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1825-62-3

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1825-62-3 Usage

Chemical Properties

clear colorless liquid

Uses

Different sources of media describe the Uses of 1825-62-3 differently. You can refer to the following data:
1. Ethoxytrimethylsilane is also called Trimethylethoxysilane, an intermediate useful for blocking hydroxyl or amino groups to perform reactions on multi-functional organic compounds or polymers. It is also useful for deactivating glass surfaces used in gas chromatographic applications.
2. Ethoxytrimethylsilane is used in preparation method of solvent-free heavy peeling regulator for silicon release.

General Description

Ethoxytrimethylsilane (ETMS) is an alkoxysilane that is used as a capping agent, which can tune the hydrophobic properties for a variety of substrates by coupling with the surface hydroxyl groups.

Check Digit Verification of cas no

The CAS Registry Mumber 1825-62-3 includes 7 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 4 digits, 1,8,2 and 5 respectively; the second part has 2 digits, 6 and 2 respectively.
Calculate Digit Verification of CAS Registry Number 1825-62:
(6*1)+(5*8)+(4*2)+(3*5)+(2*6)+(1*2)=83
83 % 10 = 3
So 1825-62-3 is a valid CAS Registry Number.
InChI:InChI=1/C5H14OSi/c1-5-6-7(2,3)4/h5H2,1-4H3

1825-62-3 Well-known Company Product Price

  • Brand
  • (Code)Product description
  • CAS number
  • Packaging
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  • Detail
  • Alfa Aesar

  • (L10151)  Ethoxytrimethylsilane, 97%   

  • 1825-62-3

  • 25g

  • 367.0CNY

  • Detail
  • Alfa Aesar

  • (L10151)  Ethoxytrimethylsilane, 97%   

  • 1825-62-3

  • 100g

  • 942.0CNY

  • Detail
  • Aldrich

  • (254371)  Ethoxytrimethylsilane  98%

  • 1825-62-3

  • 254371-25G

  • 515.97CNY

  • Detail
  • Aldrich

  • (254371)  Ethoxytrimethylsilane  98%

  • 1825-62-3

  • 254371-100G

  • 1,260.09CNY

  • Detail

1825-62-3SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 11, 2017

Revision Date: Aug 11, 2017

1.Identification

1.1 GHS Product identifier

Product name ethoxy(trimethyl)silane

1.2 Other means of identification

Product number -
Other names EINECS 217-370-6

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:1825-62-3 SDS

1825-62-3Synthetic route

ethanol
64-17-5

ethanol

Nafion-TMS

Nafion-TMS

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
With triethylamine In dichloromethane at 27℃; for 3h;100%
ethanol
64-17-5

ethanol

N,N'-bis<(trimethylsiloxy)carbonyl>-N,N'-bis(trimethylsilyl)hydrazine
114518-51-3

N,N'-bis<(trimethylsiloxy)carbonyl>-N,N'-bis(trimethylsilyl)hydrazine

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
97.5%
ethanol
64-17-5

ethanol

1,1,1,3,3,3-hexamethyl-disilazane
999-97-3

1,1,1,3,3,3-hexamethyl-disilazane

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
With tetrabutylammonium phthalimide-N-oxyl In ethyl acetate for 1h; Reflux;96%
With [nano-MCM-41(at)(CH2)3-1-methylimidazole]Br3 In dichloromethane at 20℃; for 0.416667h;90%
orthoformic acid triethyl ester
122-51-0

orthoformic acid triethyl ester

A

ethyl bromide
74-96-4

ethyl bromide

B

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

C

formic acid ethyl ester
109-94-4

formic acid ethyl ester

Conditions
ConditionsYield
With chloro-trimethyl-silane; sodium bromide for 2h; Product distribution; Heating; Me3SiBr generated in situ;A n/a
B n/a
C 92%
ethanol
64-17-5

ethanol

N,N'-trimethylsilyl(phenyl)diazene
17881-28-6

N,N'-trimethylsilyl(phenyl)diazene

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

Azobenzene
1227476-15-4

Azobenzene

C

benzene
71-43-2

benzene

Conditions
ConditionsYield
for 0.5h; Ambient temperature;A 92%
B 0.01 mmol
C 66%
3-(trimethylsilyl)-2-oxazolidinone
43112-38-5

