Dichlorosilylene

Base Information Edit

Chemical Name:Dichlorosilylene
CAS No.:4109-96-0
Deprecated CAS:438546-17-9
Molecular Formula:Cl2H2Si
Molecular Weight:101.007
Hs Code.:
UNII:WFA4RBW3D3
DSSTox Substance ID:DTXSID1052082
Mol file:4109-96-0.mol

Synonyms:13569-32-9;Dichlorosilylene;silicon dichloride;Silylene dichloride;Silylene, dichloro-;WFA4RBW3D3;Silano, dicloro-;SiCl2;Cl2H2Si;UNII-WFA4RBW3D3;Cl2-H2-Si;Dichlorosilane [Silane, dichloro-];MFCD00011600;NA2189;AKOS015915857;Dichlorosilane [UN2189] [Poison gas];LS-145167;FT-0694948

Suppliers and Price of Dichlorosilylene

Supply Marketing:Edit

Business phase:: The product has achieved commercial mass production^*data from LookChem market partment

Manufacturers and distributors:

Manufacture/Brand
Chemicals and raw materials
Packaging
price

Total 28 raw suppliers

Chemical Property of Dichlorosilylene Edit

Chemical Property:

Appearance/Colour:colourless gas
Vapor Pressure:1254 mm Hg ( 20 °C)
Melting Point:-122 °C(lit.)
Boiling Point:8.3 °C at 760 mmHg
Flash Point:-37°C
PSA：0.00000
Density:1,22 g/cm3
LogP:0.46280
Water Solubility.:decomposes
Hydrogen Bond Donor Count:0
Hydrogen Bond Acceptor Count:0
Rotatable Bond Count:0
Exact Mass:97.9146319
Heavy Atom Count:3
Complexity:2.8

Purity/Quality:: 99.9% ^*data from raw suppliers

Safty Information:

Pictogram(s): F+,T
Hazard Codes:F+,T
Statements: 12-14-23-34
Safety Statements: 26-36/37/39-45

MSDS Files:: SDS file from LookChem

Useful:

Canonical SMILES:[Si](Cl)Cl
description Dichlorosilane is a highly flammable, corrosive, and toxic gas at room temperature and atmospheric pressure. It causes severe bums on contact with eyes, skin, and mucous membranes. With water or moisture, it hydrolyzes rapidly to yield silica and silicon oxyhydride along with hydrochloric acid. It is shipped as a liquefied gas in low pressure cylinders at its vapor pressure of 9.1 psig (62.7 kPa) at 70°F (21.1 0q. It can form flammable mixtures with air and oxidizing agents.
Uses Dichlorosilane is primarily used in the electronics industry for such applications as growth of epitaxial or polycrystalline silicon and chemical vapor deposition of silicon dioxide and silicon nitride. It is an outstanding material for epitaxial deposition. Its silicon content by weight is greater than either trichlorosilane or silicon tetrachloride. Dichlorosilane deposits silicon more efficiently and at lower temperatures than the other chlorosilanes in epitaxial reactors. Dichlorosilane significantly lowers the processing time from that required with silane for deposi- tion of thick layers at reduced temperatures. The deposition rate of dichlorosilane does not vary appreciably with minor temperature changes inside the reactor, therefore substantially lowering the rejection rate by reducing variations in layer thickness and degree of taper. Since the deposition rate of dichlorosilane is not as temperature sensitive as that of other chlorosilanes, the rate is controlled by adjusting the dichlorosilane concentration in the hydrogen feedstream. Dichlorosilane is primarily used in the electronics industry for such applications as growth of epitaxial or polycrystalline silicon and chemical vapor deposition of silicon dioxide and silicon nitride.
Description Dichlorosilane is a highly flammable, corrosive, and toxic gas at room temperature and atmospheric pressure. It causes severe bums on contact with eyes, skin, and mucous membranes. With water or moisture, it hydrolyzes rapidly to yield silica and silicon oxyhydride along with hydrochloric acid. It is shipped as a liquefied gas in low pressure cylinders at its vapor pressure of 9.1 psig (62.7 kPa) at 70°F (21.1℃. It can form flammable mixtures with air and oxidizing agents.

Technology Process of Dichlorosilylene

There total 56 articles about Dichlorosilylene which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield:

: 10026-04-7,53609-55-5
tetrachlorosilane

: 1631-73-8
trimethylstannane

: 10025-78-2
trichlorosilane

: 1066-45-1
trimethyltin(IV)chloride

: 7440-21-3
monosilane

: 4109-96-0
Dichlorosilane

Guidance literature:: In neat (no solvent); inert atmosphere (N2, Ar or high vac.), room temperature, equimolar amts. of halosilane/tinhydride, reactn. time 36 h; not isolated; IR spectroscopy (identified 25-30% SiCl3H, 15% SiCl2H2 and 10% SiH4 in product mixt.);