Full text of DOI:10.1063/1.107920

Ultravioletinduced annealing of hydrogen bonds in silica films deposited at low
temperatures
C. Debauche, C. Licoppe, J. Flicstein, O. Dulac, and R. A. B. Devine
Citation: Applied Physics Letters 61, 306 (1992); doi: 10.1063/1.107920
View online: http://dx.doi.org/10.1063/1.107920
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/61/3?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
193.0.65.67 On: Wed, 26 Nov 2014 10:25:51

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
193.0.65.67 On: Wed, 26 Nov 2014 10:25:51

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
193.0.65.67 On: Wed, 26 Nov 2014 10:25:51