
Chemistry Letters p. 1051 - 1052 (1997)
Update date:2022-08-29
Topics:
Satsuma, Atsushi
Sugiyama, Naruaki
Kamiya, Yuichi
Hattori, Tadashi
Silica species prepared by in-situ method using silicon alkoxide as precursor were found to be active for radical type oxidation of butane at low temperatures, i.e., below 650 K.
View More
Shanghai Massive Chemical Technology Co., Ltd.
website:http://www.massivechem.com/
Contact:+86 21 34943721
Address:Room 435, 4th floor, Building 9, No. 2568 Gudai Road,Minhang District, Shanghai,
Contact:+44 (0)2036089360-31
Address:Chanceryhouse,Chancery Lan
Sichuan Sangao Biochemical Co., Ltd
Contact:+86-28-84874233
Address:19F, Bldg.2, Shudu Center, Tianfu 2nd St., Hi-tech zone, Chengdu 610041, Sichuan Province, China.
Hangzhou J&H Chemical Co., Ltd.
website:http://www.jhechem.com/
Contact:+86-571-87396432
Address:No.200 Zhenhua Rd.Xihu Industrial Park, Hangzhou 310030, China
Contact:13357117572
Address:No.149 Shiji dadao Road.
Doi:10.1039/c2cc33742h
(2012)Doi:10.1021/j100191a031
(1992)Doi:10.1055/s-0036-1589039
(2017)Doi:10.1155/2012/930251
(2012)Doi:10.1016/0031-9422(80)83070-6
(1980)Doi:10.1246/cl.1988.285
(1988)