2504
Russ.Chem.Bull., Int.Ed., Vol. 64, No. 10, October, 2015
Milenin et al.
2.17—2.50 (m, 2 H, (CH3)(C6H5CH2)Si); 7.26—7.65 (m, 5 H,
(CH3)(C6H5CH2)Si).
with water to рH 7, and dried with sodium sulfate. After filtraꢀ
tion, the volatile products were removed in vacuo at 300 °C. The
yield was 75%. 1H NMR (CDCl3), δ: 7.04—7.18 (m, 5 H,
(C6H5CH2)(CH3)2Si); 1.97—2.09 (m, 2 H, (C6H5CH2)(CH)2Si),);
(m, 6 H, (CH3)2Si); –0.04—0.01 (m, 9 H, (CH3)3Si). GPC:
MMpica = 3600 a.m.u., nd20 = 1.4825.
Blocking of terminal hydroxy groups of oligobenzylmethylsiꢀ
loxanes. A 20% solution of oligobenzylmethylsiloxane (0.54 g,
0.004 mol) in anhydrous toluene was added dropwise to a mixꢀ
ture of chlorotrimethylsilane (0.82 g, 0.007 mol) and pyridine
(0.59 g, 0.007 mol) in toluene (10 mL). The mixture was refluxed
with stirring for 4 h. The product was washed with water until
neutrality, dried with sodium sulfate, and evacuated at 50 °C. 1H
NMR (CDCl3), δ: 0.15—0.39 (m, 9 H, (CH3)3Si); 0.15—0.39
References
1. C. M. Murphy, C. E. Saunders, D. C. Smith, Ind. Eng. Chem.,
1950, 42, 2462.
(m,
3 H, (CH3)(C6H5CH2)Si); 2.16—2.40 (m, 2 H,
(CH3)(C6H5CH2)Si); 7.25—7.66 (m, 5 H, (CH3)(C6H5CH2)Si).
IR (CCl4), ν/cm–1: the signals of the SiOH groups in the region
of 3300 cm–1 are absent.
2. R. Robison, F. S. Kipping, J. Chem. Soc., Trans., 1908, 93, 439.
3. F. S. Kipping, Proc. R. Soc. London, 1937, 159, 139.
4. A. R. Steele, F. S. Kipping, J. Chem. Soc., 1928, 1431.
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Res. Chem. Intermediates, 1997, 23, 41.
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1982, 115, 1694.
Synthesis of linear highꢀmolecularꢀweight polybenzylmethylꢀ
siloxane. A mixture of oligobenzylmethylsiloxane (1 g, 0.007 mol)
and AcOK (1 wt.%) in acetic acid was stirred for 5 h in vacuo
(1 Torr) at 180 °C. The product was dissolved in toluene, washed
with DI water, and dried with sodium sulfate. The solvent was
evaporated in vacuo (1 Torr) at 50 °C. The yield of the product
was 0.88 g (88%). IR (CCl4), ν/cm–1: the signals in the region of
3100—3600 cm–1 (SiOH) are absent. GPC: MMpica = 6000 a.m.u.
(72%), 500 a.m.u. (28%). 1H NMR (CDCl3), δ: 0.16—0.40 (m, 3 H,
(CH3)(C6H5CH2)Si); 2.16—2.39 (m, 2 H, (CH3)(C6H5CH2)Si);
7.24—7.68 (m, 5 H, (CH3)(C6H5CH2)Si).
11. S. Kohama, Nippon Kagaku Zassi, 1960, 81, 11.
12. A. L. Reilly, H.W. Post, J. Am. Chem. Soc., 1951, 73, 865.
13. M. G. Voronkov, A. Y. Yakubovskaya, J. Gen. Chem. USSR,
1955, 25, 1124 [Zh. Obshch. Khim., 1955, 1124].
Copolycondensation of diethoxydimethylsilane, benzylmethꢀ
yldiethoxysilane, trimethylmethoxysilane, and triethoxymethylsiꢀ
lane in acetic acid. A mixture of diethoxydimethylsilane (144.3 g,
0.97 mol), benzylmethyldiethoxysilane (150.6 g, 0.67 mol), triꢀ
ethoxymethylsilane (12 g, 0.067 mol), trimethylmethoxysilane
(14 g, 0.134 mol), and anhydrous acetic acid (543.6 g, 7.25 mol)
was slowly added dropwise to anhydrous acetic acid (543.6 g,
7.25 mol) with stirring and reflux. IR (CCl4), ν/cm–1: the signals
in the region of 3100—3600 cm–1 (SiOH) are present. The
amount of the OH groups 1.6% (the data from the 1H NMR
spectrum of the blocked sample). The volatile products were
14. K. A. Andrianov, O. I. Gribanova, Russ. J. General Chem.
(Engl. Transl.), 1938, 552 [Zh. Obshch. Khim., 1938, 552].
15. E. V. Egorova, N. G. Vasilenko, N. V. Demchenko, E. A.
Tatarinova, A. M. Muzafarov, Dokl. Chem. (Engl. Transl.,
2009, 424, 15 [Dokl. Akad. Nauk, 2009, 424, 200].
16. A. A. Bychkova, F. V. Soskov, A. I. Demchenko, P. A. Storꢀ
ozhenko, A. M. Muzafarov, Russ. Chem. Bull. (Int. Ed.),
2011, 60, 2384 [Izv. Akad. Nauk, Ser. Khim., 2011, 2337].
17. Polymer Data Handbook, Ed. J. E. Mark, Oxford University Press,
New York, 2009, 840.
18. P. G. Alekseev, I. I. Skorokhodov, P. I. Povarnin, Svoistva
kremniiorganicheskikh zhidkostei [Properties of Organosilicon
Liquids], Energoatomizdat, Moscow, 1997, 19 (in Russian).
19. W. L. F. Armarego, D. D. Perrin, Purification of Laboratory
Chemicals, Butterworth Heinemann, Oxford, 2002, p. 530.
removed in vacuo at 120 °C. The yield was 95%. GPC: MMpica
=
1
= 1400 a.m.u. (72%), 600 a.m.u. (28%). H NMR (CDCl3), δ:
7.05—7.33 (m, 5 H, (C6H5CH2)(CH3)2Si); 1.98—2.23 (m, 2 H,
(C6H5CH2)(CH)3Si),); (m, 6 H, (CH3)2Si); 0.1—0.12 (m, 9 H,
(CH3)3Si).
Catalytic postꢀcondensation at the OH groups of copolymer.
The reaction was carried out by the addition of concentrated
sulfuric acid (1.36 g, 0.0139 mol) to the copolymer (136 g,
0.37 mol). The reaction mixture was stirred for 2 h, then diluted
with toluene until complete dissolution of the content, washed
Received December 26, 2014