3-(trimethylsilyl)-2-oxazolidinone

ethanol
64-17-5

ethanol

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
chloro-trimethyl-silane at 20℃; for 0.0166667h;90%
(ethylthio)trimethylsilane
5573-62-6

(ethylthio)trimethylsilane

orthoformic acid triethyl ester
122-51-0

orthoformic acid triethyl ester

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

tris(ethylsulfanyl)methane
6267-24-9

tris(ethylsulfanyl)methane

Conditions
ConditionsYield
With zinc(II) chloride In toluene at 0℃; for 5h;A 85%
B 90%
orthoformic acid triethyl ester
122-51-0

orthoformic acid triethyl ester

C7H19PS4Si
153080-50-3

C7H19PS4Si

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

S,S'-diethyl-S''-bis(1-ethoxy)methyl tetrathiophosphate

S,S'-diethyl-S''-bis(1-ethoxy)methyl tetrathiophosphate

Conditions
ConditionsYield
at 20℃; for 2h;A 90%
B 69%
ethanol
64-17-5

ethanol

trimethyl-(1H,1H,3H-tetrafluoropropoxy)silane
56002-69-8

trimethyl-(1H,1H,3H-tetrafluoropropoxy)silane

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
at 20℃; for 1h;88.9%
Triethoxyvinylsilane
78-08-0

Triethoxyvinylsilane

N-<(β-trimethylsiloxy)ethyl>formamide
77214-46-1

N-<(β-trimethylsiloxy)ethyl>formamide

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

N-<2-(diethoxyvinylsiloxy)ethyl>formamide

N-<2-(diethoxyvinylsiloxy)ethyl>formamide

Conditions
ConditionsYield
With aluminum isopropoxide for 0.166667h; Yields of byproduct given;A n/a
B 86%
N-(ethoxymethyl)diethylamine
7352-03-6

N-(ethoxymethyl)diethylamine

2-<2-(trimethylsiloxy)ethoxy>-1,3,2-dioxaphospholane
145861-40-1

2-<2-(trimethylsiloxy)ethoxy>-1,3,2-dioxaphospholane

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

5-<(diethylamino)methyl>-1,4,6,9-tetraoxa-5λ5-phosphaspiro<4.4>nonane
128429-58-3

5-<(diethylamino)methyl>-1,4,6,9-tetraoxa-5λ5-phosphaspiro<4.4>nonane

Conditions
ConditionsYield
With zinc(II) chloride at 120℃;A 86%
B 58%
With zinc(II) chlorideA n/a
B 58%
With zinc(II) chloride at 130℃; Inert atmosphere;A n/a
B 58%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

Diethyl glutarate
818-38-2

Diethyl glutarate

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

1,2-bis((trimethylsilyl)oxy)cyclopent-1-ene
6838-66-0

1,2-bis((trimethylsilyl)oxy)cyclopent-1-ene

Conditions
ConditionsYield
With benzophenone; sodium In toluene at 50℃; Concentration; Inert atmosphere;A Ca. 70.9 g
B 83.5%
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

ethanol
64-17-5

ethanol

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
With urea at 20℃; for 4h;80.2%
With pyridine; xylene
With pyridine In diethyl ether for 3h; Heating;
ethanol
64-17-5

ethanol

N,N-Dimethylcarbamidsaeure-trimethylsilylester
32115-55-2

N,N-Dimethylcarbamidsaeure-trimethylsilylester

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
for 0.0833333h; Ambient temperature;77%
ethyl Pentafluoropropionate
426-65-3

ethyl Pentafluoropropionate

potassium trimethylsilonate
10519-96-7

potassium trimethylsilonate

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

Potassium pentafluoropropionate
378-76-7

Potassium pentafluoropropionate

Conditions
ConditionsYield
In diethyl ether at 20℃; for 2h; Inert atmosphere;A n/a
B 77%
3-trimethylsilyl-4-trichloromethyl-2-oxetanone
344409-08-1

