ELECTRODEPOSITION AND PROPERTIES OF AMORPHOUS CHROMIUM FILMS PREPARED FROM CHROMIC ACID SOLUTIONS.

Article abstract of DOI:10.1149/1.2108653

The addition of organic compounds containing a minus CHO or minus COOH group such as formamide, formaldehyde, glyoxal or formic acid to a chromium electroplating bath results in a chromium deposit which has greatly improved properties compared to conventional chromium deposits. These layers have fewer defects, and the as-deposited, amorphous layers have a Vicker's hardness of about 1000, which is comparable to that of conventional chromium plating deposits. With annealing in air, the hardness goes through a maximum of about 1700 at 500 degree -600 degree C, while the hardness of a conventional plating decreases monotonically from 1000 to 400, with annealing from 200 degree to 800 degree C. X-ray diffraction and differential thermal analysis show that annealing up to about 600 degree C causes formation and growth of chromium crystallites and that chromium carbides form above this temperature.

Full text of DOI:10.1149/1.2108653

Downloaded on 2015-01-08 to IP 132.239.1.230 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-01-08 to IP 132.239.1.230 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-01-08 to IP 132.239.1.230 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-01-08 to IP 132.239.1.230 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).

Downloaded on 2015-01-08 to IP 132.239.1.230 address. Redistribution subject to ECS terms of use (see ecsdl.org/site/terms_use) unless CC License in place (see abstract).