Production of Copper Thin Films
1–3; b) R. E. P. Winpenny, J. Chem. Soc., Dalton Trans. 2002,
1–10; R. E. P. Winpenny, Adv. Inorg. Chem. 2001, 52, 1.
[2] a) D. Gatteschi, R. Sessoli, A. Cornia, Chem. Commun. 2000,
725–732; b) D. Gatteschi, R. Sessoli, Angew. Chem. Int. Ed.
2003, 42, 268–297.
[3] J. S. Miller, D. A. Dougherty, Mol. Cryst. Liq. Cryst. 1989, 176.
[4] J. S. Miller, M. Drillon, Magnetism: Molecules to Materials,
Wiley-VCH, Weinheim, Germany, 2001–2002, vol. 1–4.
[5] D. Gatteschi, L. Pardi, A. L. Barra, A. Müller, J. Döring, Na-
ture 1991, 354, 463–465.
through cannula to remove the NaCl produced. The filtrate was
evaporated to dryness under vacuum and the solid was redissolved
in 5 mL of toluene and stored at –10 °C for one week to give blue
crystals suitable for X-ray diffraction; yield 79%, m.p. 138 °C.
C22H44ClCu3N3O7 (688.67): calcd. C 38.37, H 6.44, N 6.10; found
C 37.98, H 6.29, N 5.63. FT-IR (KBr): ν = 2964 (m), 2896 (w),
˜
1579 (s), 1551 (m), 1528 (s), 1461 (s), 1413 (w), 1389 (w), 1277 (m),
1261 (m), 1184 (w), 1071 (s), 1021 (s), 952 (s), 900 (m), 785 (s), 650
(m), 614 (m), 513 (m), 455 (s) cm–1. TGA: 71–255 °C (21.55%
weight loss); 255–276 °C (39.52% weight loss); 276–350 °C (residue
25.99%).
[6] C. Delfs, D. Gatteschi, L. Pardi, R. Sessoli, K. Wieghardt, D.
Hanke, Inorg. Chem. 1993, 32, 3099–3103.
[7] a) R. Sessoli, D. Gatteschi, A. Caneschi, M. A. Novak, Nature
1993, 365, 141–143; b) S. M. J. Aubin, N. R. Dilley, M. Wem-
ple, M. B. Maple, G. Christou, D. N. Hendrickson, J. Am.
Chem. Soc. 1998, 120, 839–840; c) A. Cornia, D. Gatteschi, R.
Sessoli, Coord. Chem. Rev. 2001, 219, 573–604.
[8] I. G. Dance, in: Comprehensive Coordination Chemistry (Eds.:
G. Wilkinson, R. D. Gillard, J. A. McCleverty), Pergamon, Ox-
ford, U. K., 1987, vol. 1, pp. 135.
Synthesis of [Cu(dmae)(TFA)]4 (3): 0.71 g (7.96 mmol) of dmaeH
and 1.07 g (7.96 mmol) of trifluoroacetic acid (TFAH) were added
to a suspension of 1.0 g (7.96 mmol) of Cu(OCH3)2 [which was
synthesized by the reaction of an appropriate amount of CuCl2
(anhydrous) with CH3OLi in dry methanol] in 20 mL of THF. The
reaction mixture was stirred for 2 h at room temperature, evapo-
rated to dryness under vacuum and then the solid was redissolved
in 10 mL of THF to give blue crystals suitable for X-ray diffraction;
yield 80%, m.p. 210 °C. C24H40Cu4F12N4O12 (1058.80): calcd. C
27.23, H 3.80, N 5.29; found C 27.93, H 3.88, N 5.62. FT-IR (KBr):
[9] A. Muller, F. Peters, M. T. Pope, D. Gatteschi, Chem. Rev.
1998, 98, 239–271.
[10]
a) M. Hamid, A. A. Tahir, M. Mazhar, F. Ahmad, K. C. Mol-
loy, G. Kociok-Kohn, Inorg. Chim. Acta 2008, 361, 188–194;
b) M. Hamid, A. A. Tahir, M. Mazhar, M. Zeller, K. C. Mol-
loy, A. D. Hunter, Inorg. Chem. 2006, 45, 10457–10466.
S. Wang, J. Cluster Sci. 1995, 6, 463–484.
a) D. C. Bradley, Chem. Rev. 1989, 89, 1317–1322; b) O. Ponce-
let, L. G. Hubert-Pfalzgraf, J. C. Daran, R. J. Astier, J. Chem.
Soc., Chem. Commun. 1989, 1846–1848; c) K. G. Caulton,
L. G. Hubert-Pfalzgraf, Chem. Rev. 1990, 90, 969–995; d) O.
Poncelet, W. J. Sartain, L. G. Hubert-Pfalzgraf, K. Folting,
K. G. Caulton, Inorg. Chem. 1989, 28, 263–267; e) S. C. Goel,
M. Y. Chiang, W. E. Buhro, Inorg. Chem. 1990, 29, 4640–4646.
M. F. Yan, Ceramic Superconductors, American Ceramic Soci-
ety, Westerville, OH, 1988.
