HDN KINETICS OF o-TOLUIDINE ON Ni-W/Al2O3(F)
199
be expected because it is well known that fluorine is lo- jacent vacancies where TOL can adsorb and react, and the
cated on the alumina support and not on the active metal higher stackingfavorsthe adsorption ofTOL on the catalyst
sulfide. This means that the fluorine effect must be indirect. via the phenyl �-system. The hydrogenation of CHE does
How does fluorination of the alumina support influence the not require adjacent vacancies, and therefore, the change
number of sites of the metal sulfide phase? A higher dis- in the morphology of the catalyst surface has little effect
persion of the metal sulfide cannot be the explanation be- on it. Incorporation of nickel in the tungsten catalysts cre-
cause fluorination decreases the dispersion of the tungsten ates a new type of active site, a nickel-associated sulfur va-
phase on the catalyst surface (6, 11, 63). Transmission elec- cancy with a much higher activity for hydrogenation than
tron microscopymeasurementsshowed that fluorination in- the tungsten-associated sulfur vacancy.
creased the stacking and the length of WS2 slabs (5, 64). Our
QEXAFS results also showed that fluorine increased the
size of the WS2 crystallites (9). WS2 crystallites are well
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the hydrogenation of alkenes requires one vacancy, the
adsorption of MCHA is through its amine group, and the
hydrogenation of TOL requires more vacancies to accom-
modate the phenyl ring. The bigger WS2 particles may con-
tain more adjacent vacancies, which are the active centers
for TOL hydrogenation. Furthermore, the higher stacking
provides more space for the flat adsorption of TOL on
these active centers. Considering that fluorine hardly influ-
ences the hydrogenation of CHE and the HDN of MCHA
and that it increases the hydrogenation of TOL, we con-
clude that the higher stacking of WS2 is the origin of the
promotional effect of fluorine on the HDN of TOL.
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3
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