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  • 10112-09-1 Structure
  • Basic information

    1. Product Name: Chloromethylsilane
    2. Synonyms:
    3. CAS NO:10112-09-1
    4. Molecular Formula: CH5ClSi
    5. Molecular Weight: 80.59
    6. EINECS: N/A
    7. Product Categories: N/A
    8. Mol File: 10112-09-1.mol
  • Chemical Properties

    1. Melting Point: N/A
    2. Boiling Point: 31.26°C (estimate)
    3. Flash Point: N/A
    4. Appearance: /
    5. Density: N/A
    6. Refractive Index: N/A
    7. Storage Temp.: N/A
    8. Solubility: N/A
    9. CAS DataBase Reference: Chloromethylsilane(CAS DataBase Reference)
    10. NIST Chemistry Reference: Chloromethylsilane(10112-09-1)
    11. EPA Substance Registry System: Chloromethylsilane(10112-09-1)
  • Safety Data

    1. Hazard Codes: N/A
    2. Statements: N/A
    3. Safety Statements: N/A
    4. WGK Germany:
    5. RTECS:
    6. HazardClass: N/A
    7. PackingGroup: N/A
    8. Hazardous Substances Data: 10112-09-1(Hazardous Substances Data)

10112-09-1 Usage

Check Digit Verification of cas no

The CAS Registry Mumber 10112-09-1 includes 8 digits separated into 3 groups by hyphens. The first part of the number,starting from the left, has 5 digits, 1,0,1,1 and 2 respectively; the second part has 2 digits, 0 and 9 respectively.
Calculate Digit Verification of CAS Registry Number 10112-09:
(7*1)+(6*0)+(5*1)+(4*1)+(3*2)+(2*0)+(1*9)=31
31 % 10 = 1
So 10112-09-1 is a valid CAS Registry Number.

10112-09-1Relevant articles and documents

Simple and selective spectrophotometric determination of spectra and structure of silicon-containing compounds. XXX. Raman and infrared spectra, conformational stability, vibrational assignment of chloromethyl silyl chloride

Guirgis, Gamil A.,Pan, Chunhua,Durig, James R.

, p. 1839 - 1852 (2002)

The Raman spectra (3200-30 cm-1) of liquid and solid, and infrared spectra of gaseous and solid chloromethylsilyl dichloride, ClCH2SiHCl2, have been recorded. Variable temperature (-105 to -150 deg C) studies of the infrared spectra of the sample dissolved in liquid krypton have been carried out. From these data, the enthalpy difference was determined to be 363+/-40 cm-1 (4.34+/0.48 kJ mol-1), with the more stable form being the gauche conformer, which is consistent with the prediction from ab initio calculations at both the Hartree-Fock level and with full electron correlation by the perturbation method to second order. It is estimated that 12 percent of the sample is in the gauche form at ambient temperature. A complete vibrational assignment is proposed for the gauche conformer and several of the fundamentals of the trans conformer based on infrared band contours, relative intensities, depolarization values and group frequencies, which is supported by normal coordinate calculations utilizing the force constants from the ab initio MP2/6-31G(d) calculations. The r0 SiH bond distances of 1.476 and 1.472 Angstroem have been obtained for the trans and gauche conformers, respectively, from the silicon-hydrogen stretching frequencies. The optimized geometries have also been obtained from ab initio calculations utilizing several different basis sets with full electron correlation by the perturbation method up to MP2/6-311+G(2d,2p). The results are discussed and compared to some corresponding results for several related molecules.

Facile preparation of hydrochlorosilane by alkali metal halide catalyzed Si-H/Si-Cl redistribution reaction

Chen, Yi,Li, Yongming,Xu, Caihong

, (2020)

Various alkali metal halides were found to catalyze the Si-H/Si-Cl redistribution reaction in different polar solvents efficiently. The scope of silane substrate was studied using KF as catalyst and 18-crown-6 as cocatalyst in DMI. The alkali metal halides catalyzed redistribution system provides a useful method to prepare hydrochlorosilanes more facilely. A possible mechanism was proposed to explain the process.

