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PREPARATION AND PROPERTIES OF CVD OXIDES WITH LOW CHARGE LEVELS FROM SiH4-CO2-HCl-H2 SYSTEM.

DOI: 10.1149/1.2132794

Source and publish data:

Journal of the Electrochemical Society p. 238 - 246 (1976)

Update date:2022-08-29

Topics:

Authors:

GaindGaind

AckermannAckermann

NagarajanNagarajan

BratterBratter

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Article abstract of DOI:10.1149/1.2132794

When SiO//2 is deposited from the SiH//4CO//2-HCl-H//2 system at approximately 1000 C, the resulting films are equivalent to or better than dry O//2 grown SiO//2 in electrical properties. The addition of HCl to the SiH//4-CO//2-H//2 system reduces the Q//

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Full text of DOI:10.1149/1.2132794

Downloaded on 2015-03-13 to IP 130.102.42.98 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  
Downloaded on 2015-03-13 to IP 130.102.42.98 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  
Downloaded on 2015-03-13 to IP 130.102.42.98 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  
Downloaded on 2015-03-13 to IP 130.102.42.98 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  
Downloaded on 2015-03-13 to IP 130.102.42.98 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  
Downloaded on 2015-03-13 to IP 130.102.42.98 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  
Downloaded on 2015-03-13 to IP 130.102.42.98 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  
Downloaded on 2015-03-13 to IP 130.102.42.98 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  
Downloaded on 2015-03-13 to IP 130.102.42.98 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).  

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