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Ethylger-manium

Base Information
  • Chemical Name:Ethylger-manium
  • CAS No.:1747-99-5
  • Molecular Formula:C2H8Ge
  • Molecular Weight:104.676
  • Hs Code.:
  • DSSTox Substance ID:DTXSID90169892
  • Mol file:1747-99-5.mol
Ethylger-manium

Synonyms:ethylger-manium;DTXSID90169892

Suppliers and Price of Ethylger-manium
Supply Marketing:
Business phase:
The product has achieved commercial mass production*data from LookChem market partment
Manufacturers and distributors:
  • Manufacture/Brand
  • Chemicals and raw materials
  • Packaging
  • price
Total 7 raw suppliers
Chemical Property of Ethylger-manium
Chemical Property:
  • Boiling Point:°Cat760mmHg 
  • Flash Point:°C 
  • PSA:0.00000 
  • Density:g/cm3 
  • LogP:0.93060 
  • Hydrogen Bond Donor Count:0
  • Hydrogen Bond Acceptor Count:0
  • Rotatable Bond Count:0
  • Exact Mass:102.9603029
  • Heavy Atom Count:3
  • Complexity:2.8
Purity/Quality:

99% *data from raw suppliers

Safty Information:
  • Pictogram(s):  
  • Hazard Codes: 
MSDS Files:

SDS file from LookChem

Useful:
  • Canonical SMILES:CC[Ge]
Technology Process of Ethylger-manium

There total 1 articles about Ethylger-manium which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:
Guidance literature:
In gas; byproducts: ethane, ethene; Irradiation (UV/VIS); laser-induced photolytic chemical vapour deposition (LPCVD) of (C2H5)2GeH2 (2.7 kPa) at 193 nm and deposition of Ge on a reactor NaCl window;; IR and energy-dispersive X-ray spectroscopy;;
DOI:10.1039/ft9928801637
Guidance literature:
In gas; byproducts: ethane, ethene; Irradiation (UV/VIS); laser-induced photolytic chemical vapour deposition (LPCVD) of (C2H5)GeH3 (2.5 kPa) at 193 nm and deposition of Ge on a reactor NaCl window;; IR and energy-dispersive X-ray spectroscopy; further byproducts;;
DOI:10.1039/ft9928801637
Guidance literature:
With sulfur(VI) hexafluoride; In gas; at various pressures of SF6 and 297-564°C; gas chromy; Kinetics;
DOI:10.1021/jp0661948
upstream raw materials:

diethylgermane

Downstream raw materials:

germanium

germane

Ethyldigerman

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