4888 J. Phys. Chem. B, Vol. 101, No. 25, 1997
Kappers et al.
to the uncertainty in the composition data and in part to the
fact that the model does not account for variations in the
concentrations of the reactants along the reactor. This latter
problem could be solved by incorporating the model with
differential mass balances for each reactant and then integrating
these equations over the reactor length.
Chemistry program (Grant No. DMR-9422602), and Chemical
Thermal Systems program (Grant No. CTS-9531785). In
addition, material in this study is based upon work supported
by a National Science Foundation Graduate Fellowship to
K.J.W. All of this support is greatly appreciated.
References and Notes
Alkyl ligand exchange of the group III organometallic
precursors in III-V MOVPE has been reported by Grady et
al.26 They observed ligand exchange between trimethylamine
alane and trimethylgallium to yield different gallane species and
trimethylaluminum. The large difference in thermal stability
between these compounds lead to nonuniformities in the
composition of the AlxGa1-xAs films deposited in the MOVPE
reactor. These results are consistent with our current investiga-
tion of InxGa1-xAs MOVPE. We have discovered that. even
under low-pressure conditions, the group III precursors trim-
ethylindium and triethylgallium exchange ligands and that this
affects the segregation behavior of indium in the film.27
From the results presented in this study, we may conclude
that growing Cd0.96Zn0.04Te with ∆y ) 0.001 cannot be
accomplished in a horizontal flow reactor because of the
thorough upstream mixing of DMCd with DEZn. On the other
hand, Cd0.96Zn0.04Te has been successfully grown on GaAs/Si
substrates at 523-553 K using a high-speed, rotating-disc
reactor.28-30 We suspect that in this reactor the DMCd and
DEZn are fed through separate injection manifolds in the reactor
headplate. This design, together with rapid mixing of the gases
above the substrate, makes it possible to deposit alloy films of
uniform composition over the entire substrate. Complex reactor
designs of this type are essential when ligand exchange reactions
of the sources leads to large differences in their thermal stability.
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Conclusions
We have discovered that ligand exchange reactions occur
between the group II precursors during II-VI MOVPE. This
appears to be a general phenomenon in the growth of II-VI
and III-V alloys by this technique.26,27 Although ligand
exchange is well-documented in organometallic chemistry, its
impact on the MOVPE process has not been widely recognized.
With regard to Cd1-yZnyTe film growth, ligand exchange
produces unstable cadmium compounds, DECd and MECd, and
very stable zinc compounds, DMZn and MEZn. The large
difference in reactivities of these sources makes it very difficult
to uniformly incorporate controlled amounts of zinc into the
alloy film over the entire area of the heated substrate.
(28) Tompa, G. S.; Salagaj, T; Cook, L.; Stall, R. A.; Nelson, C. R.;
Anderson, P. L.; Wright, W. H.; Ahlgren, W. L.; Johnson, S. M. J. Cryst.
Growth 1991, 107, 198.
(29) Johnson, S. M.; Vigil, J. A.; James, J. B.; Cockrum, C. A.; Cockrum,
C. A.; Konkel, W. H.; Kalisher, M. H.; Risser, R. F.; Tung, T.; Hamilton,
W. J.; Ahlgren, W. L.; Myrosznyk, J. M. J. Electron Mater. 1993, 22, 835.
(30) Anderson, P. L.; Erbil, A.; Nelson, C. R.; Tompa, G. S.; Moy, K.
J. Cryst. Growth 1994, 135, 383.
Acknowledgment. The authors thank Dr. Kelvin Higa for
useful discussion of the results. Funding for this research was
provided by the Office of Naval Research (Award No. N00014-
95-1-0904), the National Science Foundation, Solid-State