3-trimethylsilyl-4-trichloromethyl-2-oxetanone

ethanol
64-17-5

ethanol

A

ethyl 4,4,4-trichloro-3-hydroxybutyrate
19486-93-2

ethyl 4,4,4-trichloro-3-hydroxybutyrate

B

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
at 130 - 150℃; for 100h;A 76%
B n/a
1-(Ethoxycarbonyl)-4-<4-(trimethylsilyloxy)phenyl>semicarbazid
106821-07-2

1-(Ethoxycarbonyl)-4-<4-(trimethylsilyloxy)phenyl>semicarbazid

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

4-(4-Hydroxyphenyl)-1,2,4-triazolidin-3,5-dion
106821-08-3

4-(4-Hydroxyphenyl)-1,2,4-triazolidin-3,5-dion

Conditions
ConditionsYield
at 215℃; Yields of byproduct given;A n/a
B 75%
diethoxy dimethylsilane
78-62-6

diethoxy dimethylsilane

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
With CH3Cl; Mg In diethyl ether73%
With methylene chloride; magnesium In diethyl ether73%
With methylene chloride; magnesium In diethyl ether introduction of CH3Cl in a suspension of Mg in a mixt. of (CH3)2Si(OC2H5)2 and ether;;70%
With methylene chloride; magnesium In diethyl ether introduction of CH3Cl in a suspension of Mg in a mixt. of (CH3)2Si(OC2H5)2 and ether;;70%
ethanol
64-17-5

ethanol

pentachloro-2-(trimethylsiloxy)propene
87651-34-1

pentachloro-2-(trimethylsiloxy)propene

A

chloroform
67-66-3

chloroform

B

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

C

ethyl 1,1-dichloroacetate
535-15-9

ethyl 1,1-dichloroacetate

Conditions
ConditionsYield
With triethylamine for 8h; Heating; Yields of byproduct given;A n/a
B n/a
C 71%
With triethylamine for 8h; Heating; Yield given;A n/a
B n/a
C 71%
1-trimethylsiloxy-5-dimethylethoxysilylpentane
86517-51-3

1-trimethylsiloxy-5-dimethylethoxysilylpentane

A

1-oxa-2-sila-2,2-dimethylcycloheptane
18269-45-9

1-oxa-2-sila-2,2-dimethylcycloheptane

B

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
With sodium ethanolate 1) heating (byproduct removal), 2) heating (to distill); further catalysts; method for preparation of 1-oxo-2-sila-2,2-disubstituted cycloheptanes and cyclooctanes;A 70%
B n/a
With sodium ethanolate 1) heating (byproduct removal), 2) heating (to distill); Yield given. Multistep reaction;
chloro-trimethyl-silane
75-77-4

chloro-trimethyl-silane

orthoformic acid triethyl ester
122-51-0

orthoformic acid triethyl ester

triethyl phosphite
122-52-1

triethyl phosphite

A

chloroethane
75-00-3

chloroethane

B

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

C

diethyl(diethoxymethyl)phosphonate
17997-33-0

diethyl(diethoxymethyl)phosphonate

Conditions
ConditionsYield
With also with acetic anhydride instead Me3SiCl (90 -100 deg C, 5 h) Product distribution;A n/a
B n/a
C 60%
trimethylsilyl iodide
16029-98-4

trimethylsilyl iodide

ethoxytriphenylsilane
1516-80-9

ethoxytriphenylsilane

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

triphenylsilyl iodide
18602-95-4

triphenylsilyl iodide

Conditions
ConditionsYield
In toluene at 110℃; for 4h; regioselective reaction;A n/a
B 60%
N-(ethoxymethyl)morpholine
18811-63-7

