3117-03-1Relevant articles and documents
Base-Promoted Reactions of Hydroxyquinones with Pyrones: A Direct and Sustainable Entry to Anthraquinones and Naphthoquinones
Kraus, George A.,Yu, Huangchao
, p. 1840 - 1842 (2019)
Hydroxybenzoquinones and hydroxynaphthoquinones react with methyl coumalate and 5-cyanopyrone to generate anthraquinones and naphthoquinones in good to excellent yields.
COMPOUND FOR HARD MASK, HARD MASK COMPOSITION COMPRISING SAID COMPOUND, AND METHOD FOR FORMING SEMICONDUCTOR ELEMENT FINE PATTERN USING SAID COMPOUND
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Paragraph 0257-0262, (2020/12/15)
The present invention relates to a compound for a hard mask, a hard mask composition comprising the same, and a method for forming a fine pattern of a semiconductor element using the same. The compound for a hard mask according to the present invention has high solvent solubility that can be applied to a spin coating method, and thus it is possible to prepare a hard mask composition that not onlyhas excellent gap filling performance, but also has excellent heat resistance and etching resistance after curing. In addition, it is possible to provide a fine pattern forming method of a semiconductor element using the same.
Synthesis, characterization, spectral property, Hirshfeld surface analysis and TD/DFT calculations of 2, 6-disubstituted benzobisoxazoles
Hu, Qi,Yue, Yong-Hao,Chai, Lan-Qin,Tang, Li-Jian
, p. 508 - 518 (2019/08/01)
An effective and clean aerobic oxidative method for the synthesis of 2,6-disubstituted benzobisoxazole using the free radical catalysis was obtained. 2, 6-Di(pyridin-4-yl)-benzo[1,2-d:4,5-d']bisoxazole was synthesized and characterized by 1H an