65283-98-9Relevant academic research and scientific papers
Matrix infrared spectroscopic studies of the photo-dissociation at 266 nm of C1NO2 and of C1ONO
Coanga,Schriver-Mazzuoli,Schriver,Dahoo
, p. 309 - 320 (2008/10/08)
Detailed infrared spectroscopic studies of the photo-dissociation at 266 nm of C1NO2 trapped in argon matrices with subsequent experiments conducted with a xenon lamp at λ > 360 nm are reported. Formation of cis and trans C1ONO in equilibrium with C1NO2 is observed after irradiation at 266 nm. λ > 360 nm the transformation of trans C1ONO into cis C1ONO occurs. On prolonged photolysis at 266 nm, C1ONO dissociates into C1ON and O(1D) atom and into C10 + NO as evidenced in reactive matrices (solid oxygen and nitrogen).
A study of the heterogeneous reaction between dinitrogen pentaoxide and chloride ions on low-temperature thin films
Sodeau, John R.,Roddis, Tristan B.,Gane, Matt P.
, p. 1890 - 1897 (2007/10/03)
When low-temperature thin films of either ionic or covalent dinitrogen pentaoxide, N2O5, are exposed to gaseous HCl and water, the only products observed in the solid phase by reflection - absorption infrared spectroscopy (RAIRS) are molecular nitric acid and the oxonium ion. Nitryl chloride, ClNO2, is not detectable. When dinitrogen pentaoxide is co-deposited with hydrogen chloride and water at 85 K and annealed to 140 K, the resultant RAIR spectra indicate that the film is composed of H3O+Cl-, N2O5, HNO3, and D2h-N2O4. When nitryl chloride is co-deposited with either water or HCl/water mixtures, infrared spectra indicative of solid D2h-N2O4 are measured, as well as peaks corresponding to nitrate ions and cis-ClONO (chlorine nitrite). Reaction between ClNO2 and its isomer, cis-ClONO, is proposed as an explanation for the formation of dinitrogen tetraoxide in both systems. The proposed reaction mechanism for this hydrolysis is extended to the N2O5/H2O/HCl deposits in order to explain the lack of observable ClNO2 in such thin films.
Photolysis of Chlorine Nitrate at 254 nm
Burrows, J. P.,Tyndall, G. S.,Moortgat, G. K.
, p. 4340 - 4348 (2007/10/02)
The photolysis of ClONO2 has been studied at 254 nm.The production of NO3, NO2, and ClONO and the removal of ClONO2 have been obseved directly, and the yield of O(3P) has been inferred from the production of O3.The production of Cl and NO3 was found to be the dominant photolysis pathway.For ClONO2 concentrations of 5*1013 molecules cm-3, the values determined for the quantum yields for the removal of ClONO2, -ψClONO2, and the production of NO3, ψNO3, were 0.99+/-0.1 and 1.04+/-0.04, respectively.However, these yields appear to be dependent on the ClONO2 concentration and decrease as ClONO2 concentration increases.For ClONO2 concentrations in the range (3-8)*1014 molecules cm-3, the yields, obtained for the formation of O, NO2, and ClONO, are ψO=0.24, ψNO2=0.25, and ψClONO0.2.No evidence was found for a significant production of NO.The observed behavior may be explained by the production of a long-lived excited state of ClONO2.The results are discussed in relation to the stratospheric behavior of ClONO2.
FTIR Study of the Kinetics and Mechanism for the Cl-Atom-Initiated Reactions of SiHCl3
Niki, H.,Maker, P. D.,Savage, C. M.,Breitenbach, L. P.,Hurley, M. D.
, p. 3725 - 3729 (2007/10/02)
On the basis FTIR product analysis of the UV-visible (λ >= 300 nm) photolysis of Cl2-SiHCl3 mixtures in 700 torr of N2-O2, Cl atoms were shown to predominantly undergo an H-atom abstraction reaction rather than an attachement/displacement reaction with SiHCl3.The corresponding rate constant k was determined at 298 K to be 2.9 X 10E-11 cm3molecule-1s-1 by the competitive kinetic method with reference to the Cl + C6H6 reaction.IR absorption bands attributable to two new gaseous products, SiCl3OCl and SiCl3OH, were detected in the subsequent oxidation of the primary radical SiCl3.Kinetic and spectroscopic evidence was also obtained for the NO2-addition reaction of the oxy and peroxy radicals SiCl3O and SiCl3OO.A plausible mechanism for the formation of these products is presented.
