THERMOCHEMICAL AND SPECTROSCOPIC STUDIES OF CHEMICALLY VAPOR-DEPOSITED AMORPHOUS SILICA.

Article abstract of DOI:10.1149/1.2108514

Two kinds of low pressure CVD SiO//2 samples, heterogeneous film and homogeneous 'snow', have been collected on stainless steel substrates at three different deposition temperatures: 523, 643, and 703 K. They have been characterized thermodynamically by t

Full text of DOI:10.1149/1.2108514

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Downloaded on 2015-06-05 to IP 131.230.73.226 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-05 to IP 131.230.73.226 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-05 to IP 131.230.73.226 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-05 to IP 131.230.73.226 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-05 to IP 131.230.73.226 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-05 to IP 131.230.73.226 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).