-7

diethyl ether

silicon tetrachloride

silicon tetrachloride

sodium

sodium

A

triethylsilane
631-36-7

triethylsilane

B

triethylsilyl chloride
994-30-9

triethylsilyl chloride

C

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

quinoline
91-22-5

quinoline

thionyl chloride
7719-09-7

thionyl chloride

diethyldihydroxysilane
2031-65-4

diethyldihydroxysilane

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

chloroethylene
75-01-4

chloroethylene

silane

silane

A

ethyltrichlorosilane
115-21-9

ethyltrichlorosilane

B

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
at 450℃;
diethyldichlorosilane
1719-53-5

diethyldichlorosilane

phenylacetylene
536-74-3

phenylacetylene

diethylbis(phenylethynyl)silane
160319-19-7

diethylbis(phenylethynyl)silane

Conditions
ConditionsYield
Stage #1: phenylacetylene With n-butyllithium In tetrahydrofuran at -70℃; Inert atmosphere; Cooling with acetone-dry ice;
Stage #2: diethyldichlorosilane In tetrahydrofuran at -5 - 20℃; Cooling with ice;
100%
With n-butyllithium In tetrahydrofuran at -70℃;96.3%
1,4-bis(2-(diisopropylphosphino)phenyl)-2,3-catechol

1,4-bis(2-(diisopropylphosphino)phenyl)-2,3-catechol

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

C34H48O2P2Si

C34H48O2P2Si

Conditions
ConditionsYield
With triethylamine In toluene at 100℃; for 12h; Schlenk technique; Inert atmosphere; Glovebox;98.5%
ethylmagnesium bromide
925-90-6

ethylmagnesium bromide

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

diethyl-diphenyl-silane
17964-10-2

diethyl-diphenyl-silane

Conditions
ConditionsYield
In not given98%
In not given98%
pent-4-enoic acid
591-80-0

pent-4-enoic acid

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

C14H24O4Si
1332611-07-0

C14H24O4Si

Conditions
ConditionsYield
Stage #1: pent-4-enoic acid; diethyldichlorosilane With pyridine In toluene for 0.5h; Inert atmosphere;
Stage #2: With chloro-trimethyl-silane In toluene for 0.5h; Inert atmosphere;
98%
2-bromo-6-phenylpyridine
39774-26-0

2-bromo-6-phenylpyridine

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

(2-chlorodiethylsilyl)-6-phenylpyridine

(2-chlorodiethylsilyl)-6-phenylpyridine

Conditions
ConditionsYield
Stage #1: 2-bromo-6-phenylpyridine With n-butyllithium In tetrahydrofuran; hexane at -78℃; for 0.333333h;
Stage #2: diethyldichlorosilane In tetrahydrofuran; hexane at -78 - 20℃;
98%
cyclohexanone
108-94-1

cyclohexanone

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

bis(cyclohexenyloxy)diethylsilane
1093117-36-2

bis(cyclohexenyloxy)diethylsilane

Conditions
ConditionsYield
Stage #1: cyclohexanone With lithium diisopropyl amide In tetrahydrofuran at -78℃; Inert atmosphere;
Stage #2: diethyldichlorosilane In tetrahydrofuran at -78 - 20℃; Inert atmosphere;
97%
ethanol
64-17-5

ethanol

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

diethyldiethoxysilane
5021-93-2

diethyldiethoxysilane

Conditions
ConditionsYield
With polyaniline at 55 - 60℃; for 7h;95.3%
With aniline
{{(C6H4CH3)CC4H2N}4Os}2
89184-07-6

{{(C6H4CH3)CC4H2N}4Os}2

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

{(C6H4CH3)CC4H2N}4OsSi(C2H5)2(OC4H8)
136805-00-0

{(C6H4CH3)CC4H2N}4OsSi(C2H5)2(OC4H8)

Conditions
ConditionsYield
With K In tetrahydrofuran byproducts: KCl; (N2), (((C6H4CH3)CC4H2N)4Os)2 stirred in THF with K, filtrated, Cl2SiEt2 in THF added dropwise with stirring at ambient temp., mixt. stirred for 1 h; THF and excess silane removed, residue redissolved in C6H6, filtered, solvent removed, elem. anal.;95%
1-Hydroxy-2-pyridon
822-89-9