N-(ethoxymethyl)morpholine

2-<2-(trimethylsiloxy)ethoxy>-1,3,2-dioxaphospholane
145861-40-1

2-<2-(trimethylsiloxy)ethoxy>-1,3,2-dioxaphospholane

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

5-(morpholinomethyl)-1,4,6,9-tetraoxa-5-phosphaspiro<4,4>nonane

5-(morpholinomethyl)-1,4,6,9-tetraoxa-5-phosphaspiro<4,4>nonane

Conditions
ConditionsYield
With zinc(II) chlorideA n/a
B 57%
With zinc(II) chloride at 120℃;A n/a
B 52%
With zinc(II) chloride at 130℃; Inert atmosphere;A n/a
B 52%
trimethylsilyl cyanide
7677-24-9

trimethylsilyl cyanide

Na-tetrakis(ethoxy)borate

Na-tetrakis(ethoxy)borate

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

C5H5BN3O(1-)*Na(1+)

C5H5BN3O(1-)*Na(1+)

Conditions
ConditionsYield
at 60℃; for 48h;A n/a
B 55%
1-(ethoxymethyl)piperidine
3275-13-6

1-(ethoxymethyl)piperidine

2-<2-(trimethylsiloxy)ethoxy>-1,3,2-dioxaphospholane
145861-40-1

2-<2-(trimethylsiloxy)ethoxy>-1,3,2-dioxaphospholane

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

5-(piperidinomethyl)-1,4,6,9-tetraoxa-5-phosphaspiro<4,4>nonane

5-(piperidinomethyl)-1,4,6,9-tetraoxa-5-phosphaspiro<4,4>nonane

Conditions
ConditionsYield
With zinc(II) chloride at 120℃;A n/a
B 54%
With zinc(II) chloride at 130℃; Inert atmosphere;A n/a
B 54%
With zinc(II) chlorideA n/a
B 52%
diethylamine
109-89-7

diethylamine

diethyl trimethylsilyl phosphite
13716-45-5

diethyl trimethylsilyl phosphite

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

diethyl diethylphosphoramidite
20262-87-7

diethyl diethylphosphoramidite

C

diethyl-phosphonamidic acid ethyl ester
16141-72-3

diethyl-phosphonamidic acid ethyl ester

Conditions
ConditionsYield
at 100℃; for 1h;A n/a
B n/a
C 52%
diethylamine
109-89-7

diethylamine

diethyl trimethylsilyl phosphite
13716-45-5

diethyl trimethylsilyl phosphite

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

diethyl-phosphonamidic acid ethyl ester
16141-72-3

diethyl-phosphonamidic acid ethyl ester

Conditions
ConditionsYield
at 100℃; for 1h; Product distribution; Mechanism; with dibutylamine and with morpholine;A n/a
B 52%
at 100℃; for 1h;A n/a
B 52%
ethanol
64-17-5

ethanol

acetamide O-(trimethylsilyl)oxime
53127-77-8

acetamide O-(trimethylsilyl)oxime

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

Conditions
ConditionsYield
at 25℃;A 47%
B 50%
phosphonic acid diethyl ester
762-04-9

phosphonic acid diethyl ester

N,N-diethyl-1,1,1-trimethylsilanamine
996-50-9

N,N-diethyl-1,1,1-trimethylsilanamine

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

diethyl-phosphonamidic acid ethyl ester
16141-72-3

diethyl-phosphonamidic acid ethyl ester

Conditions
ConditionsYield
at 100℃; for 1h; Product distribution; Mechanism;A n/a
B 50%
at 100℃; for 1h;A n/a
B 50%
ethanol
64-17-5

ethanol

benzyltrimethylsilane
770-09-2

benzyltrimethylsilane

A

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

B

1-(ethoxymethyl)benzene
539-30-0

1-(ethoxymethyl)benzene

Conditions
ConditionsYield
With copper(II) bis(tetrafluoroborate) In acetonitrile for 10h; Irradiation;A n/a
B 48%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

4-chloro-1-(2,3,5,6-tetramethyl-cyclohexa-1,3-dienyl)-2-(2,3,5,6-tetramethyl-phenyl)-3,5-bis-trimethylsilanyl-[1,2,4]triborolane

