References
1
(a) P. Bertrand, A. Jonas, A. Laschewsky and R. Legras, Macro-
mol. Rapid Commun., 2000, 21, 319; (b) P. T. Hammond, Cur.
Opin. Colloid Interface Sci, 1999, 4, 430.
2
3
4
5
G. Decher and J. D. Hong, Ber. Bunsen-Ges. Phys. Chem., 1991,
95, 1430.
G. Decher and J. D. Hong, Makromol. Chem., Macromol. Symp.,
991, 46, 321.
G. Decher, J. D. Hong and J. Schmidt, T hin Solid Films, 1992,
1
2
10, 831.
G. Mao, Y. Tsao, M. Tirrell, H. T. Davis, V. Hessel and H.
Ringsdorf, L angmuir, 1995, 11, 942.
6
7
Y. Lvov, K. Ariga and T. Kunitake, Chem. L ett., 1994, 2323.
A. K. Kakkar, S. Yitzchaik, S. B. Roscoe, F. Kubota, D. S. Allan,
T. J. Marks, W. Lin and G. K. Wong, L angmuir, 1993, 9, 388.
(a) S. Watanabe and S. L. Regen, J. Am. Chem. Soc., 1994, 116,
Scheme 2 One of the photoreactions taking place in a PVPhÈDR
multilayer Ðlm, in which the H-bond converts to an ether bond.
8
8
855.
bond, ÈCOOCÈ, under UV irradiation. The hydrogen bond,
8b V. V. Tsukruk, V. N. Bliznyuk and F. Rinderspacher, Polym.
Prepr., 1996, 37, 571; (c) V. V. Tsukruk, F. Rinderspacher and V.
N. Bliznyuk, L angmuir, 1997, 13, 2171.
ÈphÈN `É É ÉHOÈPhÈ, in the DRÈPVPh Ðlm structure con-
2
verts to a covalent ether bond, following decomposition of the
9
T. M. Cooper, A. L. Campbell and R. L. Crane, L angmuir, 1995,
11, 2713.
ÈN ` group, represented in Scheme 2.
2
The reaction of the intermediate (cation or free radical)
1
0
J. H. Fendler and F. C. Meldrum, Adv. Mater., 1995, 7, 607.
formed from decomposition of the ÈN ` group is rather
11 (a) W. B. Stockton and M. F. Rubner, Macromolecules, 1997, 30,
2717; (b) M. Gao, B. Richter and S. Kirstein, Adv. Mater., 1997,
2
complex.22 It can react with ÈOH to form an ether bond or it
9
, 802; (c) N. I. Kovtyukhova, P. J. Ollivier, B. R. Martin, T. E.
Mallouk, S. A. Chizhik, E. V. Buzaneva and A. D. Gorchinskiy,
Chem. Mater., 1999, 11, 771.
can react with the phenyl moiety of PVPh via electrophilic
substitution to form a CÈC bond, and so on. However, it is
difficult to detect these bonds directly in the Ðlm structure
because the Ðlm thickness is only of nanometre magnitude.
After UV irradiation, the stability of the Ðlm towards
etching by polar solvents increases dramatically. The un-
irradiated Ðlm was dissolved completely after immersion in
DMF for 5 min, but the irradiated Ðlm showed no changes
after immersion in DMF for 24 h; that is, the absorbance of
the irradiated Ðlm did not exhibit any decrease after immer-
sion in DMF as compared with that before immersion (hence
the UV-vis spectra have been abbreviated). This should
provide evidence that under UV irradiation the H-bonding
structure, which dissociates easily in strong polar solvents,
converts to a covalent bond.
1
2
(a) G. Decher, Science, 1997, 277(5330), 1232; (b) G. Decher, Y.
Lvov and J. Schmitt, T hin Solid Films, 1994, 244, 772; (c) M.
Losche, J. Schmitt, G. Decher, W. G. Bouwman and K. Kjaer,
Macromolecules, 1998, 31, 8893; (d) J. Schmitt, T. Grunewald, G.
Decher, P. S. Pershan, K. Kjaer and M. Losche, Macromolecules,
1
993, 26, 7058.
W. B. Stockton and M. F. Rubner, Macromolecules, 1997, 30,
724.
1
3
4
2
1
L. Y. Wang, Z. Q. Wang, X. Zhang, J. C. Shen, L. F. Chi and H.
Fuchs, Macromol. Rapid Commun., 1997, 18, 509.
15 (a) J. Sun, T. Wu, Y. P. Sun, Z. Wang, X. Zhang, J. Shen and W.
Cao, Chem. Commun., 1998, 1853; (b) J. Y. Chen, L. Huang, L. M.
Ying, G. B. Luo, X. S. Zhao and W. X. Cao, L angmuir, 1999, 15,
7
208.
1
6
M. M. Coleman, J. F. Graf and P. C. Painter, SpeciÐc Inter-
actions and the Miscibility of Polymer Blends, Technomic Publi-
shing Inc., Lancaster, PA, USA, 1991.
Conclusion
1
1
7
8
M. Sulzbacher, J. Appl. Chem., 1951, 3, 95.
M. L. Xiang and M. Jiang, Macromol. Rapid Commun., 1995, 16,
In conclusion, a multilayer ultra-thin self-assembled Ðlm was
fabricated from diazoresin (DR) and poly(4-vinylphenol)
4
77.
1
9
0
H. Luo, B. X. Yang, L. Yang and W. X. Cao, Macromol. Rapid
(
PVPh) via H-bonding interactions. Under irradiation by UV
Commun., 1998, 19, 291.
light the H-bonds between the layers of the Ðlms convert to
covalent bonds. The stability of the Ðlm towards etching by
polar solvents increases strongly after UV irradiation.
2
K. Nakanishi and P. H. Solomon, Infrared Absorption Spectros-
copy (III), HoldenÈDay, Inc., San Francisco, CA, USA, 1977, pp.
19 and 26.
2
1
H. Luo, J. Y. Chen, G. B. Luo, Y. N. Chen and W. X. Cao, Acta
Polym. Sin., 1999, 6, 739 (in Chinese).
Acknowledgements
The authors are grateful to the NSFC (Contract Nos: 297-,
22 J. Y. Chen, C. Zhao, S. G. Cao, R. X. Wang and W. X. Cao, J.
Photochem. Photobiol. A, 1999, 125, 73.
298-74001 and 59633110) for Ðnancial support of this work.
New J. Chem., 2001, 25, 305È307
307