1-Hydroxy-2-pyridon

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

cis-Et2Si(1-oxo-2-pyridinone)2

cis-Et2Si(1-oxo-2-pyridinone)2

Conditions
ConditionsYield
With triethylamine In tetrahydrofuran at 20℃; for 24h; Inert atmosphere; Glovebox;95%
tert-butylamine
75-64-9

tert-butylamine

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

N-tert-butyl-1-chloro-1,1-diethylsilaneamine

N-tert-butyl-1-chloro-1,1-diethylsilaneamine

Conditions
ConditionsYield
In diethyl ether at -78 - 20℃; Schlenk technique;94.3%
In diethyl ether at -78 - 20℃; Schlenk technique;94.3%
In diethyl ether94.3%
9H-fluoren-9-yllithium
881-04-9

9H-fluoren-9-yllithium

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

chloro-diethyl-(9H-fluoren-9-yl)-silane

chloro-diethyl-(9H-fluoren-9-yl)-silane

Conditions
ConditionsYield
In diethyl ether; pentane at 0 - 20℃;94%
isopropyl chloride
75-29-6

isopropyl chloride

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

chlorodiethylisopropylsilane
107149-56-4

chlorodiethylisopropylsilane

Conditions
ConditionsYield
With lithium In Petroleum ether at 50℃; for 1h;92%
1,1′-bis(hydroperoxy)bis(cyclododecyl)peroxide
50782-53-1

1,1′-bis(hydroperoxy)bis(cyclododecyl)peroxide

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

29,29-diethyl-13,14,27,28,30,31-hexaoxa-29-siladispiro[11.2.11.5]hentriacontane
1018495-59-4

29,29-diethyl-13,14,27,28,30,31-hexaoxa-29-siladispiro[11.2.11.5]hentriacontane

Conditions
ConditionsYield
With 1H-imidazole In tetrahydrofuran at 20 - 25℃; for 12h;92%
1-Hydroxy-2-pyridon
822-89-9

1-Hydroxy-2-pyridon

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Et2Si(1-oxo-2-pyridinone)Cl
1526929-20-3

Et2Si(1-oxo-2-pyridinone)Cl

Conditions
ConditionsYield
With triethylamine In tetrahydrofuran at 20℃; for 1.33333h; Inert atmosphere; Glovebox;92%
diethyldichlorosilane
1719-53-5

diethyldichlorosilane

2,2,4,4-tetraethyl-1,3,2,4-diselenadisiletane

2,2,4,4-tetraethyl-1,3,2,4-diselenadisiletane

Conditions
ConditionsYield
With lithium selenide In tetrahydrofuran at 25℃; for 15h; Reagent/catalyst; Schlenk technique;92%
tris(tert-butyl)silylamine
72169-10-9

tris(tert-butyl)silylamine

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

C16H38ClNSi2

C16H38ClNSi2

Conditions
ConditionsYield
With n-butyllithium In diethyl ether; hexane Inert atmosphere; Schlenk technique; Glovebox;90%
2-bromo-3H-cyclopenta[α]naphthalene

2-bromo-3H-cyclopenta[α]naphthalene

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

bis(1/3H-cyclopenta[a]naphthalen-2-yl)diethylsilane

bis(1/3H-cyclopenta[a]naphthalen-2-yl)diethylsilane

Conditions
ConditionsYield
Stage #1: 2-bromo-3H-cyclopenta[α]naphthalene; diethyldichlorosilane With n-butyllithium In diethyl ether; pentane at -80 - 20℃; for 2h;
Stage #2: With diethyldichlorosilane In diethyl ether; pentane at -80℃; for 10h;
90%
Chlorotrifluoroethylene

Chlorotrifluoroethylene

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

bis(trifluorovinyl)diethylsilane
813-49-0

bis(trifluorovinyl)diethylsilane

Conditions
ConditionsYield
With n-butyllithium In tetrahydrofuran; hexane 1.) -78 deg C; 2.) up to RT, 3 h;88%
With n-butyllithium In tetrahydrofuran
5,11,17,23-tetra-t-butyl-25,26,27,28-tetrahydroxycalix-4-arene
157432-87-6, 288302-11-4, 288302-12-5

5,11,17,23-tetra-t-butyl-25,26,27,28-tetrahydroxycalix-4-arene

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

C48H64O4Si

C48H64O4Si

Conditions
ConditionsYield
With triethylamine In toluene for 48h;88%
bis-(1-hydroperoxycyclohexyl)peroxide
2699-12-9

bis-(1-hydroperoxycyclohexyl)peroxide

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

17,17-diethyl-7,8,15,16,18,19-hexaoxa-17-siladispiro[5.2.5.5]nonadecane
1018495-51-6