4-chloro-1-(2,3,5,6-tetramethyl-cyclohexa-1,3-dienyl)-2-(2,3,5,6-tetramethyl-phenyl)-3,5-bis-trimethylsilanyl-[1,2,4]triborolane

4-ethoxy-1-(2,3,5,6-tetramethyl-cyclohexa-1,3-dienyl)-2-(2,3,5,6-tetramethyl-phenyl)-3,5-bis-trimethylsilanyl-[1,2,4]triborolane

4-ethoxy-1-(2,3,5,6-tetramethyl-cyclohexa-1,3-dienyl)-2-(2,3,5,6-tetramethyl-phenyl)-3,5-bis-trimethylsilanyl-[1,2,4]triborolane

Conditions
ConditionsYield
Substitution;99%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

(Cl)B(Si(CH3)3)CH((CH3)4C6H)B((CH3)4C6H)B(Si(CH3)3)CH
195319-42-7

(Cl)B(Si(CH3)3)CH((CH3)4C6H)B((CH3)4C6H)B(Si(CH3)3)CH

(C2H5O)B(Si(CH3)3)CH((CH3)4C6H)B((CH3)4C6H)B(Si(CH3)3)CH
277742-11-7

(C2H5O)B(Si(CH3)3)CH((CH3)4C6H)B((CH3)4C6H)B(Si(CH3)3)CH

Conditions
ConditionsYield
99%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

vanadium(V) oxychloride
7727-18-6

vanadium(V) oxychloride

chloroorthovanadic acid diethyl ester
1635-99-0

chloroorthovanadic acid diethyl ester

Conditions
ConditionsYield
In dichloromethane byproducts: (CH3)3SiCl; (N2); addn. of 3 equiv. of silane deriv. to CH2Cl2 soln. of vanadium compd. at room temp., stirring for 2 h at room temp.; evapn., elem. anal.;99%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

bis(1,2,4-tri-tert-butylcyclopentadienyl)cerium hydride
832076-19-4

bis(1,2,4-tri-tert-butylcyclopentadienyl)cerium hydride

[1,2,4-tri-tert-butylcyclopentadienyl]2CeOEt
1256136-75-0

[1,2,4-tri-tert-butylcyclopentadienyl]2CeOEt

Conditions
ConditionsYield
In benzene-d6 (under inert atm., Schlenk); Ce-complex dissolved in C6D6 in NMR tube, ligand added, 2 min; monitored by NMR;99%
In pentane (under inert atm., Schlenk); Ce-complex dissolved in pentane, ligand added, 10 min, after 30 min taken to dryness, sealed under vac. in ampoule,sublimed at 185°C; elem. anal.;25%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

acetic anhydride
108-24-7

acetic anhydride

trimethylsilyl acetate
2754-27-0

trimethylsilyl acetate

Conditions
ConditionsYield
With iron(II) bromide at 25℃; for 0.0833333h; Reagent/catalyst; Temperature;99%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

propionic acid anhydride
123-62-6

propionic acid anhydride

trimethylsilyl propionate
16844-98-7

trimethylsilyl propionate

Conditions
ConditionsYield
With CBV780 at 60℃; for 0.0833333h; Microwave irradiation;99%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

benzoic acid anhydride
93-97-0

benzoic acid anhydride

trimethylsilyl benzoate
2078-12-8

trimethylsilyl benzoate

Conditions
ConditionsYield
With CBV780 at 120℃; for 0.0833333h; Temperature; Microwave irradiation;99%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

(4-isopropylphenyl)dibromoborane
76782-91-7

(4-isopropylphenyl)dibromoborane

A

4-(diethoxyboryl)cumene
476156-89-5

4-(diethoxyboryl)cumene

B

2,4,6-tris-(4-isopropyl-phenyl)-cyclotriboroxane

2,4,6-tris-(4-isopropyl-phenyl)-cyclotriboroxane

Conditions
ConditionsYield
In dichloromethane at 20℃; for 24h;A 98%
B n/a
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

