
Journal of the Chemical Society - Faraday Transactions p. 1751 - 1756 (1990)
Update date:2022-08-11
Topics:
Frost, Michael J.
Smith, Ian W. M.
The kinetics of the reactions of CH3O and C2H5O radicals with NO2 have been studied using pulsed laser photolysis to create the radicals from the corresponding alkyl nitrite and by time-resolved, laser-induced fluorescence to observe the decay of the radical concentration.At 295 K, rate constants for CH3O+NO2 have been measured in the presence of Ar (6-100Torr), He(30-100 Torr) and CF4 (30-125 Torr).The association reaction to CH3ONO2 appears to predominate, and rate constants in the limit of low and high pressure are deduced: (k0/10E-29 cm6 molecule-2 s-1) =2.8+/-0.6(M=Ar); 1.6 +/- (M=He); 3.4+/-1.0(M=CF4), and (kinfinite/10E-11 cm3 molecule-1 s-1)=2.0+/-0.4, where the quoted errors correspond to two standard deviations.A limited number of measurements is also reported for this reaction at 390K.The rate of the reaction of C2H5O with NO2 at 295 K is found to be same in the presence of 15 and 100 Torr of Ar, and the measurements yield a rate constant: (kinfinite/10E-11 cm3 molecule-1 s-1) =2.8+/-0.3.
View MoreJIANGXI ZHANGFENG CHEMICAL CO., LTD.
Contact:+86-0799-3413066
Address:Xiyuan village, Xiabu Town, Xiangdong District
Shanghai PotentPharm Science and Technology Co.,Ltd
Contact:86-021-51969655
Address:Unit B, Building 18, No.300, Chuantu Rd,Pudong District, Shanghai 201202, China
Shanghai ZaiQi Bio-Tech Co., Ltd.,
Contact:+86-21-5482 4098
Address:Bldg. No.7, No.201 MinYi Rd,Songjiang CaoHeJing High-Tech Park Shanghai 201516 P,R,China
Sichuan Sangao Biochemical Co., Ltd
Contact:+86-28-84874233
Address:19F, Bldg.2, Shudu Center, Tianfu 2nd St., Hi-tech zone, Chengdu 610041, Sichuan Province, China.
Luoyang Aoda chemical Co.,Ltd.
Contact:+86-379-67518785 67516588
Address:MiaoWan industry district,YanShi City,Henan,China
Doi:10.1002/pola.26973
(2014)Doi:10.1002/ejoc.201300052
(2013)Doi:10.1562/2004-05-11-RA-163.1
(2004)Doi:10.1039/C8CC06390G
(2018)Doi:10.1021/acs.inorgchem.0c02668
(2021)Doi:10.1039/DT9820001959
(1982)