17,17-diethyl-7,8,15,16,18,19-hexaoxa-17-siladispiro[5.2.5.5]nonadecane

Conditions
ConditionsYield
With 1H-imidazole In tetrahydrofuran at 20 - 25℃; for 1h;88%
With 1H-imidazole In tetrahydrofuran at 20 - 25℃; for 3h;84%
1,1'-peroxybis(1-hydroperoxy-4-methylcyclohexane)
13035-03-5

1,1'-peroxybis(1-hydroperoxy-4-methylcyclohexane)

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

Conditions
ConditionsYield
With 1H-imidazole In tetrahydrofuran at 20 - 25℃; for 3h;88%
diethylamine
109-89-7

diethylamine

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

1-chloro-N,N,1,1-tetraethylsilanamine
18881-63-5

1-chloro-N,N,1,1-tetraethylsilanamine

Conditions
ConditionsYield
With triethylamine In tetrahydrofuran at 0 - 20℃; for 18h; Inert atmosphere;88%
With n-butyllithium In tetrahydrofuran; diethyl ether; hexane at -8 - 20℃;71%
1,1′-bis(hydroperoxy)bis(cycloheptyl)peroxide
51008-02-7

1,1′-bis(hydroperoxy)bis(cycloheptyl)peroxide

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

19,19-diethyl-8,9,17,18,20,21-hexaoxa-19-siladispiro[6.2.6.5]henicosane
1018495-57-2

19,19-diethyl-8,9,17,18,20,21-hexaoxa-19-siladispiro[6.2.6.5]henicosane

Conditions
ConditionsYield
With 1H-imidazole In tetrahydrofuran at 20 - 25℃; for 3h;86%
diethyldichlorosilane
1719-53-5

diethyldichlorosilane

1,1'-dihydroperoxydi(2-adamantyl)peroxide
832088-59-2

1,1'-dihydroperoxydi(2-adamantyl)peroxide

dispiro(adamantane-2,6'-3',3'-diethyl-1',2',4',5',7',8'-hexaoxasilonane-9',2''-adamantane)
1018495-67-4

dispiro(adamantane-2,6'-3',3'-diethyl-1',2',4',5',7',8'-hexaoxasilonane-9',2''-adamantane)

Conditions
ConditionsYield
With 1H-imidazole In tetrahydrofuran at 20 - 25℃; for 8h;86%
1,1’-dihydroperoxydi(cyclopentyl)peroxide
4884-13-3

1,1’-dihydroperoxydi(cyclopentyl)peroxide

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

15,15-diethyl-6,7,13,14,15,16,17-hexaoxa-15-siladispiro[4.2.4.5]heptadecane
1018495-48-1

15,15-diethyl-6,7,13,14,15,16,17-hexaoxa-15-siladispiro[4.2.4.5]heptadecane

Conditions
ConditionsYield
With 1H-imidazole In tetrahydrofuran at 20 - 25℃; for 3h;85%
C20H18N2O3S

C20H18N2O3S

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

C24H29ClN2O3SSi

C24H29ClN2O3SSi

Conditions
ConditionsYield
Stage #1: C20H18N2O3S With sodium In methanol for 3h; Inert atmosphere; Reflux;
Stage #2: diethyldichlorosilane With triethylamine In methanol Inert atmosphere; Reflux;
85%
oxalic acid
144-62-7

oxalic acid

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

silicon diethyl oxalate

silicon diethyl oxalate

Conditions
ConditionsYield
at 120 - 125℃; for 8h;85%
at 120 - 125℃; for 8h;85%
at 120 - 125℃; for 8h;85%
at 120 - 125℃; for 8h;85%
3,4-dichlorobut-1-ene
310447-99-5, 310448-01-2

3,4-dichlorobut-1-ene

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

1,1-diethyl-1-silacyclopent-3-ene
69657-20-1

1,1-diethyl-1-silacyclopent-3-ene

Conditions
ConditionsYield
With 4,4'-di-tert-butylbiphenyl; lithium In tetrahydrofuran at 0℃; for 0.75h;83%
1,1,3,3-Tetramethyldisiloxane
3277-26-7

1,1,3,3-Tetramethyldisiloxane

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

C8H24O2Si3
18107-49-8

C8H24O2Si3

Conditions
ConditionsYield
With water at 20℃;82%
1-Bromo-2,4-dimethoxybenzene
17715-69-4

