Full text of DOI:10.1063/1.104893

Defect reduction in Ge x Si1−x epitaxy by rapid thermal processing chemical
vapor deposition using a lowtemperature in situ preclean and a Si buffer layer
K. H. Jung, T. Y. Hsieh, and D. L. Kwong
Citation: Applied Physics Letters 58, 2348 (1991); doi: 10.1063/1.104893
View online: http://dx.doi.org/10.1063/1.104893
View Table of Contents: http://scitation.aip.org/content/aip/journal/apl/58/21?ver=pdfcov
Published by the AIP Publishing
Articles you may be interested in
Relaxed, low threading defect density Si0.7Ge0.3 epitaxial layers grown on Si by rapid thermal chemical
vapor deposition
J. Appl. Phys. 75, 263 (1994); 10.1063/1.355894
Boronenhanced lowtemperature Si epitaxy by rapid thermal processing chemical vapor deposition
Appl. Phys. Lett. 61, 474 (1992); 10.1063/1.107861
Lowtemperature chemical vapor deposition of epitaxial Si and SiGe layers at atmospheric pressure
Appl. Phys. Lett. 58, 1286 (1991); 10.1063/1.104338
Dopantenhanced lowtemperature epitaxial growth of in situ doped silicon by rapid thermal processing
chemical vapor deposition
Appl. Phys. Lett. 58, 80 (1991); 10.1063/1.104452
Effect of SiGe buffer layer for lowtemperature Si epitaxial growth on Si substrate by rf plasma chemical
vapor deposition
J. Appl. Phys. 54, 1466 (1983); 10.1063/1.332173
This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
130.88.90.110 On: Tue, 23 Dec 2014 07:52:17

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
30.88.90.110 On: Tue, 23 Dec 2014 07:52:17
1

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
30.88.90.110 On: Tue, 23 Dec 2014 07:52:17
1

This article is copyrighted as indicated in the article. Reuse of AIP content is subject to the terms at: http://scitation.aip.org/termsconditions. Downloaded to IP:
30.88.90.110 On: Tue, 23 Dec 2014 07:52:17
1