Tris(dimethylamino)silane

Base Information

Chemical Name:Tris(dimethylamino)silane
CAS No.:15112-89-7
Molecular Formula:C6H19 N3 Si
Molecular Weight:161.322
Hs Code.:2931900090
European Community (EC) Number:239-165-0
DSSTox Substance ID:DTXSID00884786
Mol file:15112-89-7.mol

Synonyms:tris(dimethylamino)silane

Suppliers and Price of Tris(dimethylamino)silane

Supply Marketing:

Business phase:: The product has achieved commercial mass production^*data from LookChem market partment

Manufacturers and distributors:

Manufacture/Brand
Chemicals and raw materials
Packaging
price

Strem Chemicals
Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM
25g
$ 158.00

Strem Chemicals
Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM
5g
$ 56.00

Strem Chemicals
Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM, 14-8750, contained in 50 ml Swagelok(R) cylinder (96-1070) for CVD/ALD
25g
$ 780.00

Sigma-Aldrich
Tris(dimethylamino)silane packaged for use in deposition systems
25g
$ 826.00

Sigma-Aldrich
Tris(dimethylamino)silane electronic grade, 99.999%
25g
$ 177.00

American Custom Chemicals Corporation
TRIS(DIMETHYLAMINO)SILANE 95.00%
25G
$ 1380.11

American Custom Chemicals Corporation
TRIS(DIMETHYLAMINO)SILANE 95.00%
10G
$ 628.00

Total 40 raw suppliers

Chemical Property of Tris(dimethylamino)silane

Chemical Property:

Appearance/Colour:colorless liq.
Melting Point:<0°C
Refractive Index:1.4247
Boiling Point:139.8 °C at 760 mmHg
PKA:10.93±0.70(Predicted)
Flash Point:38.4 °C
PSA：9.72000
Density:0,838 g/cm³
LogP:-0.61160
Sensitive.:air sensitive, moisture sensitiv
Hydrogen Bond Donor Count:0
Hydrogen Bond Acceptor Count:3
Rotatable Bond Count:3
Exact Mass:160.126999121
Heavy Atom Count:10
Complexity:74

Purity/Quality:

99%, ^*data from raw suppliers

Tris(dimethylamino)silane, 99+%, 3DMAS (99.999%-Si) PURATREM ^*data from reagent suppliers

Safty Information:

Pictogram(s): F,C
Hazard Codes:F,C
Statements: 10-36/37/38-52/53-34-29-20-15-11
Safety Statements: 16-26-36/37/39-45-43

MSDS Files:: SDS file from LookChem

Useful:

Canonical SMILES:CN(C)[Si](N(C)C)N(C)C
Uses Tris(dimethylamino)silane (TDMAS) is used as an organosilicon source for the deposition of Si oxynitride; carbonitride; nitride and oxide thin films. It is also used to form multicomponent silicon containing thin films. The depositions can be carried out at low substrate temperatures (<150). The melting point and vapor pressure of TDMAS is in a suitable working range; thus making it a very good vapor deposition precursor.

Technology Process of Tris(dimethylamino)silane

There total 9 articles about Tris(dimethylamino)silane which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 95.0%