Control of Monolayer Assembly Structure by H Bonding
J. Am. Chem. Soc., Vol. 121, No. 22, 1999 5321
crystalline solid which was recrystallized from 95% ethanol. Yield (with
respect to n-alkylamine starting material): 87%. Mp: 45.6-47.5 °C.
1H NMR (300 MHz, CDCl3): δ 5.71 (broad, 1H), 3.26 (m, 2H), 2.82
(m, 2H), 2.47 (t, J ) 6.8 Hz, 2H), 1.62 (t, J ) 8.4 Hz, 1H), 1.49 (m,
2H), 1.45-1.24 (broad overlapping resonance, 12H), 0.88 (t, J ) 6.6
Hz, 3H).
3-Mercapto-N-n-undecylpropionamide C11-1AT was synthesized
analogously to C9-1AT with the substitution of n-undecylamine for
n-nonylamine. Yield: 85%. Mp: 57.5-59.0 °C. 1H NMR (300 MHz,
CDCl3): δ 5.55 (broad, 1H), 3.26 (m, 2H), 2.82 (m, 2H), 2.47 (t, J )
6.7 Hz, 2H), 1.61 (t, J ) 8.4 Hz, 1H), 1.50 (m, 2H), 1.41-1.23 (broad
overlapping resonance, 16H), 0.88 (t, J ) 6.6 Hz, 3H).
3-Mercapto-N-n-dodecylpropionamide C12-1AT was synthesized
analogously to C9-1AT with the substitution of n-dodecylamine for
n-nonylamine and with purification by preparative radial thin-layer
chromatography (1 mm rotor, gradient of 25% to 50% ethyl acetate in
n-hexane). Yield: 70%. Mp: 63.0-64.4 °C. 1H NMR (300 MHz,
CDCl3): δ 5.83 (broad, 1H), 3.27 (m, 2H), 2.83 (m, 2H), 2.48 (t, J )
6.8 Hz, 2H), 1.61 (t, J ) 8.3 Hz, 1H), 1.50 (m, 2H), 1.40-1.24 (broad
overlapping resonance, 18H), 0.89 (t, J ) 6.5 Hz, 3H).
3-Mercapto-N-n-tridecylpropionamide C13-1AT was synthesized
analogously to C9-1AT with the substitution of n-tridecylamine for
n-nonylamine and with purification by preparative radial thin-layer
chromatography (1 mm rotor, gradient of 10% to 30% ethyl acetate in
n-hexane). Yield: 44%. Mp: 67.5-68.7 °C. 1H NMR (300 MHz,
CDCl3): δ 5.70 (broad, 1H), 3.27 (m, 2H), 2.83 (m, 2H), 2.47 (t, J )
6.8 Hz, 2H), 1.61 (t, J ) 8.4 Hz, 1H), 1.51 (m, 2H), 1.38-1.23 (broad
overlapping resonance, 20H), 0.89 (t, J ) 6.6 Hz, 3H).
30 s at takeoff angles of 45° and 30°.16 Complete film removal was
ensured by multiplexing at 300-280 eV (the C(1s) region) after
sputtering. The attenuation length λ is 42 Å based on our previous
work.9a
Contact Angle Goniometry. Contact angles were measured using
a captive drop technique14a on a goniometer constructed in our
laboratory.9a Advancing and receding contact angles are defined as the
maximum and minimum angles formed between the film-droplet
interface and the tangent to the probe droplet at its intersection with
the substrate.15
Molecular Modeling. Molecular modeling was performed using
Spartan 5.0 (Wavefunction, Inc.) as previously reported.9a
FTIR-ERS. External reflective IR spectroscopy was performed using
a Nicolet Magna 550 IR with a Spectra-Tech 80 fixed reflectance
accessory and a Cambridge Physical Sciences IR wire grid polarizer.
Spectra were collected as 1024 signal-averaged interferograms as
previously reported.7a To minimize baseline periodicity and gas-phase
water peaks, the amide spectra shown are the Fourier transforms of
the interferogram averages of four to six independent samples. Residual
gas-phase water was subtracted from these spectra, and minimal
automatic baseline correction was applied using the Nicolet software.
All spectra shown are unsmoothed.
Electrochemical Characterization. A connect between the Au
working electrode (ca. 1 cm2) and a Teflon shrink-wrapped 22 g solid
Cu wire was made with Ag paint (Ted Pella). The exposed Ag, Cu,
and Cr surfaces were passivated with epoxy (Dexter). Double-layer
capacitance (Cdl) and electrochemical blocking effect (EBE) were
measured on a BAS 100 electrochemical workstation using a Pt counter
electrode and an SSCE reference electrode.7a The electrolyte was 1.0
M KCl (aq). For EBE, the analyte was 1.0 mM K3Fe(CN)6. The films
were electrochemically annealed by the method of Finklea.17
3-Mercapto-N-n-tetradecylpropionamide C14-1AT was synthesized
analogously to C9-1AT with the substitution of n-tetradecylamine for
n-nonylamine. Yield: 78%. Mp: 68.1-69.2 °C. 1H NMR (300 MHz,
CDCl3): δ 5.75 (broad, 1H), 3.26 (m, 2H), 2.82 (m, 2H), 2.47 (t, J )
6.7 Hz, 2H), 1.62 (t, J ) 8.3 Hz, 1H), 1.51 (m, 2H), 1.36-1.22 (broad
overlapping resonance, 22H), 0.88 (t, J ) 6.5 Hz, 3H).
