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541-01-5

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541-01-5 Usage

General Description

Hexadecamethylheptasiloxane, also known as Squalane, is a type of silicone oil that is widely used in the cosmetics industry. It is a clear, odorless and non-greasy substance that is commonly added to moisturizers, sunscreens, hair care products, and makeup. Squalane helps to improve the spreadability and smoothness of products, and it also acts as a natural emollient, preventing moisture loss and keeping the skin hydrated. It has a lightweight and non-comedogenic nature, making it suitable for all skin types, including sensitive and acne-prone skin. Additionally, hexadecamethylheptasiloxane has been deemed safe for use in cosmetics by regulatory bodies, including the U.S. Food and Drug Administration (FDA) and the Cosmetic Ingredient Review (CIR) Expert Panel.

Check Digit Verification of cas no

The CAS Registry Mumber 541-01-5 includes 6 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 3 digits, 5,4 and 1 respectively; the second part has 2 digits, 0 and 1 respectively.
Calculate Digit Verification of CAS Registry Number 541-01:
(5*5)+(4*4)+(3*1)+(2*0)+(1*1)=45
45 % 10 = 5
So 541-01-5 is a valid CAS Registry Number.
InChI:InChI=1/C16H48O6Si7/c1-23(2,3)17-25(7,8)19-27(11,12)21-29(15,16)22-28(13,14)20-26(9,10)18-24(4,5)6/h1-16H3

541-01-5SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 17, 2017

Revision Date: Aug 17, 2017

1.Identification

1.1 GHS Product identifier

Product name bis[[[dimethyl(trimethylsilyloxy)silyl]oxy-dimethylsilyl]oxy]-dimethylsilane

1.2 Other means of identification

Product number -
Other names Heptasiloxane, hexadecamethyl-

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:541-01-5 SDS

541-01-5Synthetic route

1,1,1,3,3-pentamethyl-3-acetoxydisiloxane
70693-47-9

1,1,1,3,3-pentamethyl-3-acetoxydisiloxane

undecamethylpentasiloxane-1-ol

undecamethylpentasiloxane-1-ol

hexadecamethylheptasiloxane
541-01-5

hexadecamethylheptasiloxane

Conditions
ConditionsYield
With triethylamine In dichloromethane at 25℃;95%
triethylamine In dichloromethane at 29℃; Rate constant; Mechanism;95%
octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

A

tetramethylsilane
75-76-3

tetramethylsilane

B

trimethylsilyl iodide
16029-98-4

trimethylsilyl iodide

C

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

D

hexadecamethylheptasiloxane
541-01-5

hexadecamethylheptasiloxane

Conditions
ConditionsYield
With gallium(III) iodide at 140 - 170℃; for 5h; Yield given; Title compound not separated from byproducts;A 61%
B n/a
C n/a
D n/a
1,1,1,3,3-pentamethyl-3-acetoxydisiloxane
70693-47-9

1,1,1,3,3-pentamethyl-3-acetoxydisiloxane

undecamethylpentasiloxane-1-ol

undecamethylpentasiloxane-1-ol

A

docosamethyl-decasiloxane
556-70-7

docosamethyl-decasiloxane

B

hexadecamethylheptasiloxane
541-01-5

hexadecamethylheptasiloxane

Conditions
ConditionsYield
With trifluorormethanesulfonic acid In dichloromethane at 25℃;A 32%
B 35.5%
With trifluorormethanesulfonic acid In dichloromethane Mechanism; Ambient temperature;A 32%
B 35.5%
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

<(CH3)2SiO>n

<(CH3)2SiO>n

A

hexadecamethylheptasiloxane
541-01-5

hexadecamethylheptasiloxane

B

octadecamethyl-octasiloxan, eicosamethyl-nonasiloxane, docosamethyl-decasiloxane and tetracosamethyl-undecasiloxane

octadecamethyl-octasiloxan, eicosamethyl-nonasiloxane, docosamethyl-decasiloxane and tetracosamethyl-undecasiloxane

Conditions
ConditionsYield
With sulfuric acid
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

diethoxy dimethylsilane
78-62-6

diethoxy dimethylsilane

A

hexadecamethylheptasiloxane
541-01-5

hexadecamethylheptasiloxane

B

tetradecamethyl-hexasiloxan, octadecamethyl-octasiloxan, eicosamethyl-nonasiloxane, docosamethyl-decasiloxane and tetracosamethyl-undecasiloxane

tetradecamethyl-hexasiloxan, octadecamethyl-octasiloxan, eicosamethyl-nonasiloxane, docosamethyl-decasiloxane and tetracosamethyl-undecasiloxane

Conditions
ConditionsYield
With hydrogenchloride
With sodium hydroxide
With hydrogenchloride
With sodium hydroxide
1-chloro-1,1,3,3,3-pentamethyldisiloxane
2943-62-6

