Full text of DOI:10.1063/1.100931

Localized silicon etching using a lasergenerated Cl source
G. V. Treyz, R. Scarmozzino, R. Burke, and R. M. Osgood Jr.
Citation: Applied Physics Letters 54, 561 (1989); doi: 10.1063/1.100931
View online: http://dx.doi.org/10.1063/1.100931
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/54/6?ver=pdfcov
Published by the AIP Publishing
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
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This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
132.174.255.116 On: Tue, 02 Dec 2014 20:44:11

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
132.174.255.116 On: Tue, 02 Dec 2014 20:44:11

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
132.174.255.116 On: Tue, 02 Dec 2014 20:44:11