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memory devices. The fabricated Al/PI(BTFBPD-DPBPDA)/
ITO devices have demonstrated a flash type memory behavior
with the ‘‘write’’ and ‘‘erase’’ voltages of about ꢀ1.3 V and 4.0 V,
respectively. Whereas the Al/PI(BTFBPD-BTFBPDA)/ITO
devices exhibited a WORM type memory behavior with the
‘‘write’’ voltage of around ꢀ1.7 V. In addition, the ON/OFF
current ratios of 103–104 are observed in both memory devices.
The I–V curves in the OFF and ON state were fitted according to
various theoretical models, and it was found that the charge
transport in the OFF state was governed by the SCLC model
when the active layer was PI(BTFBPD-DPBPDA) film and the
PF model when the active layer was PI(BTFBPD-BTFBPDA)
film, while those in the ON state were both governed by ohmic
model. We envision these thermally, dimensionally stable
PI(BTFBPD-DPBPDA) and PI(BTFBPD-BTFBPDA) poly-
mers are promising materials for mass production at low cost for
high-performance, programmable, nonvolatile memory devices
that can be operated with low power consumption in unipolar
and bipolar switching modes.
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Acknowledgements
We are grateful to the financial support from State Key Labo-
ratory of ASIC & System, Fudan University (09KF001).
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