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A. Morohashi et al. / Tetrahedron 56 (2000) 8995±9001
Synthesis of references for the ¯uorescent derivative 16
(8.8 mg) in a (Et4N)2CO3 (9.6 mg) in CH2Cl2 (1 ml) for
4 h under stirring at rt. The ¯uorescent ester 16 was obtained
by puri®cation on silica gel with CHCl3/MeOH (50:1).
To a solution of DMF (550 ml) in CH2Cl2 (8.6 ml) was
added (COCl)2 (900 ml) at 08C. After stirring for 1 h at
08C, MeCN (7.7 ml) and THF (13.7 ml) were added, and
the solution was cooled to 2308C. (R)-3-Methylsuccinic
acid 1-monomethyl ester 17 (1 g in 580 ml pyridine and
13.7 ml THF) was added dropwise for 30 min and the solu-
tion was stirred for 1 h at 2308C and for 30 min at 2208C.
The resultant acid chloride 18 was reduced by adding drop-
wise a THF solution of LiAlH(O-t-Bu)3 (2 g in 10 ml) in
30 min at 2788C. The solution was further stirred for
30 min at 2788C, acidi®ed with 2 M HCl (9.6 ml) brought
to rt, and washed with H2O (20 ml). The aqueous layer was
further extracted with diethylether (10 ml£2). The
combined organic layer was washed with saturated solution
of NaHCO3 and NH4Cl, and dried over MgSO4 to give
aldehyde 19. A mixture of (Ph3PMe)Br (13 g) in THF
(50 ml) (Me3Si)2NNa in THF/H2O (4:6, 15 ml) was stirred
for 15 min at 08C, and aldehyde 19 in THF (5 ml) was
added. The solution was further stirred for 30 min and
washed with saturated NH4Cl solution. The organic layer
was dried over MgSO4 to give ole®n 20. Unpuri®ed ole®n
20 was hydrolyzed in 1N NaOH/90% MeOH (50 ml) for
7 h. The hydrolyzate was diluted with H2O (50 ml) and
extracted ®rst with CH2Cl2 (100 ml£2) and, after acidi®ca-
tion with HCl (20 ml), with CHCl3 (50 ml£2) and diethyl-
ether (50 ml). The combined organic layer was dried over
MgSO4 and puri®ed on silica gel with CHCl3/MeOH (5:1) to
give carboxylic acid 21 (135 mg, m/z 127.2 for [M2H]2).
Carboxylic acid 21 (135 mg) and EDC-HCl (240 mg) were
dissolved in CH2Cl2 (2 ml) and mixed with (R)-naphthyl-
ethylamine (180 mg) for reaction under stirring for 11 h.
Puri®cation of the reaction mixture over silica gel with
hexane/EtOAc (3:1) yielded amide 22 (225 mg, m/z 268.0
for [M1H]1). To a solution of amide 22 (100 mg, in THF
5 ml) was added 0.5 M 9-BBN in THF (1.5 ml) at 08C. The
temperature was brought to rt and the solution was stirred
for 3.5 h at rt. The second addition of 9-BBN was made and
the solution was stirred for 1.5 h. The hydroborate adduct
was oxidized by adding 3N NaOH (1 ml) and H2O2 (1 ml) at
08C and by stirring the mixture for 10 h at rt. The reaction
mixture was diluted with H2O (20 ml) and extracted with
EtOAc (20 ml£2). The combined organic layer was washed
with saturated NaCl solution (10 ml), dried over MgSO4 and
the residue was puri®ed over silica gel with hexane/EtOAc
(1:10) to give alcohol 23 (m/z 286.0 for [M1H]1). Solution
of (COCl)2 (300 ml in 3 ml CH2Cl2) and DMSO (300 ml)
were mixed at 2788C and stirred for 10 min. Alcohol 23 in
CH2Cl2 (2 ml) was added and stirring continued for another
15 min. Triethylamine was added and the solution was
brought to rt under stirring. A saturated solution of NH4Cl
(20 ml) was added and the reaction mixture was extracted
with diethyl ether (20 ml). The organic layer was dried over
MgSO4 to give aldehyde 24 (m/z 284.0 [M1H]1). The alde-
hyde 24 was oxidized with NaClO2 (100 mg) in a solution
containing 2-methyl-2-butene (200 ml) and NaH2PO4
(60 mg) in 10 ml of t-BuOH/H2O (7:3). After 3 h, the reac-
tion mixture was acidi®ed with dil. HCl, extracted with
CHCl3 (10 ml), and dried over MgSO4. Puri®cation of the
residue on silica gel with CHCl3/MeOH (5:1) yielded
carboxylic acid 25 (90 mg) {m/z 298.0 [M1H]1}. The
carboxylic acid 25 was reacted with (S)-1A2P-OTf
1
(R)-16: H NMR (300 MHz, CDCl3): d 0.92 (3H, d), 1.23
(3H, d), 1.68 (3H, d), 2.04 (1H, dd), 2.23 (3H, m), 2.35 (1H,
dd), 3.82 (2H, d), 5.27 (1H, dd), 5.99 (1H, m), 6.48 (amide,
d), 7.42, 7.51, 7.54, 7.62, 7.78, 7.83, 8.09, 8.43, 8.60 (naph
and anthracene), ESIMS; 587.2 [M1H]1.