(4-isopropylphenyl)dibromoborane
76782-91-7

(4-isopropylphenyl)dibromoborane

4-(diethoxyboryl)cumene
476156-89-5

4-(diethoxyboryl)cumene

Conditions
ConditionsYield
In dichloromethane at 20℃; for 24h;98%
dimethyl 5-fluoroadamantane-1,3-dicarboxylate
1029505-73-4

dimethyl 5-fluoroadamantane-1,3-dicarboxylate

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

dimethyl 5-ethoxyadamantane-1,3-dicarboxylate
1158076-77-7

dimethyl 5-ethoxyadamantane-1,3-dicarboxylate

Conditions
ConditionsYield
With aluminium(III) triflate In dichloromethane at 84℃; for 8h;98%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

4-methyl-benzaldehyde
104-87-0

4-methyl-benzaldehyde

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

(CH3)C6H4CH(OC2H5)CH2CHCH2

(CH3)C6H4CH(OC2H5)CH2CHCH2

Conditions
ConditionsYield
With cesium salt nanocrystal of tungstosilicic acid In acetonitrile at 20℃; for 2.5h; Sakurai reaction;98%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

benzaldehyde
100-52-7

benzaldehyde

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

(1-ethoxy-but-3-enyl)benzene
54703-48-9

(1-ethoxy-but-3-enyl)benzene

Conditions
ConditionsYield
With 35 percent H3PW12O40 modified aluminium-incorporated mesoporous KIT-6 In acetonitrile at 20℃; for 2h; Reagent/catalyst; Solvent; Temperature; Hosomi-Sakurai Reaction; Green chemistry;98%
With cesium salt nanocrystal of tungstosilicic acid In acetonitrile at 20℃; for 2h; Sakurai reaction;95%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

4-methoxy-benzaldehyde
123-11-5

4-methoxy-benzaldehyde

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

(CH3O)C6H4CH(OC2H5)CH2CHCH2

(CH3O)C6H4CH(OC2H5)CH2CHCH2

Conditions
ConditionsYield
With cesium salt nanocrystal of tungstosilicic acid In acetonitrile at 20℃; for 3h; Sakurai reaction;98%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

1-(4-methoxyphenyl)ethanone
100-06-1

1-(4-methoxyphenyl)ethanone

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

(CH3O)C6H4CH(OC2H5)CH2CHCH2

(CH3O)C6H4CH(OC2H5)CH2CHCH2

Conditions
ConditionsYield
With 35 percent H3PW12O40 modified aluminium-incorporated mesoporous KIT-6 In acetonitrile at 20℃; for 3h; Reagent/catalyst; Hosomi-Sakurai Reaction; Green chemistry;98%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

triethylamine
121-44-8

triethylamine

tetraethylammonium fluorosulfonate
86759-27-5

tetraethylammonium fluorosulfonate

Conditions
ConditionsYield
With fluorosulfonyl fluoride In acetonitrile at -20 - -14℃; under 13 - 500 Torr; Autoclave;97.5%
With fluorosulfonyl fluoride In chlorobenzene at 20℃; for 12h; Sealed tube;16%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

trimethylsilyl triphenyl methyl ether
50653-07-1

trimethylsilyl triphenyl methyl ether

A

Hexamethyldisiloxane
107-46-0

Hexamethyldisiloxane

B

Triphenylmethylethylether
968-39-8

Triphenylmethylethylether

Conditions
ConditionsYield
With trimethylsilyl trifluoromethanesulfonate In dichloromethane at 0℃; for 0.5h;A n/a
B 97%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

trimethylsilyl triphenyl methyl ether
50653-07-1

trimethylsilyl triphenyl methyl ether

Triphenylmethylethylether
968-39-8

Triphenylmethylethylether

Conditions
ConditionsYield
trimethylsilyl trifluoromethanesulfonate In dichloromethane at 0℃; for 0.5h;97%
trimethylsilyl trifluoromethanesulfonate In dichloromethane at 0℃; for 0.5h; Product distribution;97%
m-bromobenzoic aldehyde
3132-99-8

m-bromobenzoic aldehyde

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

1-bromo-3-(1-ethoxy-but-3-enyl)-benzene

1-bromo-3-(1-ethoxy-but-3-enyl)-benzene

Conditions
ConditionsYield
With trimethylsilyl trifluoromethanesulfonate; 1-(n-butyl)-3-methylimidazolium triflate at 20℃; for 0.166667h;97%
Fe(OTs)3*6H2O In acetonitrile at 20℃; for 19h;84%
With bismuth(lll) trifluoromethanesulfonate In dichloromethane at 0℃; for 3h;82%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