1-chloro-1,1,3,3,3-pentamethyldisiloxane

hexadecamethylheptasiloxane
541-01-5

hexadecamethylheptasiloxane

Conditions
ConditionsYield
Multi-step reaction with 2 steps
1: 90 percent / 5 h
2: 35.5 percent / CF3SO3H / CH2Cl2 / Ambient temperature
View Scheme
Multi-step reaction with 2 steps
1: 90 percent / 5 h
2: 95 percent / Et3N / CH2Cl2 / 29 °C
View Scheme
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

diethoxy dimethylsilane
78-62-6

diethoxy dimethylsilane

A

Octamethyltrisiloxane
107-51-7

Octamethyltrisiloxane

B

decamethyltetrasiloxane
141-62-8

decamethyltetrasiloxane

C

dodecamethylpentasiloxane
141-63-9

dodecamethylpentasiloxane

D

tetradecamethylhexasiloxane
107-52-8

tetradecamethylhexasiloxane

E

hexadecamethylheptasiloxane
541-01-5

hexadecamethylheptasiloxane

Conditions
ConditionsYield
With NaOH In water byproducts: C2H5OH; heating of (CH3)2Si(OC2H5)2, (CH3)3Si(OC2H5) and an excess (50%) of H2O in presence of NaOH; sepn. of C2H5OH by distn.; boiling of the residue with 20% aq. HCl; further products;; distn.;;
Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

octamethylcyclotetrasiloxane
556-67-2

octamethylcyclotetrasiloxane

A

Octamethyltrisiloxane
107-51-7

Octamethyltrisiloxane

B

decamethyltetrasiloxane
141-62-8

decamethyltetrasiloxane

C

dodecamethylpentasiloxane
141-63-9

dodecamethylpentasiloxane

D

tetradecamethylhexasiloxane
107-52-8

tetradecamethylhexasiloxane

E

hexadecamethylheptasiloxane
541-01-5

hexadecamethylheptasiloxane

Conditions
ConditionsYield
With sulfuric acid; antimony(V) chloride In tetrachloromethane; sulfuric acid shaking of (CH3)3SiOSi(CH3)3 and ((CH3)2SiO)4 (1:1 mol) with concd. H2SO4 at 25°C for 8 days; equilibrium react.; further products;;
With sulfuric acid In sulfuric acid shaking of (CH3)3SiOSi(CH3)3 and ((CH3)2SiO)4 (1:1 mol) with concd. H2SO4 at room temp. for 5 h; equilibrium react.; further products;;
With H2SO4 In sulfuric acid aq. H2SO4; shaking of (CH3)3SiOSi(CH3)3 and ((CH3)2SiO)4 (1:1 mol) with concd. H2SO4 at room temp. for 5 h; equilibrium react.; further products;;
With H2SO4; antimony(V) chloride In tetrachloromethane; sulfuric acid aq. H2SO4; shaking of (CH3)3SiOSi(CH3)3 and ((CH3)2SiO)4 (1:1 mol) with concd. H2SO4 at 25°C for 8 days; equilibrium react.; further products;;

541-01-5Downstream Products

541-01-5Relevant articles and documents

Kinetics of the condensation of oligosiloxanes containing acetoxyl and hydroxyl end groups catalyzed by uncharged nucleophiles in an acid-base inert solvent

Cypryk, M.,Rubinsztajn, S.,Chojnowski, J.

, p. 197 - 204 (1989)

Condensation of undecamethylpentasiloxane-1-ol (1) with 1-acetoxypentamethyldisiloxane (2) in methylene chloride in the presence of uncharged bases has been studied as a model for the coupling of acetoxyl and hydroxyl ended polydimethylsiloxane chains.Triethylamine acts not only as the acceptor of the acid released in the process but also as a Broensted base catalyst activating silanol group.However, weakly basic but strongly nucleophilic N-heterocycles such as 4-dimethylaminopyridine are more effective catalysts promoting the condensation by acting as nucleophiles to activate the acetoxysilane.

COSMETIC PROCESS FOR MAKING-UP AND/OR CARING FOR THE SKIN AND/OR THE LIPS

-

, (2015/11/17)

A cosmetic process for making-up and/or caring for skin and/or lips, includes the application to skin and/or lips of a cosmetic composition including, in a physiologically acceptable medium, at least one supramolecular polymer and at least one hydrophobic film-forming polymer. Particular compositions may be used in the process.

Reaction of Octamethylcyclotetrasiloxane with Aluminum, Gallium, and Silicon Iodides

Voronkov, M. G.,Tsyrendorzhieva, I. P.,Albanov, A. I.,Shergina, N. I.,Klyba, L. V.,Dubinskaya, E. I.

, p. 654 - 655 (2007/10/03)

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