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74074-84-3

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74074-84-3 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 74074-84-3 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 7,4,0,7 and 4 respectively; the second part has 2 digits, 8 and 4 respectively.
Calculate Digit Verification of CAS Registry Number 74074-84:
(7*7)+(6*4)+(5*0)+(4*7)+(3*4)+(2*8)+(1*4)=133
133 % 10 = 3
So 74074-84-3 is a valid CAS Registry Number.

74074-84-3SDS

SAFETY DATA SHEETS

According to Globally Harmonized System of Classification and Labelling of Chemicals (GHS) - Sixth revised edition

Version: 1.0

Creation Date: Aug 14, 2017

Revision Date: Aug 14, 2017

1.Identification

1.1 GHS Product identifier

Product name 2-methyl-2-(4-methylphenyl)sulfonyl-1-phenylpropan-1-one

1.2 Other means of identification

Product number -
Other names -

1.3 Recommended use of the chemical and restrictions on use

Identified uses For industry use only.
Uses advised against no data available

1.4 Supplier's details

1.5 Emergency phone number

Emergency phone number -
Service hours Monday to Friday, 9am-5pm (Standard time zone: UTC/GMT +8 hours).

More Details:74074-84-3 SDS

74074-84-3Relevant articles and documents

Unexpected Role of p-Toluenesulfonylmethyl Isocyanide as a Sulfonylating Agent in Reactions with α-Bromocarbonyl Compounds

Chen, Jiajia,Guo, Wei,Wang, Zhenrong,Hu, Lin,Chen, Fan,Xia, Yuanzhi

, p. 5504 - 5512 (2016/07/13)

The reactions of p-toluenesulfonylmethyl isocyanide (TosMIC) with α-bromocarbonyl compounds leading efficiently to α-sulfonated ketones, esters, and amides were reported, in which an explicit new role of TosMIC as the sulfonylating agent was uncovered for the first time. Mechanistic study by control experiments and DFT calculations suggested that the reaction is initiated by Cu(OTf)2-catalyzed hydration of TosMIC to form a formamide intermediate, which undergoes facile C-S bond cleavage under the mediation of a Cs2CO3 additive.

Nitrogen-containing organic compound, resist composition and patterning process

-

, (2008/06/13)

Resist compositions comprising nitrogen-containing organic compounds having a benzimidazole structure and a specific ether chain moiety have an excellent resolution, form precisely configured patterns with minimized roughness of sidewalls and are useful in microfabrication using electron beams or deep-UV light.

Addition/elimination reactions of an α-tosyl substituted sulfine with nucleophilic reagents

Leij, M. van der,Strijtveen, H. J. M.,Zwanenburg, B.

, p. 45 - 48 (2007/10/02)

Oxidation of methyl 2-methyl-2-p-(tolylsulfonyl)propanedithioate with m-chloroperbenzoic acid furnished the corresponding sulfine p-MeC6H4SO2CMe2C(=S=O)SMe (2).This sulfine that bears a leaving group at its α-carbon atom has especially been designed to in

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