Results
3-Mercapto-N-n-pentadecylpropionamide C15-1AT was synthesized
analogously to C9-1AT with the substitution of n-pentadecylamine for
n-nonylamine and with purification as for C12-1AT. Yield: 67%. Mp:
69.2-69.7 °C. 1H NMR (300 MHz, CDCl3): δ 5.54 (broad, 1H), 3.27
(m, 2H), 2.83 (m, 2H), 2.48 (t, J ) 6.8 Hz, 2H), 1.62 (t, J ) 8.4 Hz,
1H), 1.51 (m, 2H), 1.35-1.23 (broad overlapping resonance, 24H),
0.88 (t, J ) 6.6 Hz, 3H).
3-Mercapto-N-n-hexadecylpropionamide C16-1AT was synthesized
analogously to C9-1AT with the substitution of n-hexadecylamine for
n-nonylamine and with purification as for C12-1AT. Yield: 39%. Mp:
74.5-75.7 °C. 1H NMR (300 MHz, CDCl3): δ 5.68 (broad, 1H), 3.27
(m, 2H), 2.83 (m, 2H), 2.48 (t, J ) 6.7 Hz, 2H), 1.62 (t, J ) 8.4 Hz,
1H), 1.51 (m, 2H), 1.35-1.22 (broad overlapping resonance, 26H),
0.89 (t, J ) 6.5 Hz, 3H).
3-Mercapto-N-n-octadecylpropionamide C18-1AT was synthesized
analogously to C9-1AT with the substitution of n-octadecylamine for
n-nonylamine and with purification as for C12-1AT. Yield: 45%. Mp:
85.7-87.3 °C. 1H NMR (300 MHz, CDCl3): δ 5.81 (broad, 1H), 3.28
(m, 2H), 2.83 (m, 2H), 2.48 (t, J ) 6.8 Hz, 2H), 1.62 (t, J ) 8.3 Hz,
1H), 1.51 (m, 2H), 1.35-1.20 (broad overlapping resonance, 30H),
0.89 (t, J ) 6.6 Hz, 3H).
Formation of Substrates and SAMs. Au substrates (1500 Å) with
75 Å Cr adhesion layers were formed on glass slides by evaporation
in an Edwards 306A evaporation chamber (base pressure ) 6 × 10-7
mbar). The substrates were stored under absolute ethanol until use.
Glassware for adsorption and glass slides were cleaned with fresh
piranha solution (1:5 30% H2O2 in concentrated H2SO4; caution: reacts
Violently with organic material). Immediately before soaking in a 1
mM ethanolic solution of the desired thiol, substrates were cleaned for
5 min using a high-intensity Hg lamp (UV Clean, Boekel Industries)
in air and rinsed with copious Nanopure (Barnstead) water and absolute
ethanol. At least four independent measurements on separate samples
were obtained for all data sets.
Interpretation of the analytical data leads to a consistent
structural description of the monolayer series Cn-1AT/Au (n )
9, 11-16, 18). Each of the members of the series has an
extensively hydrogen bonded underlayer of amide groups.
Adjacent to the amide layer is either an ordered or a disordered
hydrocarbon overlayer, depending on the length of the alkyl
tails. We will show that the length threshold for alkyl tail
ordering is n ) 15.
X-ray Photoelectron Spectroscopy (XPS) Shows That
Chemisorbed, Anisotropic Monolayers Are Formed. XPS
provides information about the identity, chemical environment,
and depth of the constituent elements of these films.20 The S(2p)
peak positions are consistent with covalent attachment to
gold,14a,21 and the remaining SAM peaks occur at energies
expected for amide and alkyl material.7a,9,22 Due to the attenu-
ation of photoelectrons by overlying material, the relative
intensity of C(1s) is enhanced at the expense of the signals from
the other atoms.23 This effect is exaggerated in the longer chain
SAMs because the hydrocarbon overlayer is thicker.8b,12,24 The
film thicknesses calculated from XPS intensities agree with those
predicted by molecular modeling (Figure 2).9a
(20) For comprehensive reviews, see: (a) Briggs, D.; Riviere, J. C.;
Hofmann, S.; Seah, M. P. In Practical Surface Analysis by Auger X-ray
Photoelectron Spectroscopy; Briggs, D., Seah, M. P., Eds.; Wiley & Sons:
Chichester, U.K., 1983; pp 87-216. (b) Hochella, M. F., Jr. ReV. Mineral.
1988, 18, 573-637.
(21) (a) Dubois, L. H.; Zegarski, B. R.; Nuzzo, R. G. J. Am. Chem. Soc.
1990, 112, 570-579. (b) Nuzzo, R. G.; Dubois, L. H.; Allara, D. L. J. Am.
Chem. Soc. 1990, 112, 558-569.
(22) (a) Bomben, K. D.; Dev, S. D. Anal. Chem. 1988, 60, 1393-1397.
(b) Clark, D. T.; Peeling, J.; Colling, L. Biochim. Biophys. Acta 1976, 453,
533-545.
X-ray Photoelectron Spectroscopy. XPS was performed on a Kratos
HSi spectrometer as previously described,9a with binding energies
referenced to Au (4f7/2) at 84.0 eV. Thickness was calculated by area
integration of the Au (4f7/2) peak before and after Ar+ sputtering for
(23) Cadman, P.; Evans, S.; Scott, J. D.; Thomas, J. M. J. Chem. Soc.,
Faraday Trans. 2 1975, 71, 1777-1784.
(24) Troughton, E. B.; Bain, C. D.; Whitesides, G. M.; Nuzzo, R. G.;
Allara, D. L.; Porter, M. D. Langmuir 1988, 4, 365-385.