Trichlorosilane

Base Information

• Chemical Name: Trichlorosilane
• CAS No.: 10025-78-2
• Molecular Formula: Cl3HSi
• Molecular Weight: 135.452
• Hs Code.: 28530090
• European Community (EC) Number: 233-042-5
• ICSC Number: 0591
• UN Number: 1295
• Nikkaji Number: J8.976A
• Wikipedia: Trichlorosilane
• Wikidata: Q419041
• Mol file: 10025-78-2.mol

Synonyms:trichlorosilane

Chemical Property of Trichlorosilane

Chemical Property:

• Appearance/Colour: Clear liquid
• Vapor Pressure: 9.75 psi ( 20 °C)
• Melting Point: -127 °C
• