h ¼ (I
0
ꢁ I/I
0
) ꢀ 100%
114, 3418; (f) J. Hu, L. Ronger, J. H. Yip, Y. K. Wong, D. L. Ma
and J. J. Vittal, Organometallics, 2007, 26, 6533; (g) V. W.-W. Yam,
R. P. L. Tang, K. M. C. Wong and K. K. Cheung, Organometallics,
Where, I is the initial fluorescence intensity of the fluorophore
0
2001, 20, 4476; (h) S. Das and P. K. Bharadwaj, Inorg. Chem., 2006,
5, 5257; (i) S. Das and P. K. Bharadwaj, Org. Lett., 2005, 7, 1573;
and I is the fluorescence intensity after a period of exposure time.
4
(
(
j) S. Das and P. K. Bharadwaj, Cryst. Growth Des., 2007, 7, 1192;
k) W. Ming, V. Vajpayee, S. Shanmugaraju, Y. P. Zheng, Z. Zhao,
Acknowledgements
H. Kim, P. S. Mukherjee, K.-W. Chi and P. J. Stang, Inorg. Chem.,
011, 50, 1506; (l) S. Shanmugaraju, A. K. Bar, S. J. Joshi,
Y. P. Patil and P. S. Mukherjee, Organometallics, ASAP, 2011, DOI:
0.1021/om2000019.
2
S.S. gratefully acknowledges the Council of Scientific and Industrial
Research, New Delhi, India for the award of research fellowship. P.
S.M. and S.A.J thank the Department of Science and Technology
1
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