temperatures above 100 ◦C (Table 4).† Higher temperatures are
required in order to achieve good conversions within reasonable
time as the t1/2 of 11 (~24 h) sets a limit for the reaction time. We
carried out the reactions with 11 at 180 ◦C to achieve reasonable
timings for most of the alcohols in the study. Reactions with 11
give N-cyclohexylformamide which is also easy to remove by water
extraction, preparative TLC, or silica gel chromatography.
There are some general trends for the three silylamides used here.
First, the yields of the protected alcohols at the given temperatures
are similar for the different silylamides independent of substrate.
Secondly, the trends in the relative reaction rates of the protection
reactions are similar for the three silylamides at given conditions
(room temperature for 10 and 180 ◦C for 11 and 1) and generally
follow the order: carboxylic acid > BnOH ~ allylOH > primary
alcohol > secondary alcohol > PhOH > thiol > tertiary alcohol.
However, for 1 the rate for protection of the secondary alcohol is
substantially slower than that of phenol.
alcohol protection chemistry and found to give positive results. In
conclusion, silylamides provide advantages compared to existing
alcohol protecting reagents since they allow for base and catalyst
free conditions, and their reactions give either solvent (DMF)
or other easily removable and benign by-products. The conver-
sions/yields are high to excellent, and the smallest silylamide (10)
used shows high selectivity for primary alcohols.
Acknowledgements
We first acknowledge Dr. Patrick Steel for many stimulating dis-
cussions on the topics of silenes and alcohol protections. Financial
support from the Swedish Research Council (Vetenskapsra˚det) is
gratefully appreciated.
Notes and references
As noted above, we do not yet have a full view of the
mechanism of these reactions, although protonation is clearly
a key step in the process. At a first glance, there are sim-
ilarities to the Si–(C O) bond cleavage of N-methyl-N-2,6-
dimethylphenyltriethylsilylamide reported by Murai et al., how-
ever, this process is base promoted.43 The same applies to
the finding of Brook and Gilman from 1955 on the reaction
of triphenylsilanecarboxylate with catalytic amounts of sodium
methoxide or ethoxide in the respective alcohol which gives the
corresponding alkoxytriphenylsilane in good yields besides carbon
monoxide and sodium methoxide (Scheme 5).44 However, both
these procedures require the use of a base, whereas our process is
catalyzed by acid, indicating distinctly different mechanisms.
1 For reviews on silenes see e.g. A. G. Brook and M. Brook, Adv.
Organomet. Chem., 1996, 39, 71; T. Mu¨ller, W. Ziche and N. Auner, in
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2 H. Sakurai, in in The Chemistry of Organic Silicon Compounds, Vol.
2 (ed.: Z. Rappoport, Z., Y. Apeloig), Wiley Interscience, New York,
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K. Sakamoto and M. Kira, J. Am. Chem. Soc., 1998, 120, 2408; T.
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Scheme 5 The study by Brook and Gilman of reactions of triphenyl-si-
lanecarboxylate with sodium alkoxides.44 Yields in parentheses.
Conclusions
The
transient
1,1-bis(trimethylsilyl)-2-dimethylamino-2-tri-
methylsiloxysilene (2) with a reversed Si C bond polarity was
formed through thermolysis of N,N-dimethyl(tris(trimethyl-
silyl)silyl)methaneamide (1) in presence of alcohols. Surprisingly,
no products resulting from reaction of the silene with the alcohol
were observed, and this should represent the first example
of a silene that is persistent to alcohols. The amide group of
the silylamide is instead replaced by the alkoxy group. When
thermolyses are performed in the presence of both an alcohol and
a 1,3-diene, both the silylether and the [4+2] cycloadduct of the
reaction between silene and diene are observed.
Indeed, the reaction of alcohols with N,N-dimethyl-
(tris(trimethyl-silyl)silyl)methaneamide represent a new base-free
pathway for protection of alcohols with the tris(trimethyl-silyl)silyl
group, a group that has shown to be a fluoride resistant but
photochemically removable protecting group of alcohols.38 Two
other silylamides were also tested in the reaction of base-free
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13 The Si C double bond length in the parent silene H2Si CH2 is 1.7039
˚
A as measured by millimetre wave spectroscopy S. Bailleux, M. Bogey,
J. Breidung, H. Bu¨rger, R. Fajgar, Y. Liu, J. Pola, M. Senzlober and
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14 M. Kaftory, M. Kapon and M. Botoshansky, in The Chemistry of
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9384 | Dalton Trans., 2010, 39, 9379–9385
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