Preparation of a diastereomixture standard from
3-methylglutaric acid (26)
3-Methylglutaric acid 26 (365 mg) was subjected to reaction
with (R)-naphthylethylamine (970 mg) and EDC-HCl
(479 mg) in CH2Cl2 (4 ml) for 10 h under stirring. The reac-
tion mixture was diluted with CHCl3 (30 ml) and washed
with 1N HCl (10 ml). The organic layer was dried over
MgSO4, and the residue was chromatographed on silica
gel with CHCl3/MeOH (10:1) to give half amide 27
(522 mg). The amide 27 (180 mg), EDC-HCl (120 mg),
and (R)-1A2P-OH (61 mg) were dissolved in CH2Cl2
(4 ml) and stirred for 10 h. The reaction mixture was diluted
with EtOAc (50 ml) and washed successively with 1N HCl
(30 ml), H2O (30 ml), and NaHCO3 (30 ml). The organic
layer was dried over MgSO4 and chromatographed on silica
gel with CHCl3/MeOH (50:1). The diastereomers of 16 were
separated on a Wakosil-II 5SIL-100 column with CHCl3.
1
(S)-16: H NMR (300 MHz, CDCl3): d 0.90 (3H, d), 1.30
(3H, d), 1.63 (3H, d), 1.97 (1H, dd), 2.23 (3H, m), 2.37 (1H,
dd), 3.86 (2H, d), 5.27 (1H, dd), 5.92 (1H, m), 6.15 (amide,
d), 7.39, 7.52, 7.63,7.83, 8.07, 8.44, 8.57 (naph and anthra-
cene), ESIMS; 587.3 [M1H]1.
Fluorimetric HPLC analysis of 16
The ¯uorimetric HPLC analysis was performed under the
following conditions: column, Cosmosil 5C18 (4.6£
250 mm, Nacalai tesque); solvent, 60% MeCN; ¯ow,
1.6 ml/min; detection, excitation at 298 nm and emission
at 462 nm. The retention time for (S)-16 was 18.30 min
and for (R)-16 19.67 min.
LC/MS analysis of 16
The LC/MS analysis was carried out under the following
conditions: column, Capcell pak (2.0£150 mm, Shiseido);
solvent, 60% MeCN; ¯ow, 0.4 ml/min; mass spectrometer,
Finnigan mat TSQ-700; ion mode, positive; capillary
celsius, 2508C; electron multiplier, 1200 V; sheath gas, 60
psi; auxiliary gas, 20 ¯ow-units; dwell time, 2.0 s. The
retention time 24.34 min for (S)-16 and 26.27 min for
(R)-16.
Acknowledgements
The authors acknowledge Professor H. Ohrui at Tohoku
University for his generous gift of AP-OTf and Professor
T. Kusumi at Tokushima University and Professor M.
Murata at Osaka University for discussions. This work
was supported by a Grant-in-Aid from the Ministry of