1090
M.B. Faraoni et al. / Journal of Organometallic Chemistry 691 (2006) 1085–1091
CGL-Ms 6890/5972 (capillary column HP5-Ms 30 m ·
0.25 mm · 0.25 lm) using the corresponding patterns (see
Table 4).
(19%, [Si(CH3)2Ph]+); 120 (9%, [Sn]+, Sn-pattern). Anal.
Calc. for C37H48O2Si3Sn: C, 61.07; H, 6.65. Found: C,
60.96; H, 6.48%.
3.4. Mass spectra and elemental analyses of the new vinyltin
compounds
3.4.6. (Z)-Ethyl-3-trineophylstannyl-3-phenylpropenoate
(22)
MS (m/z, rel. int.): 562 (100%, [MꢀNeoph]+, Sn-pat-
tern); 519 (75%, [SnNeoph3]+, Sn-pattern); 428 (3%,
[MꢀNeoph2]+, Sn-pattern); 385 (7%, [SnNeoph2]+, Sn-pat-
tern); 295 (20%, [MꢀNeoph3]+, Sn-pattern); 253 (14%,
[SnNeoph]+, Sn-pattern); 175 (28%, [MꢀSnNeoph3]+);
133 (9%, [Neoph]+); 120 (3%, [Sn]+, Sn-pattern); 105
(7%, [C8H9]+). Anal. Calc. for C41H50O2Sn: C, 71.00; H,
7.27. Found: C, 70.88; H, 7.10%.
3.4.1. (Z)-1-tris[(phenyldimethylsilyl)methyl)]stannyl-2-
phenylethene (5)
MS (m/z, rel. int.): 570 (3%, [Sn(CH2Si(CH3)2Ph)3]+, Sn-
pattern); 521 (100%, [Mꢀ(CH2Si(CH3)2Ph)]+, Sn-pattern);
453 (5%, Sn-pattern); 420 (2%, [Sn(CH2Si(CH3)2Ph)2]+,
Sn-pattern); 315 (21%, Sn-pattern); 270 (11%, [SnCH2-
Si(CH3)2Ph]+, Sn-pattern); 253 (17%, Sn-pattern); 223
(17%, [C8H7Sn]+, Sn-pattern); 197 (17%, Sn-pattern); 150
(6%, [CH2Si(CH3)2Ph]+); 136 (34%, [Si(CH3)2Ph]+); 120
(15%, [Sn]+, Sn-pattern); 77 (2%, [C6H5]+). Anal. Calc.
for C35H46Si3Sn: C, 62.77; H, 6.92. Found: C, 62.66; H,
6.78%.
3.4.7. Z-Ethyl-3-triptycyldimethylstannyl-3-
phenylpropenoate (24)
MS (m/z, rel. int.): 579 (6%, (6%, [M]+, Sn-pattern); 564
(20%, [Mꢀ(CH3)]+, Sn-pattern); 518 (12%, Sn-pattern);
403 (22%, [SnTrip(CH3)2]+, Sn-pattern); 388 (18%,
[SnTripCH3]+, Sn-pattern); 373 (10%, [SnTrip]+, Sn-pat-
tern); 325 (100%, [MꢀTrip]+, Sn-pattern); 280 (30%, Sn-
pattern); 253 (82%, [Trip]+); 150 (11%, [Sn(CH3)2]+, Sn-
pattern); 120 (2%, [Sn]+, Sn-pattern). Anal. Calc. for
C33H30O2Sn: C, 68.66; H, 5.24. Found: C, 68.30; H, 4.90%.
3.4.2. (Z)-3-triptycyldimethylstannyl-2-propen-1-ol (10)
MS (m/z, rel. int.): 445 (6%, [Mꢀ(CH3)]+, Sn-pattern);
403 (5%, [SnTrip(CH3)2]+, Sn-pattern); 373 (2%, [SnTrip]+,
Sn-pattern); 253 (100%, [Trip]+); 150 (41%, [Sn(CH3)2]+,
Sn-pattern); 57 (69%, [MꢀSnTrip(CH3)2]+). Anal. Calc.
for C25H24OSn: C, 65.39; H, 5.27. Found: C, 65.78; H,
5.38%.