1-Bromo-2,4-dimethoxybenzene

diethyldichlorosilane
1719-53-5

diethyldichlorosilane

chloro(2,4-dimethoxyphenyl)diethylsilane

chloro(2,4-dimethoxyphenyl)diethylsilane

Conditions
ConditionsYield
Stage #1: 1-Bromo-2,4-dimethoxybenzene With tert.-butyl lithium In hexane; pentane at -78℃; for 0.5h; Inert atmosphere;
Stage #2: diethyldichlorosilane With N,N,N,N,-tetramethylethylenediamine In hexane; pentane at -78 - 20℃; for 0.5h; Inert atmosphere;
82%

1719-53-5Relevant articles and documents

Design and synthesis of readily degradable acyloxysilane dendrimers

Downing, Christopher M.,Missaghi, Michael N.,Kung, Mayfair C.,Kung, Harold H.

, p. 7502 - 7509 (2011)

Two types of dendrimers with AB2 branching, one with acyloxysilanes at the branching position (V type) and the other at the non-branching position (Y type), were synthesized using hydrosilylation with chlorosilanes followed by heterofunctional condensation with olefin-functional carboxylic acids, and examined as readily degradable template materials. The V type dendrimer was much more susceptible to ligand redistribution with chlorosilanes during preparation, whereas the Y type was less. The acyloxysilane linkages in these dendrimers could be cleaved readily by alcoholysis or hydrolysis on demand, making for suitable templates.

Continuous and batch organomagnesium synthesis of ethyl-substituted silanes from ethylchloride, tetraethoxysilane, and organotrichlorosilane for production of polyethylsiloxane liquids. 2. Continuous one-step synthesis of ethylethoxy- and ethylchlorosilanes

Klokov, Boris A.

, p. 234 - 240 (2001)

Development of a continuous one-step manufacturing process for ethylethoxy- and ethylchlorosilanes is described. The methodology of synthesis of ethyl-substituted silanes has been improved. The important factors for the successful synthesis have been determined. Among them are (1) the replacement of some tetraethoxysilane 3 by ethyltrichlorosilane 10, (2) the optimum concentration of 3 and 10, (3) the excess of the granulated magnesium (the supply rate 50-110 g h-1), and, finally, (4) the columnar apparatus with the stirrer, resulting in high yields of di-and triethylsilanes, low duration of synthesis, and high selectivity of Grignard reagent. Continuous one-step synthesis has been assimilated into industry (up to a scale 7-40 kg h-1 of magnesium) for production of oligoethylsiloxanes with low (5-20%) and high content (up to 40%) of the terminal triethylsiloxy groups. The rules for R/D process of the Grignard synthesis are described.

-

Sommer, L. H.,Bailey, D. L.,Whitmore, F. C.

, p. 2869 - 2872 (1948)

-

Neutral-Eosin-Y-Photocatalyzed Silane Chlorination Using Dichloromethane

Fan, Xuanzi,Xiao, Pin,Jiao, Zeqing,Yang, Tingting,Dai, Xiaojuan,Xu, Wengang,Tan, Jin Da,Cui, Ganglong,Su, Hongmei,Fang, Weihai,Wu, Jie

supporting information, p. 12580 - 12584 (2019/08/16)

Chlorosilanes are versatile reagents in organic synthesis and material science. A mild pathway is now reported for the quantitative conversion of hydrosilanes to silyl chlorides under visible-light irradiation using neutral eosin Y as a hydrogen-atom-transfer photocatalyst and dichloromethane as a chlorinating agent. Stepwise chlorination of di- and trihydrosilanes was achieved in a highly selective fashion assisted by continuous-flow micro-tubing reactors. The ability to access silyl radicals using photocatalytic Si?H activation promoted by eosin Y offers new perspectives for the synthesis of valuable silicon reagents in a convenient and green manner.

A direct method for preparing ethyldichlorosilane and its comparison with known alternative methods

Lebedev,Sheludyakov,Lebedeva,Ovcharuk,Govorov,Kalinina

, p. 629 - 633 (2014/11/08)

Various methods, alternative to direct synthesis, for preparing an important commercial organosilicon monomer, ethyldichlorosilane, were studied in detail. The methods, including organomagnesium and organoaluminum procedures, hydrosilylation, and combined methods, were analyzed from the viewpoint of feasibility of laboratory and small-tonnage commercial production, and their advantages and drawbacks were revealed.

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