J. Phys. Chem. A 2006, 110, 13479-13486
13479
Decomposition Behavior of M(DPM)n (DPM ) 2,2,6,6-Tetramethyl-3,5-heptanedionato;
n ) 2, 3, 4)
Yinzhu Jiang, Mingfei Liu, Yanyan Wang, Haizheng Song, Jianfeng Gao,* and
Guangyao Meng
USTC Laboratory for Solid State Chemistry & Inorganic Membranes, Department of Materials Science and
Engineering, UniVersity of Science and Technology of China (USTC), Hefei, 230026,
People’s Republic of China
ReceiVed: June 27, 2006; In Final Form: October 3, 2006
The decomposition behavior of M(DPM) (DPM ) 2,2,6,6-tetramethyl-3,5-heptanedionato; M ) Sr, Ba, Cu,
n
Sm, Y, Gd, La, Pr, Fe, Co, Cr, Mn, Ce, Zr; n ) 2-4) was studied in detail with infrared spectroscopy and
mass spectrometry. The results indicated that the chemical bonds in these compounds dissociate generally
following the sequence of C-O > M-O > C-C(CH
decomposition processes of M(DPM) are strongly influenced by the coordination number and central metal
ion radius. In addition, the decomposed products, in air atmosphere, varied from metal oxides to metal
carbonates associated with different M(DPM)
3 3
) > C-C and C-H at elevated temperatures. The
n
n
.
1. Introduction
stability are still extensively used in preparing many kinds of
materials such as YBCO, CYO, SCYO, YSZ, SDC, and Pd-
Metal-organic chemical vapor deposition (MOCVD), clas-
1,8-10
Pa alloy.
sified according to the use of metallorganics as precursors, is a
well-established, versatile, and widely applied method for
fabricating technologically important thin films, ranging from
metals to semiconductors, insulators, and superconductors with
tailored properties.1 In general, metallorganic precursors
possess lower decomposition or pyrolysis temperatures than
halides, hydrides, or halohydrides. Thus, these advantages enable
the MOCVD process to occur at a lower deposition temperature
than conventional chemical vapor deposition (CVD), which
generally uses halides or hydrides as precursors.4
Knowledge of the decomposition mechanism of metal
complexes, particularly the sequence of the bond dissociation
in the ligand, is of great importance for two reasons. First, it
could provide basic information required to guide us in designing
new metallorganic compounds by modifying the primary ligand
structures to improve its physical properties and/or decomposi-
tion behavior. For instance, in Ba(DPM)2 and Sr(DPM)2, H2O
can coordinate to the highly positively charged metal center to
form oligomeric oxygen/hydroxide bridged structures, such as
-3
11
Ba5(DPM)9(OH)3H2O and Sr2(DPM)3. In this case, the intro-
duction of fluorine and/or bulky ligand groups into the â-dike-
tonate ligand reduces the net positive charge on the metal center,
rendering the compound less sensitive to O2/H2O. Alternatively,
the metal center can be saturated with a polydentate coordinating
ligand, such as polyethers (CH3O(CH2CH2O)nCH3). These form
relatively stable complexes with fluorinated â-diketonates of
the type M(hfac)2(polyether) (M ) Ba, Sr, Ca; polyether )
There are three kinds of metallorganic precursors utilized
commonly in MOCVD processes: metal â-diketonates, metal
alkoxides, and metal alkyls. Metal â-diketonates have been
widely applied in fabrication of electroceramic oxides films,
such as high-Tc superconductors, ferromagnetics, ferroelectrics,
conducting oxide layers, electrochemical devices, high-k di-
electrics, giant magnetoresistant (GMR) oxides, buffer layers,
and alloy thin films.1 â-Diketonate complexes used mainly
include M(DPM)n (DPM ) dipivaloylmethanate ) 2,2,6,6-
tetramethyl-3,5-heptanedionato), M(ACAC)n (ACAC ) 2,4-
,5
1
2
tetraglyme, triglyme), which have higher vapor pressures and
higher ambient stabilities than M(DPM)2 complexes.
6
Second, the information about precursor decomposition
behavior would guide us in optimizing MOCVD process
conditions for obtaining a film of desired properties. Examples
are Mn(DPM)3 and La(DPM)3, of which Nakamura et al. studied
the decomposition mechanism through spectroscopic absorption
pentanedione), M(HFA)n (HFA ) 1,1,1,5,5,5-hexafluoropentane-
7
2
3
,4-dionate), M(DFHD)n(DFHD)1,1,1,2,2,6,6,7,7,7-decafluoro-
3
,5-heptanedione), et al. In comparison with the other kinds
of metallorganic precursors, one of the advantages of metal
â-diketonates is that their physical and chemical properties can
1
3-15
1
spectroscopy.
Meanwhile, the results effectively guide the
be altered by “tailoring” the â-diketonate group. Among these
deposition of lanthanum oxide films and manganese oxide films
in a liquid delivery MOCVD process.
â-diketonate complexes, chelates with large steric hindrance
ligands, such as M(DPM)n, possess somewhat lower volatility
than ones with fluorine. However, the latter is always expensive
and produces toxic gas, which may contaminate the as-deposited
films. Up to today, M(DPM)n, nontoxic, nonfluorinated and
environmentally benign compounds with sufficient volatility and
In the present study, the decomposition behavior of a series
of tris-, bis-, and tetra(dipivaloylmethanate) metal chelates,
where the metals complexed were Sr, Ba, Cu, Sm, Y, Gd, La,
Pr, Fe, Co, Cr, Mn, Ce, and Zr, were systematically studied by
infrared spectroscopy and mass spectrometry. Their possible
decomposition mechanisms and influencing factors were pro-
posed and discussed.
*
Corresponding author. Telephone: +86-551-3601700. Fax: +86-551-
3
607627. E-mail: jfgao@ustc.edu.cn.
1
0.1021/jp064010j CCC: $33.50 © 2006 American Chemical Society
Published on Web 11/24/2006