Angewandte
Communications
Chemie
In addition, continuous-flow photochemistry allowed to
accelerate the trifluoromethylation protocol and to increase
the E/Z ratio of trifluoromethylated styrenes.
Our efforts to effect the targeted trifluoromethylation of
styrene (1) were initially focused on the use of Ru(bpy)3Cl2 as
a common photocatalyst[15] with CF3I as cheap and abundant
trifluoromethylating agent. Various bases and solvents were
screened but no product could be obtained with this photo-
catalyst (see the Supporting Information). Next, fac-Ir(ppy)3
was evaluated for this transformation (Table 1), as this
Having found optimal reaction conditions, we set out to
examine the scope of the photocatalytic trifluoromethylation
of styrenes in batch (Scheme 1). Our protocol was found to
readily accommodate a variety of styrenes (1-A–5-A). In
addition, the presence of chlorine or bromine substituents
were well tolerated providing opportunities for further
decoration of the molecule (6-A–8-A). Also ester- and
aldehyde-bearing derivatives were also well tolerated (9-A–
10-A). Furthermore, a variety of challenging vinylic hetero-
cycles, including pyridines, a pyrazine, and a thiazole, could be
exposed to the reaction conditions giving access to the
targeted trifluoromethylated compounds in satisfying yields
(11-A–14-A). More complex substrates, such as estrone-
derivative 15-A and silane 16-A, could be efficiently trifluoro-
methylated, highlighting the applicability of the described
methodology for the synthesis of compounds of interest to the
pharmaceutical and materials industry. Also a/b-disubstituted
styrenes proved to be a suitable substrate class (17-A–22-A).
Both b-methyl and a-methyl styrene could be efficiently
trifluoromethylated (17-A–18-A). Other b-substituted styr-
enes gave predominantly the E isomer in good to excellent
yields (19-A–22-A).
Table 1: Reaction discovery and optimization studies for the photo-
catalytic trifluoromethylation of styrene.[a]
Entry
Base/Solvent
Yield[b]
E/Z[b]
1
2
3
4
5
6
7
DBU/CH3CN
TMEDA/CH3CN
DBU/DMF
K2CO3/DMF
Cs2CO3/DMF
KOAc/DMF
CsOAc/DMF
Trace
Trace
Trace
–
–
–
–
3%, (35% after 72 h)
5%, (57% after 72 h)
76%
–
55:45
74:26
Despite the high yield for the desired compounds, the E/Z
ratio was often poor in batch. We hypothesized that the
thermodynamically most stable E-isomer was first formed
and subsequently transformed into the Z-isomer via an
energy transfer (ET) mechanism.[17] During the course of
our investigations, we observed that indeed the E/Z ratio was
reduced at longer reaction times (see the Supporting Infor-
mation). In order to obtain full conversion with a high E/Z
ratio at short reaction times, the photocatalytic trifluorome-
thylation of styrenes was carried out in a continuous-flow
photomicroreactor.[18] Such flow reactors are ideally suited to
carry out photochemical transformations[19] as they provide
homogeneous irradiation of the reaction mixture and facile
scale-up via numbering up.[20] The reaction could be com-
pleted in flow in less than an hour and the formation of the Z
isomer could be avoided resulting in excellent E/Z ratios for
1-A (see the Supporting Information). These observations
appeared to be generally true (Scheme 1). A significant
acceleration and a higher yield was observed when the
reaction was carried out in a photomicroreactor resulting in
a reduction of the reaction time (from 24–72 h in batch to 0.5–
1.5 h in flow). Notably, higher E/Z ratios were observed in all
cases which can be attributed to the significantly reduced
reaction time, thus avoiding the occurrence of isomerization
via an ET mechanism (see Supporting Information).
Next, we turned our attention to develop a suitable
photocatalytic protocol for the hydrotrifluoromethylation of
styrenes. During the initial screening of our trifluoromethy-
lation protocol, we observed that in ethanol, along with 41%
of 1-A, 12% of the hydrotrifluoromethylated product was
formed (Table 2, entry 1). An increase in yield was observed
when dichloroethane/ethanol (9:1) was used as a solvent
mixture (Table 2, entries 2 and 3). However, the product came
along with many by-products, originating from for example,
overoxidation and dimerization reactions. Screening of
a small library of thiols and other H-atom donors revealed
that the addition of aromatic thiols resulted in a clean
89% (75%)[c]
Entry
Change from best
conditions (entry 7)
Yield
E/Z[c]
8
9
10
No light
No photocatalyst
No base
0%
0%
Trace
–
–
–
[a] Reaction conditions: fac-Ir(ppy)3 (1 mol%), styrene (0.5 mmol), base
(1.5 mmol), solvent (5 mL, 0.1m), visible light (2ꢁ24 W CFL), room
temperature, stirred for 18 hours. [b] Yield and E/Z values are
determined with 19F-NMR with a,a,a-trifluorotoluene as internal stan-
dard. [c] Volatile compound.
photocatalyst exhibits a higher reducing power in its excited
state (E1/2red [*Ir3+/Ir4+] = À1.72 V vs. SCE, compared to E1/2
red
[*Ru2+/Ru3+] = À0.81 V vs. SCE). As proven by a Stern–
Volmer kinetic analysis, this is sufficient to allow for oxidative
quenching of the excited state of the photocatalyst by CF3I
(E1/2 = À1.22 V vs. SCE in DMF).[16] The high quenching rate
(kq = 8.7 ꢀ 1010 mÀ1 sÀ1, with t0 = 1900 ns, resulting in a quench-
ing fraction of Q > 0.95) reveals that the required CF3 radicals
for the intended transformation can be efficiently generated.
No product could be obtained in the presence of amine bases,
presumably by reductive quenching of the excited state thus
hampering the CF3 radical formation process (Table 1,
entries 1–3). However, switching to mild inorganic bases,
which are not competent to quench the excited state of the
photocatalyst, resulted in the formation of the targeted
compound (Table 1, entries 4–7). Optimal results were
obtained by using CsOAc in DMF furnishing the trifluoro-
methylated styrene in good yield (89% 19F-NMR yield, 75%
isolated yield) within 18 hours (Table 1, entry 7). Control
experiments established the importance of the photocatalyst,
the presence of visible light and a suitable base as no reaction
was observed in the absence of any of these (Table 1,
entries 8–10).
2
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Angew. Chem. Int. Ed. 2016, 55, 1 – 6
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