1-adamantyl fluoride
768-92-3

1-adamantyl fluoride

1-Adamantyl ethyl ether
6221-75-6

1-Adamantyl ethyl ether

Conditions
ConditionsYield
With boron trifluoride diethyl etherate In dichloromethane at 20℃; for 24h;97%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

vanadium(V) oxychloride
7727-18-6

vanadium(V) oxychloride

oxovanadium(V) ethoxydichloride
1801-77-0

oxovanadium(V) ethoxydichloride

Conditions
ConditionsYield
In dichloromethane byproducts: (CH3)3SiCl; (N2); addn. of 2 equiv. of silane deriv. to CH2Cl2 soln. of vanadium compd. at room temp., stirring for 2 h at room temp.; evapn., elem. anal.;97%
1-Methylpyrrolidine
120-94-5

1-Methylpyrrolidine

ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

N-ethyl-N-methylpyrrolidinium fluorosulfonate

N-ethyl-N-methylpyrrolidinium fluorosulfonate

Conditions
ConditionsYield
With fluorosulfonyl fluoride In acetonitrile at -19℃; under 14 - 400 Torr; Autoclave;97%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

triphenylhydroxysilane
791-31-1

triphenylhydroxysilane

1,1,1-trimethyl-3,3,3-triphenyl-disiloxane
799-53-1

1,1,1-trimethyl-3,3,3-triphenyl-disiloxane

Conditions
ConditionsYield
96.5%
96.5%
96.5%
With hydrogenchloride
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

trimethylamine
75-50-3

trimethylamine

ethyltrimethylammonium fluorosulfonate

ethyltrimethylammonium fluorosulfonate

Conditions
ConditionsYield
With fluorosulfonyl fluoride In acetonitrile at -20 - -10℃; under 64 - 300 Torr; for 13.22h; Autoclave;96%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

trichloroacetic acid anhydride
4124-31-6

trichloroacetic acid anhydride

trimethylsilyl trichloroacetate
25436-07-1

trimethylsilyl trichloroacetate

Conditions
ConditionsYield
With iron perchlorate hexahydrate at 25℃; for 0.5h;96%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

n-hexanoic anhydride
2051-49-2

n-hexanoic anhydride

trimethylsilyl hexanoate
14246-15-2

trimethylsilyl hexanoate

Conditions
ConditionsYield
With CBV780 at 100℃; for 0.0833333h; Temperature; Microwave irradiation;96%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

4-chlorobenzaldehyde
104-88-1

4-chlorobenzaldehyde

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

4-ethoxy-4-(4-chlorophenyl)-1-butene
1056626-90-4

4-ethoxy-4-(4-chlorophenyl)-1-butene

Conditions
ConditionsYield
With cesium salt nanocrystal of tungstosilicic acid In acetonitrile at 20℃; for 3h; Sakurai reaction;95%
ethyl trimethylsilyl ether
1825-62-3

ethyl trimethylsilyl ether

para-methylacetophenone
122-00-9

para-methylacetophenone

allyl-trimethyl-silane
762-72-1

allyl-trimethyl-silane

(CH3)C6H4CH(OC2H5)CH2CHCH2

(CH3)C6H4CH(OC2H5)CH2CHCH2

Conditions
ConditionsYield
With 35 percent H3PW12O40 modified aluminium-incorporated mesoporous KIT-6 In acetonitrile at 20℃; for 2h; Reagent/catalyst; Hosomi-Sakurai Reaction; Green chemistry;95%

1825-62-3Relevant articles and documents

NMR DETERMINATION OF ABSOLUTE SITE-SPECIFIC NATURAL ISOTOPE RATIOS OF HYDROGEN IN ORGANIC MOLECULES. ANALYTICAL AND MECHANISTIC APPLICATIONS

Martin, G. J.,Sun, X. Y.,Guillou, C.,Martin, M. L.