ν = 2982 (m), 2923 (w), 2884 (m), 1692 (s), 1593 (m), 1466 (w),
˜
1420 (m), 1276 (w), 1210 (m), 1202 (s), 1135 (s), 1120 (m), 1065 (s),
1016 (m), 952 (s), 901 (m), 839 (m), 795 (s), 726 (s), 637 (m), 525
(m), 432 (w) cm–1. TGA: 175–300 °C (residue 27.76%).
[11]
[12]
Deposition of Thin Films: Copper thin films were deposited on a
soda glass substrate in a hot-walled reactor by gas-phase reactions
of the precursors in an argon environment at atmospheric pressure
using a self-designed Aerosol-Assisted Chemical Vapor Deposition
assembly described elsewhere.[36] The substrates of dimensions
1.5ϫ3 cm were degreased by successive treatment with acetone and
water and positioned horizontally in a glass tube in a furnace fitted
with an aerosol generator. The argon carrier gas flow rate was ad-
justed at 25 cm3/min and the precursor solution (0.3 g/25 mL) was
injected at a rate of 0.2 mL/min. Optimum parameters for the
growth of thin films are listed in Table 3.
[13]
[14]
a) P. Doppelt, Microelectron. Eng. 1997, 38, 89–95; b) V. N.
Vertoprakhov, S. A. Krupoder, Russ. Chem. Rev. 2000, 69,
1057–1082.
[15]
[16]
[17]
[18]
Y. Chi, P.-F. Hsu, C.-S. Liu, W.-L. Ching, T.-Y. Chou, A. J.
Carty, S.-M. Peng, G.-H. Lee, S.-H. Chuang, J. Mater. Chem.
2002, 12, 3541–3550.
a) N. Awaya, K. Ohno, Y. Arita, J. Electrochem. Soc. 1995, 142,
3173–3179; b) Y. D. Chen, A. Reisman, I. Turlik, D. Temple, J.
Electrochem. Soc. 1995, 142, 3903–3911.
a) H. Choi, S. Hwang, Chem. Mater. 1998, 10, 2326–2328; b)
A. Devi, J. Goswami, R. Lakshmi, S. A. Shivashankar, S.
Chandrasekwran, J. Mater. Res. 1998, 13, 687–692.
H. S. Horowitz, S. J. McLain, A. W. Sleight, J. D. Druliner,
P. L. Gai, M. J. VanKavelaar, J. L. Wagner, B. D. Biggs, S. J.
Poon, Science 1989, 243, 66–69.
Table 3. Growth conditions for the deposition of copper thin film
by AACVD.
Parameters
Values
Precursor concentration
0.3 g/25 mL (toluene)
Carrier gas (Ar) flow rate [cm3/min] 25
Sample solution injection [mL/min]
Substrate
Deposition time
0.2
soda glass
125 min
Deposition temperature
450 °C for 1
350 °C for 2
300 °C for 3
[19]
[20]
S. C. Goel, K. S. Kramer, M. Y. Chiang, W. E. Buhro, Polyhe-
dron 1990, 9, 611–613.
a) J. Hambrock, R. Becker, A. Birkner, J. Weiß, R. A. Fischer,
Chem. Commun. 2002, 68–69; b) R. Becker, A. Devi, J. Weiß,
U. Weckenmann, M. Winter, C. Kiener, H.-W. Becker, R. A.
Fischer, Chem. Vap. Deposition 2003, 9, 149–156.
Acknowledgments
[21]
[22]
E. Lay, Y.-H. Song, Y.-C. Chiu, Y.-M. Lin, Y. Chi, A. J. Carty,
S.-M. Peng, G.-H. Lee, Inorg. Chem. 2005, 44, 7226–7233.
a) V. M. Donnelly, M. E. Gross, J. Vac. Sci. Technol. A 1993,
11, 66–77; b) P.-F. Hsu, Y. Chi, T.-W. Lin, C.-S. Liu, A. J. Carty,
S.-M. Peng, Chem. Vap. Deposition 2001, 7, 28–31.
H. K. Shin, K.-M. Chi, M. J. Hampden-Smith, T. T. Kodas,
J. D. Farr, M. F. Paffett, Mat. Res. Soc. Symp. Proc. 1990, 204,
421.
a) V. L. Young, D. F. Cox, M. E. Davis, Chem. Mater. 1993, 5,
1701–1709; b) P. Doppelt, Coord. Chem. Rev. 1998, 178–180,
1785–1809.
a) J. A. T. Norman, D. A. Robert, A. K. Hochberg, P. Smith,
J. E. Peterson, J. E. Parmeter, C. A. Apblett, T. R. Omstead,
M. S., A. A. T., M. H., and M. M. would like to thank the Higher
Education Commission Islamabad, Pakistan for financial support
through the “Indigenous 5000 and open merit 200 Ph. D. Scholar-
ship Scheme” and Pakistan Science foundation [PSF/RES/C-QU/
CHEM(408)]. The X-ray diffractometer at Youngstown State Uni-
versity was funded by NSF Grant 0087210, Ohio Board of Regents
Grant CAP-491, and by Youngstown State University.
[23]
[24]
[25]
[1] a) P. Braunstein, L. A. Oro, P. R. Raithby, Metal Clusters in
Chemistry, Eds.; Wiley-VCH, Weinheim, Germany, 1999, vols.
Eur. J. Inorg. Chem. 2009, 1043–1050
© 2009 Wiley-VCH Verlag GmbH & Co. KGaA, Weinheim
www.eurjic.org
1049