Mechanism for selectivity loss during tungsten CVD

Article abstract of DOI:10.1149/1.2096601

We have investigated possible mechanisms for the loss of selectivity (i.e., deposition on silicon dioxide) during tungsten CVD by reduction of tungsten hexafluoride and found strong evidence that selectivity loss is initiated by desorption of tungsten sub

Full text of DOI:10.1149/1.2096601

Downloaded on 2015-06-09 to IP 132.239.1.231 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-09 to IP 132.239.1.231 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-09 to IP 132.239.1.231 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-09 to IP 132.239.1.231 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-09 to IP 132.239.1.231 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-09 to IP 132.239.1.231 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).