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5.2. Products formation in ammonia oxidation
expected that the rate of N2O formation is a stronger func-
tion of NH3 and NO partial pressures as compared to those
of NO and N2 formation. As a consequence, the extremely
low reactant peak pressures (1–5 Pa) in a Knudsen diffusion
regime are apparently suitable for a proper formation of NO
and N2 but insufficient for N2O. At the investigated temper-
atures in the TAP reactor, N2O is the N-containing product
formed in the lowest concentration, which is also the case in
industrial ammonia burners [1]. This reasoning can also ex-
plain the no identification of N2O as a reaction product in
surface science studies under ultrahigh vacuum conditions.
As noted in Section 2.2, the peak pressure in the TAP reactor
for a pulse size of 1016 molecules is considerably higher (ca.
109 times) than in UHV. Furthermore, these investigations
have been carried out with nonisotopically labeled ammo-
nia, which makes it impossible to accurately determine the
small amounts of N2O formed.
The shape of the transient responses of NO during O2–
NH3 interactions in sequential pulse experiments (Fig. 5)
clearly indicates that NO is a primary product of the high-
temperature reaction between surface NHx and O species
over Pt and Pt–Rh gauzes. The yield of NO was very sim-
ilar in Knudsen and molecular diffusion regimes (Table 2),
which further supports that gas-phase reactions play no role
in NO formation under the transient vacuum conditions of
the TAP reactor.
With respect to N2 formation, several reaction pathways
can be discussed. Apart from the recombination of NHx frag-
ments [Eq. (11)] at low O/NHx ratios (low O coverage or
excess of NH3) or in the presence of strongly bounded O
species (see Fig. 10), two other processes should be con-
sidered: (i) NO decomposition and (ii) a secondary process
involving NH3 and NO. Single pulsing of NO in Fig. 9 and
previous studies [9,31] have shown the high affinity of re-
duced noble metal surfaces for NO decomposition to N2
[Eq. (16)], with no formation of N2O. However, this pathway
is practically suppressed over oxidized noble metal surfaces,
thus having an insignificant contribution in NH3 oxidation
under excess of O2.
6. Conclusions
The TAP technique offers unique features for investigat-
ing the mechanism and kinetics of the high-temperature am-
monia oxidation:
Sequential pulsing experiments of O2 and NH3 in Fig. 5
have shown a very fast reaction of the formed NO at the time
of the NH3 pulse. As a result, the NO pulse strongly de-
creases and a broad N2 transient response is obtained. These
results strongly suggest that the reduction of NO with ad-
sorbed NHx species [Eq. (17)] is a major pathway to N2 in
ammonia burners, as concluded from UHV studies [9,10].
Selectivity-directing factors toward N2 formation will be fur-
ther assessed in an upcoming manuscript.
– With respect to steady-state techniques, the excellent
control of temperature due to the low amount of gases
pulsed (0.1–10 nmol), as well as the minor influence of
homogeneous processes and wall effects;
– With respect to surface science techniques in UHV, the
use of catalytic surfaces of industrial relevance and the
operation at a much higher peak pressure.
The following mechanistic aspects have been elucidated
from the investigation of primary NH3–O2 interactions over
commercial Pt and Pt–Rh gauzes at 973–1173 K:
2NO + 2s −→ N2 + s–O + s,
s–NHx + NO −→ N2 + s–HxO.
(16)
(17)
Finally, the formation of N2O during NH3 oxidation
should be discussed. As noted in the Introduction, N2O was
never detected as a product during NH3 oxidation over Pt
single crystals in surface science studies under UHV condi-
tions. Overcoming this limitation, our TAP study has demon-
strated N2O formation when a mixture of oxygen and am-
monia was pulsed over Pt and Pt–Rh gauzes in a molecular
diffusion regime. The amount of N2O formed is very small,
not being detected during ammonia oxidation in a Knudsen
diffusion regime, i.e., at low peak pressures. Associated with
the low N2O concentrations, it should be stressed that the
application of isotopically labeled ammonia (15NH3) was
essential in order to uncouple the analysis of N2O and CO2
(due to carbon impurities on the gauze surface) in mass spec-
trometry. The small amounts of N2O formed suggest that the
contribution of NH3 oxidation toward this product is negli-
gible. In fact, a recent TAP study has proven N2O results
from the reaction between adsorbed ammonia intermediates
and nitric oxide over Pt–Rh gauze [35]. Therefore it can be
– Overall, the mechanism of NH3 oxidation was found to
be very similar over gauzes having different composi-
tion (Pt or Pt–Rh) and geometry (knitted or woven).
– NH3 activation requires the presence of adsorbed oxy-
gen species on the catalyst surface. Reduced metal sur-
faces show no activity for ammonia decomposition.
– NO is a primary product of NH3 oxidation and its se-
lectivity is favored at high O coverage. Nonetheless,
the nature of oxygen species is also suggested to influ-
ence the product distribution of NO and N2. Strongly
bounded oxygen species activate ammonia and lead to
a high N2 selectivity by recombination of NHx species.
On the contrary, weakly bounded oxygen species are ef-
fectively transferred into the NHx intermediates yielding
NO. Accordingly, the highest NO yield is achieved when
NH3 and O2 are simultaneously pulsed over the Pt and
Pt–Rh gauzes.
– The selectivity toward NO does not strongly depend on
the diffusion regime (Knudsen or molecular), indicating