
Journal of the American Chemical Society p. 4120 - 4127 (1980)
Update date:2022-08-05
Topics:
M'Halla, F.
Pinson, J.
Saveant, J. M.
The first step following the initial formation of the anionic radical in the electrochemical reduction of aromatic halides in the cleavage of the C-X bond leading to the neutral Ar. radical.The latter species undergoes three concurrent reactions: H-atom abstraction from the solvent and electron transfer at the electrode and/or from the initial anion radical.The quantitative analysis of this threefold competition allows one to predict the effect of the intrinsic (rate constants) and operational (concentration, stirring rate, cell geometry) parameters.It is the basis on which the results of deuterium incorporation by deuterated water or solvent can be used as a tool to investigate the reaction mechanism and to determine the characteristic rate constants.This is illustrated by the study of the chloro, bromo, and iodo derivatives of three aromatic residues (9-anthryl, 1-naphthyl, and 4-cyanophenyl) in Me2SO and acetonitrile.It is shown that the proposed reduction mechanism is indeed followed in each case and the degree of competition between the three concurrent steps can be evaluated.Using the values obtained independently (by cyclic voltammetry or redox catalysis) for the cleavage rate of the anion radicals of the chloro compounds, the corresponding rates for the bromo and iodo derivatives are determined as well as the rates of H-atom transfer to the three aromatic radicals and the magnitude of the corresponding deuterium isotope effects.
View MoreTianjin Chemsyntech Chemical Co., Ltd
Contact:+86-22-60872258
Address:Haitai green industry base in Tianjin, K1,5-601
jiangsu hualin chemical co.,ltd.
Contact:86-25-87787402
Address:jaingsu,china
Contact:+86-10-62651721
Address:29 Yongxing Road, Daxing District,Beijing China
Ji'an Hairui Natural Plant Co. Ltd.
Contact:0796-8105528
Address:Meilin industry park, Qingyuan district Ji'an City, Jiangxi Province
Beijing Mashi Fine Chemical Co.,Ltd.
Contact:+86-10-61271592
Address:Room 506, Section B, Kaichi Mansion, Industrial Development
Doi:10.1039/c3md00075c
(2013)Doi:10.1007/s007060200029
(2002)Doi:10.1039/c5ra27653e
(2016)Doi:10.1021/jm049238e
(2005)Doi:10.1016/S0022-1139(00)81962-4
(1987)Doi:10.1016/S0008-6215(00)81159-3
(1971)