3.4.8. (Z)-2-[(tris(phenyldimethylsilyl)methyl)stannyl]-
butenedioic acid dimethylester (26)
3.4.3. (Z)-4-[(tris(phenyldimethylsilyl)methyl)stannyl]-3-
buten-2-one (15)
MS (m/z, rel. int.): 561 (100%, [MꢀCH2Si(CH3)2Ph]+,
Sn-pattern); 452 (20%, Sn-pattern); 289 (12%, Sn-pattern);
261 (12%, [SnC6H7O4]+, Sn-pattern); 227 (31%, Sn-pat-
tern); 197 (13%, Sn-pattern); 150 (21%, [CH2Si(CH3)2Ph]+;
135 (43%, [Si(CH3)2Ph]+; 120 (20%, [Sn]+, Sn-pattern); 105
(8%, [Si(C6H5]+); 59 (4%, [C2H3O2]+). Anal. Calc. for
C33H46O4Si3Sn: C, 55.85; H, 6.53. Found: C, 55.70; H,
6.62%.
MS (m/z, rel. int.): 570 (4%, [Sn(CH2Si(CH3)2Ph)3]+,
Sn-pattern); 487 (100%, [Mꢀ(CH2Si(CH3)2Ph)]+, Sn-pat-
tern); 453 (6%, Sn-pattern); 357 (10%, Sn-pattern); 337
(4%, [Mꢀ(CH2Si(CH3)2Ph)2]+, Sn-pattern); 270 (9%,
[SnCH2Si(CH3)2Ph]+, Sn-pattern); 227 (13%, Sn-pattern);
203 (25%); 197 (28%, Sn-pattern); 135 (53%, [Si-
(CH3)2Ph]+); 120 (19%, [Sn]+, Sn-pattern). Anal. Calc.
for C31H44OSi3Sn: C, 58.58; H, 6.98. Found: C, 58.65; H,
6.80%.
Acknowledgements
This work was supported by grants from CONICET
(Ciudad de Buenos Aires, Argentina) and Universidad
3.4.4. 3-triptycyldimethylstannyl-3-buten-2-one (16)
MS (m/z, rel. int.): 457 (22%, [Mꢀ(CH3)]+, Sn-pattern);
403 (5%, [SnTrip(CH3)2]+, Sn-pattern); 373 (4%, [SnTrip]+,
Sn-pattern); 253 (75%, [Trip]+); 219 (100%, [MꢀTrip]+, Sn-
pattern); 189 (17%, [SnC4H5O]+, Sn-pattern); 135 (9%,
[SnCH3]+, Sn-pattern); 120 (2%, [Sn]+, Sn-pattern). Anal.
Calc. for C26H24OSn: C, 66.27; H, 5.13. Found: C, 66.65;
H, 5.34%.
´
Nacional del Sur (Bahıa Blanca, Argentina). A travel grant
to one of us (JCP) from the Alexander von Humboldt
Foundation (Germany), and a fellowship from DAAD
(Germany) to VID are also gratefully acknowledged.
References
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stannyl]-3-phenylpropenoate (20)
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MS (m/z, rel. int.): 579 (100%, [MꢀCH2Si(CH3)2Ph]+,
Sn-pattern); 429 (21%, [Mꢀ(CH2Si(CH3)2Ph)2]+, Sn-pat-
tern); 420 (1%, [Sn(CH2Si(CH3)2Ph)2]+, Sn-pattern); 279
(4%, [(Mꢀ(CH2Si(CH3)2Ph)3]+ Sn-pattern); 270(6%,
[SnCH2Si(CH3)2Ph]+, Sn-pattern); 227 (20%, Sn-pattern);
197 (7%, Sn-pattern); 150 (7%, [CH2Si(CH3)2Ph]+); 135
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