Reference

Chemically resistant pressure containers comprising fiber-reinforced plastics and manufacture thereof in good processability

Chemically resistant pressure containers comprising fiber-reinforced plastics and manufacture thereof in good processability. Otani, Kazuo; Yamamoto, Tomio (Showa Highpolymer Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 2004034661 A2 5 Feb 2004, 18 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: ICM: B29C070-16. ICS: B29C070-06; C08J005-24; F17C001-06; F17C001-16; B29K067-00; B29K105-08; C08L063-10; C08L067-06. APPLICATION: JP 2002-198826 8 Jul 2002. DOCUMENT TYPE: Patent CA Section: 38 (Plastics Fabrication and Uses) The pressure containers, useful for air, oxygen, liq. natural gas, etc., are manufd. by (i) impregnating fibrous materials with resin compns. (A; styrene monomer <10%) comprising unsatd. polyesters and/or vinyl ester resins, photopolymn. initiators, and thermal polymn. initiators, (ii) winding the impregnated materials, (iii) radiating lights for surface curing, and (iv) thermally curing. Alternatively, the fibrous materials are impregnated with styrene monomer-free A, wound, coated with styrene monomer-contg. A, and cured to give the containers. Volatilization of styrene monomer is prevented by these processes for good working environment. 162881-26-7 and 539826-11-4 are just another two chemicals used in this study. Thus, RST 220PA (glass roving) was impregnated with Ripoxy R 802 (vinyl ester resin), MEK peroxide, Co naphthenate, and Irgacure 819 (photocuring catalyst), wound around polyethylene liner, radiated with light, and heated at 120° to give a container, showing volatilized styrene concn. ￡25 ppm and burst pressure 8 MPa. .

Photosensitive compositions for CTP (computer-to-plate) system using short-wavelength laser and photopolymerization of the compositions

Photosensitive compositions for CTP (computer-to-plate) system using short-wavelength laser and photopolymerization of the compositions. Murota, Yasufumi (Fuji Photo Film Co., Ltd.Except for chemicals metioned above, 1707-68-2 is also used., Japan). Jpn. Kokai Tokkyo Koho JP 2003021895 A2 24 Jan 2003, 46 pp. (Japanese).There are some reagents with their cas registry numbers 162881-26-7 and 488712-46-5 are used in this study. (Japan). CODEN: JKXXAF. CLASS: ICM: G03F007-004. ICS: C08F002-50; C08F004-00; G03F007-00. APPLICATION: JP 2001-204825 5 Jul 2001. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) Section cross-reference(s): 38 The compns., which are polymd. by exposure to ￡450-nm laser beam, contain (A) arom. compds. I (V = substituent capable of suppressing isomerization around double bond between a- and b-carbons at ￡20% and may be bonded to intramol. atom to form a ring; T = OR, SR, NR2, SO2R; T is on o-position and/or p-position of the benzene ring; R =H, nonmetallic at. group; X = O, S, NR), (B) photoinitiators, and (C) polymerizable compds. Use of I prevents fog and reduces scum of used developer. ..