METHOD FOR PRODUCING -HETERO-SUBSTITUTED ALKYLHALOHYDROSILANE AND USE THEREOF

-

Page/Page column 24, (2011/04/25)

Method for efficiently producing α-hetero-substituted alkylhalohydrosilane,and use thereof. A method for producing (A) a halohydrosilane compound represented by the general formula (1): H-SiR2c(CR13-bYb)aX3-a-c (1) (wherein, R1 represents a hydrogen atom or a substituted or unsubstituted hydrocarbon group; R2 represents a substituted or unsubstituted hydrocarbon group; X represents a halogen atom; Y represents a hetero substituent; a is 1 or 2; b is any one of 1, 2 and 3; c is 1 or 0), by allowing (B) a halosilane compound represented by the general formula (2) : SiR2c(CR13-bYb)aX4-a-c (2) (wherein, R1, R2, X, Y, a, b and c are as defined above) to react with (C) a hydrosilane compound. A method for producing a reactive silicon group-containing polymer using the halohydrosilane compound (A).

Reaction of Hydrogen Peroxide with Organosilanes under Chemical Vapour Deposition Conditions

Moore, Darren L.,Taylor, Mark P.,Timms, Peter L.

, p. 2673 - 2678 (2007/10/03)

When a stream of vapour at low pressure which contained a mixture of H2O2 with an organosilane, RSiH3 (R = alkyl or alkenyl), impinged on a silicon wafer, deposition of oxide films of nominal composition RxSiO(2-0.5x), where x 3 or higher alkenyl groups. or higher alkenylgroups. Possible mechanism for the Si-C bond cleavage reaction are discussed, with energetic rearrangement of radical intermediates of type Si(H)(R)(OOH)' being favoured.

The synthesis and properties of (CH2F)SiH3 and related monofluoromethylsilanes

Buerger, H.,Moritz, P.

, p. 293 - 308 (2007/10/02)

The reduction of (CFCl2)SiCl3 by LiAlH4, Me3SnH, and (nBu)3SnH has been studied.The compound (CH2F)SiH3 (I) and all the compounds of the series (CFCl2-mHm)SiCl3-nHn, m = 0, 1 and n = 0-3 were detected and characterized by NMR spectroscopy.Conditions for the synthesis of I, (CHFCl)SiH3 (IX) and (CFCl2)SiH3 (V) with acceptable yields have been optimized.These novel compounds were studied by 1H, 19F, 13C and 29Si NMR spectroscopy; their infrared and Raman spectra were recorded and assigned with the assistance of a normal coordinate analysis of 1 and its isotopomer (CD2F)SiD3.The thermolyses of I, IX and (CHF2)SiH3 (X) which start at about 120, 200 and 180 deg C, respectively, have been studied.Whereas I decomposes by a migration of F from C to Si, compound X undergoes elimination of the carbene CHF, insertion of which into SiH bonds ultimately gives CH3Si derivatives.

Synthetic Pathways to Simple Di- and Trisilylmethanes: Potential Starting Materials for the CVD Deposition of Amorphous Silicon a-SiC:H

Schmidbaur, Hubert,Ebenhoech, Jan

, p. 1527 - 1534 (2007/10/02)

Methods for the preparation of simple silaalkanes with a high content of silicon and hydrogen have been explored.Target molecules, like H3SiCH2SiH3 and HC(SiH3)3, may serve as precursor molecules for the production of photovoltaic elements through thermal or discharge (plasma) CVD processes.Among a variety of synthetic pathways, the reactions between HSiCl3 and HCCl3 in the presence of an amine (Benkeser reaction) and the direct synthesis from silicon and polychloromethanes proved most promising for large scale preparations.The CH2X2/KSiH3 metathesis is most useful on the laboratory scale. - The Grignard synthesis was employed for partly methylated homologues, like H3SiCH2SiH2CH3, H3SiCH2SiH(CH3)2, H3SiCH2Si(CH3)3, and related molecules.The magnesium reduction of CHBr3/SiCl4 and CHBr3/CH3SiCl3 mixtures serves best for the preparation of HC(SiCl3)3, which can be converted into HC(SiH3)3 using LiAlH4.Attempts to synthesize tetrasilylmethane via the same route, C(SiH3)4, led only to the formation of HC(SiH3)3. - Key words: Amorphous Silicon a-SiC:H, Disilylmethane, Trisilylmethane, Direct Synthesis, Polysilylmethanes

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