Detail of > 2224-33-1
- MSDS Download

- CAS Number:
- 2224-33-1
- Name:
2-Butanone,2,2',2''-[O,O',O''-(ethenylsilylidyne)trioxime]
- Superlist Name:
- Vinyltris(methylethylketoxime)silane
- Formula:
- C14H27N3O3Si
- Molecular Structure:
![Molecular Structure of 2224-33-1 (2-Butanone,2,2',2''-[O,O',O''-(ethenylsilylidyne)trioxime])](http://www.lookchem.com/300w/2010/0620/2224-33-1.jpg)
- Synonyms:
- 2-Butanone,O,O',O''-(ethenylsilylidyne)trioxime (9CI);2-Butanone,O,O',O''-(vinylsilylidyne)trioxime (7CI,8CI);Silane,tris[(sec-butylideneamino)oxy]vinyl- (8CI);OX 20 (oxime);Tris(ethylmethylketoximato)vinylsilane;Tris(sec-butylideneaminooxy)vinylsilane;Vinyltri(methyl ethylketoximino)silane;Vinyltri(methylethylketoxime)silane;Vinyltris(2-butanoneoximato)silane;Vinyltris(methyl ethyl ketoximino)silane;Vinyltris(methylethylketoximato)silane;Vinyltris[(2-butylidene)aminooxy]silane;Vinyltrisbutanoximesilane;
- Molecular Weight:
- 313.47
- EINECS:
- 218-747-8
- Density:
- 0.975 g/cm3
- Melting Point:
- -22 °C
- Boiling Point:
- 335.2 °C at 760 mmHg
- Flash Point:
- 156.5 °C
- Appearance:
- colorless or yellowish transparent liquid
- Risk Codes:
- 36/37/38
- Safety:
- 26-36/37/39Details
- Transport Information:
- UN 1993
- Deleted CAS:
- 132850-42-1|123948-72-1|123525-82-6
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Reference
- Oil-resistant room-temperature curable organosiloxane compositions
- Oil-resistant room-temperature curable organosiloxane compositions. (Shin-Etsu Chemical Industry Co., Ltd., Japan). Jpn. Kokai Tokkyo Koho JP 59080463 A2 9 May 1984 Showa, 9 pp. (Japanese). (Japan). CODEN: JKXXAF. CLASS: IC: C08L083-06; C08K003-22; C08K003-26; C08K005-39; C08K005-54. APPLICATION: JP 82-190383 29 Oct 1982. DOCUMENT TYPE: Patent CA Section: 42 (Coatings, Inks, and Related Products) Section cross-reference(s): 39 The title compns., useful for formed-in-place gaskets, comprise OH-terminated diorganopolysiloxanes 100, organopolysiloxanes contg. R23SiO1/2 (R2 = hydrocarbyl) and SiO2 units in (0.5-1):1 ratio 2-30, organosilanes or siloxanes having 33 hydrolyzable groups bonded to Si atoms 0.5-30, ZnCO3 and/or ZnO 2-200, and thiazoles, thiurams, and/or dithiocarbamate salts 0-20 parts. Thus, OH-terminated dimethylpolysiloxane (viscosity 5100 cSt) 100, methylpolysiloxane (0.7 Me3SiO1/2 unit per SiO2 unit) 10, vinyltri(methyl ethyl ketoxime)silane [2224-33-1] 8, powd. ZnCO3 10, Bu2Sn dioctoate 0.2, and fumed silica 10 parts were mixed under anhyd. conditions, then cast and allowed to cure 7 days at 23° and 55% relative humidity to obtain a sheet which had tensile strength 27 kg/cm2 initially and 19 kg/cm2 after 10 days in gear oil at 120°, compared with 28 and 10 kg/cm2, resp. for a sheet prepd. similarly without the methylpolysiloxane, and 25 and ~0 kg/cm2, resp. for one without the ZnCO3.
- Waterless lithographic plates
- Waterless lithographic plates.Some chemicals with cas registry numbers like 2224-33-1 and 77908-07-7 are also used. Asano, Masaya; Tsuda, Mikio (Toray Industries, Inc., Japan). Jpn. Kokai Tokkyo Koho JP 61241759 A2 28 Oct 1986 Showa, 6 pp. (Japan) CODEN: JKXXAF. CLASS: ICM: G03F007-02. ICS: G03F007-00. APPLICATION: JP 85-83214 18 Apr 1985. DOCUMENT TYPE: Patent CA Section: 74 (Radiation Chemistry, Photochemistry, and Photographic and Other Reprographic Processes) The title lithog. plates, prepd. by laminating successively a photosensitive layer contg. a quinonediazide compd. and a silicone rubber layer on a support, have a light absorbent(s) in the photosensitive layer. The lithog. plates exhibit good fine dot reproducibility. Thus, an Al plate coated with phenol-formaldehyde resin was 1st coated with a compn. contg. naphthoquinone-1,2-diazido-5-sulfonic acid ester of Sumilite Resin PR50622 (phenol novolak resin) and 4,4'-diethylaminobenzophenone (1.5 dry thick), then coated with A1100 (d-aminopropyltriethoxysilane), finally coated with a compn. contg. polydimethylsiloxane, ethyltriacetoxysilane, and dibutyltin diacetate, heat-treated to harden, and then laminated with Torayfan (polypropylene film) to give a printing original plate. The plate was imagewise exposed through a neg. and developed to obtain a waterless lithog. plate, which gave high-quality prints with high resoln. and showed good durability. .
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