SELECTIVE LOW PRESSURE CHEMICAL VAPOR DEPOSITION OF TUNGSTEN.

Article abstract of DOI:10.1149/1.2115864

An examination is made of the kinetics of low pressure chemical vapor deposition of tungsten by the hydrogen and silicon reduction of WF//6 within a pressure range of 0. 1-5 torr and a temperature range of 250 degree -500 degree C. The rate-limiting mechanism for the hydrogen reduction system was determined to be the dissociation of H//2 adsorbed on the surface, with an activation energy of 0. 71 ev. A self-limiting deposit results from the WF//6-Si reaction, the thickness and structure of which are dependent upon the initial native oxide characteristics. Deposition occurs selectively on materials that react directly with WF//6 or yield monatomic hydrogen. In the presence of hydrogen, the degree of selectivity is a function of temperature, substrate material, and surface cleanliness.

Full text of DOI:10.1149/1.2115864

Downloaded on 2015-06-11 to IP 147.188.128.74 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-11 to IP 147.188.128.74 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-11 to IP 147.188.128.74 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-11 to IP 147.188.128.74 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-11 to IP 147.188.128.74 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-11 to IP 147.188.128.74 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-06-11 to IP 147.188.128.74 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).