, p. 3285 - 3296 (1985)

It has been shown that the "internal" isotope distribution within a given molecular species at the natural abundance level is accessible by a new method, SNIF-nmr, which is based on deuterium NMR.Relative internal factors, Ri/j, have been defined which enable the isotope content of a given site, i, to be compared to that of another molecular site, j, taken as a reference.Several referencing methods intended to provide direct access to relative externals, Ti, and absolute, (D/H), site-specific parameters, are now discussed from both the theoretical and the experimental points of wiev.In the intramolecular referencing method, which involves a time-consuming chemical transformation of the sample, the risk exists of more or less systematic errors resulting from discriminating fractionation effects.However this technique offers, conversely, an interesting way of investigating kinetic isotope effects without the need for specific labelling.In spite of its lower spectral precision the external referencing method has the advantage of being fast and less sensitive to systemetic errors and may be used for direct rough routine determinations of the site-specific isotope contents.More precise results can be obtained, at the price of contaminating the sample, when an intermolecular reference is added and signal heights are used, remembering however that the intensity parameters then have no strict physical meaning in terms of absolute isotope contents.The site-specific parameters, Ti and (D/H)i thus accessible, provide new information on the mechanisms of the fractionation effects occuring in natural conditions and exaples are considered.

-

Hance,Hauser

, p. 994 (1953)

-

Pitt,C.G.,Fowler,M.S.

, p. 1928 - 1930 (1968)

Unimolecular Decomposition of Ethoxytrimethylsilane

Herold, David A.,Furtell, Jean H.

, p. 984 - 988 (1989)

A study of the metastable spectra from ethoxytrimethylsilane and the mass shifts of the deuterium-labeled species permitted the rationalization of the fragmentation mechanism for forming all major ions in the mass spectrum.A new mechanistic pathway for th

Sustainable Catalytic Synthesis of Diethyl Carbonate

Putro, Wahyu S.,Ikeda, Akira,Shigeyasu, Shinji,Hamura, Satoshi,Matsumoto, Seiji,Lee, Vladimir Ya.,Choi, Jun-Chul,Fukaya, Norihisa

, p. 842 - 846 (2020/12/07)

New sustainable approaches should be developed to overcome equilibrium limitation of dialkyl carbonate synthesis from CO2 and alcohols. Using tetraethyl orthosilicate (TEOS) and CO2 with Zr catalysts, we report the first example of sustainable catalytic synthesis of diethyl carbonate (DEC). The disiloxane byproduct can be reverted to TEOS. Under the same conditions, DEC can be synthesized using a wide range of alkoxysilane substrates by investigating the effects of the number of ethoxy substituent in alkoxysilane substrates, alkyl chain, and unsaturated moiety on the fundamental property of this reaction. Mechanistic insights obtained by kinetic studies, labeling experiments, and spectroscopic investigations reveal that DEC is generated via nucleophilic ethoxylation of a CO2-inserted Zr catalyst and catalyst regeneration by TEOS. The unprecedented transformation offers a new approach toward a cleaner route for DEC synthesis using recyclable alkoxysilane.

Metal-Free Catalytic Reductive Cleavage of Enol Ethers

Chulsky, Karina,Dobrovetsky, Roman

supporting information, p. 6804 - 6807 (2018/11/02)

In contrast to the well-known reductive cleavage of the alkyl-O bond, the cleavage of the alkenyl-O bond is much more challenging especially using metal-free approaches. Unexpectedly, alkenyl-O bonds were reductively cleaved when enol ethers were reacted with Et3SiH and a catalytic amount of B(C6F5)3. Supposedly, this reaction is the result of a B(C6F5)3-catalyzed tandem hydrosilylation reaction and a silicon-assisted β-elimination. A mechanism for this cleavage reaction is proposed based on experiments and density functional theory (DFT) calculations.

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