
Synthetic Communications p. 212 - 220 (2019)
Update date:2022-09-26
Topics:
Karaki, Fumika
Kuwada, Miki
Tajiri, Saki
Kanda, Misaki
Yanai, Mari
Kamimura, Mitsuhiro
Itoh, Kennosuke
Fujii, Hideaki
Protecting groups are indispensable in organic synthesis and there is a great need for a variety of deprotection methods. Here, we investigated the scope of the application of a deprotection procedure using SO3H silica gel, which we have previously reported as a desilylation procedure. Under these conditions, -OMOM, -OSEM, -OTHP, and -OAc groups and dimethyl acetal were cleaved. Pivaloyloxy, benzyloxy and methoxy carbonyl groups remained intact and selective deprotection of TBS groups in the presence of other protecting groups was accomplished. We succeeded in cleaving an acetyl group on a secondary alcohol in a highly polar nortropine derivative. Our findings here provide another deprotection option and would be helpful in the synthesis of multifunctional compounds.
View MoreContact:+86-0592 5353131
Address:No.56 Guani Road Software Park 2,Siming District
Hubei Danao Pharmaceutical Co.,Ltd.
website:http://www.danaopharm.com
Contact:+86-719-5251167
Address:Fandan Road,Danjiangkou,Hubei
Contact:86-551-63540590
Address:No 1388 Furong Rd., Hefei, Anhui, China
Jiangxi Hito Chemical Co., Ltd.
Contact:+86-792-3170318
Address:No. 6, Tianhong Ave., Xinghuo Industry Park, Yongxiu, Jiujiang, Jiangxi, China
website:http://www.vanzpharm.com/en/index.html
Contact:86-27-84492310
Address:FANHU INDUSTRY PARK
Doi:10.1081/CAR-200045260
(2004)Doi:10.1021/om050623r
(2005)Doi:10.1007/BF00480397
()Doi:10.1021/ja00967a026
(1966)Doi:10.1002/hlca.193401701200
(1934)Doi:10.1039/P29760001322
(1976)