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Hafnium oxide

Base Information Edit
  • Chemical Name:Hafnium oxide
  • CAS No.:12055-23-1
  • Deprecated CAS:939428-39-4,939429-00-2,597552-83-5,37230-85-6,939429-00-2
  • Molecular Formula:HfO2
  • Molecular Weight:210.489
  • Hs Code.:28259085
  • European Community (EC) Number:235-013-2
  • NSC Number:158931
  • DSSTox Substance ID:DTXSID70893204
  • Wikipedia:Hafnium(IV) oxide,Hafnium dioxide,Hafnium(IV)_oxide
  • Wikidata:Q418740
  • Mol file:12055-23-1.mol
Hafnium oxide

Synonyms:12055-23-1;Hafnium(IV) oxide;Hafnium oxide (HfO2);dioxohafnium;Hafnium dioxide;Hafnia;MFCD00003565;Hafnotrast;Hafnia (HfO2);Hafnium Oxide Powder;Hafnium dioxide HfO2;Hafnium dioxide (HfO2);Hafnium(IV) Oxide, Lump;UNII-3C4Z4KG52T;Niobium Carbide (NbC) Powder;DTXSID70893204;Hafnium(IV) oxide, powder, 98%;EINECS 235-013-2;Hafnium(IV) oxide, >=99.95%;NSC158931;AKOS015903694;NSC 158931;Hafnium(IV) oxide, Spectrographic Grade;CS-0198879;D95076;EC 235-013-2;Q418740;Hafnium(IV) oxide, pellets, diam. x thickness 13 mm x 5 mm;Hafnium(IV) oxide, pellets, diam. x thickness 9 mm x 4.2 mm;Hafnium(IV) oxide sputtering target, 101.4mm (4.0in) dia x 6.35mm (0.25in) thick

Suppliers and Price of Hafnium oxide
Supply Marketing:Edit
Business phase:
The product has achieved commercial mass production*data from LookChem market partment
Manufacturers and distributors:
  • Manufacture/Brand
  • Chemicals and raw materials
  • Packaging
  • price
  • Strem Chemicals
  • Hafnium(IV) oxide (99.995%-Hf, <0.15% Zr) PURATREM
  • 1g
  • $ 121.00
  • Strem Chemicals
  • Hafnium(IV) oxide, 98%
  • 10g
  • $ 38.00
  • Strem Chemicals
  • Hafnium(IV) oxide (99.995%-Hf, <0.15% Zr) PURATREM
  • 5g
  • $ 455.00
  • Strem Chemicals
  • Hafnium(IV) oxide, 98%
  • 50g
  • $ 152.00
  • Sigma-Aldrich
  • Hafnium(IV) oxide powder, 98%
  • 100g
  • $ 237.00
  • Sigma-Aldrich
  • Hafnium(IV) oxide pellets, diam. × thickness 9 mm × 4.2 mm
  • 25g
  • $ 183.00
  • Sigma-Aldrich
  • Hafnium(IV) oxide powder, 98%
  • 25g
  • $ 78.10
  • Sigma-Aldrich
  • Hafnium(IV) oxide pellets, diam. × thickness 13 mm × 5 mm
  • 25g
  • $ 143.00
  • Sigma-Aldrich
  • Hafnium(IV) oxide ≥99.95%
  • 1g
  • $ 142.00
  • ProChem
  • Hafnium (IV) Oxide, lump 97%
  • 100 gm
  • $ 105.00
Total 60 raw suppliers
Chemical Property of Hafnium oxide Edit
Chemical Property:
  • Appearance/Colour:powder 
  • Melting Point:2810 °C 
  • Refractive Index:2.13 (1700 nm) 
  • PSA:34.14000 
  • Density:9.68 g/mL at 25 °C(lit.) 
  • LogP:-0.23760 
  • Water Solubility.:Insoluble in water. 
  • Hydrogen Bond Donor Count:0
  • Hydrogen Bond Acceptor Count:2
  • Rotatable Bond Count:0
  • Exact Mass:211.93639
  • Heavy Atom Count:3
  • Complexity:18.3
Purity/Quality:

98%-99.99% *data from raw suppliers

Hafnium(IV) oxide (99.995%-Hf, <0.15% Zr) PURATREM *data from reagent suppliers

Safty Information:
  • Pictogram(s):  
  • Hazard Codes: 
  • Safety Statements: 22-24/25 
MSDS Files:

SDS file from LookChem

Total 1 MSDS from other Authors

Useful:
  • Chemical Classes:Metals -> Metals, Inorganic Compounds
  • Canonical SMILES:O=[Hf]=O
  • Physical Properties White crystalline solid, when heated at 1,500°C, it transforms into a tetragonal modification with shrinkage; tetragonal form converts to a cubic polymorph with fluorite structure when heated at 2,700°C; density 9.68 g/cm3; melts at 2,774°C; insoluble in water; dissolves slowly in hydrofluoric acid at ordinary temperatures.
  • Uses Hafnium dioxide is a high temperature refractory material. It is used for control rods in nuclear reactors. It has high stability and high thermal neutron absorption values. It also is used in special optical glasses and glazes. Hafnium(IV) oxide is used as Intermediates, Paint additives and coating additives, metal Products. And it is also used in optical coatings, as a refractory material in the insulation of such devices as thermocouples.
  • Description Hafnium is a shiny, silvery, ductile metal and resistant to corrosion. The physical properties of hafnium metal samples are markedly affected by zirconium impurities, especially the nuclear properties, as these two elements are among the most difficult to separate because of their chemical similarity. Hafnia is used in optical coatings and as a high-k dielectric in dynamic randomaccess memory (DRAM) capacitors. Hafnium (IV) oxide is a colourless, inert solid and has been reported as one of the most common and stable compounds of hafnium. It is an electrical insulator. Hafnium dioxide is an intermediate in some processes that give hafnium metal. It reacts with strong acids and strong bases. It dissolves slowly in hydrofluoric acid. At high temperatures, it reacts with chlorine in the presence of graphite or carbon tetrachloride and forms the hafnium tetrachloride. Hafnium-based oxides are currently important materials to replace silicon oxide as a gate insulator because of its high dielectric constant. Hafnium (Hf) is found in association with zirconium ores, production based on zircon (ZrSiO4) concentrates which contain 0.5%–2% hafnium. Hafnium has extensive applications in industries especially because of its resistance to corrosion. Different compounds of hafnium used in ceramics industry are hafnium boride, hafnium carbide, hafnium nitride, hafnium oxide, hafnium silicate, and hafnium titanate. Hafnium-based oxides are currently leading candidates to replace silicon oxide as a gate insulator in fieldeffect transistors. The compound appears to have been chosen by both IBM and Intel as a substrate for future integrated circuits, where it may help in the continuing effort
Technology Process of Hafnium oxide

There total 2 articles about Hafnium oxide which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:
Guidance literature:
In gaseous matrix; laser-ablated Hf atoms were reacted with H2O2 molecules in excess argon during condensation onto a 10 K cesium iodide window; Andrews, L. Chem. Soc. Rev., 2004, 33, 123; detected by IR spectra;
DOI:10.1021/ic050614a
Guidance literature:
In gaseous matrix; byproducts: HfH4; other Radiation; laser-ablated Hf atoms were reacted with H2 and O2 molecules in excess argon full-arc irradiation and annealin to 24-30 K; Andrews, L. Chem. Soc. Rev., 2004, 33, 123; detected by IR spectra;
DOI:10.1021/ic050614a
upstream raw materials:

urea hydrogen peroxide adduct

hydrogen

oxygen

Downstream raw materials:

bis(phenyl) carbonate

Refernces Edit
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