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CAS

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39863-09-7

Benzene, 1,1'-[(1-methylethylidene)bis(sulfonyl)]bis- is a chemical with a specific purpose. Lookchem provides you with multiple data and supplier information of this chemical.

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  • 39863-09-7 Structure

  • Basic information

    1. Product Name: Benzene, 1,1'-[(1-methylethylidene)bis(sulfonyl)]bis-
    2. Synonyms:
    3. CAS NO:39863-09-7
    4. Molecular Formula: C15H16O4S2
    5. Molecular Weight: 324.422
    6. EINECS: N/A
    7. Product Categories: N/A
    8. Mol File: 39863-09-7.mol

  • Chemical Properties

    1. Melting Point: N/A
    2. Boiling Point: N/A
    3. Flash Point: N/A
    4. Appearance: N/A
    5. Density: N/A
    6. Refractive Index: N/A
    7. Storage Temp.: N/A
    8. Solubility: N/A
    9. CAS DataBase Reference: Benzene, 1,1'-[(1-methylethylidene)bis(sulfonyl)]bis-(CAS DataBase Reference)
    10. NIST Chemistry Reference: Benzene, 1,1'-[(1-methylethylidene)bis(sulfonyl)]bis-(39863-09-7)
    11. EPA Substance Registry System: Benzene, 1,1'-[(1-methylethylidene)bis(sulfonyl)]bis-(39863-09-7)

  • Safety Data

    1. Hazard Codes: N/A
    2. Statements: N/A
    3. Safety Statements: N/A
    4. WGK Germany:
    5. RTECS:
    6. HazardClass: N/A
    7. PackingGroup: N/A
    8. Hazardous Substances Data: 39863-09-7(Hazardous Substances Data)

39863-09-7 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 39863-09-7 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 3,9,8,6 and 3 respectively; the second part has 2 digits, 0 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 39863-09:
(7*3)+(6*9)+(5*8)+(4*6)+(3*3)+(2*0)+(1*9)=157
157 % 10 = 7
So 39863-09-7 is a valid CAS Registry Number.

39863-09-7Relevant articles and documents

POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS

-

, (2010/04/23)

A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.

Nitrogen-containing organic compound, resist composition and patterning process

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, (2008/06/13)

Resist compositions comprising nitrogen-containing organic compounds having a benzimidazole structure and a specific ether chain moiety have an excellent resolution, form precisely configured patterns with minimized roughness of sidewalls and are useful in microfabrication using electron beams or deep-UV light.

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