Gas-Phase Reactions of O- and O2- with a Variety of Halogenated Compounds

Article abstract of DOI:10.1021/j100210a015

The flowing afterglow technique has been applied to a comparative study, for a series of halogenated compounds, of dissociative attachment and reaction with O^- and O2^-.The ion product spectrum produced by reaction with O^- and O2^- overlaps but is more diverse than that obtained by dissociative attachment.Absolute rate constants for the O^- and O2^- reactions are reported.A few reactions, for which exothermic mechanisms can be written, were found to be quite inefficient.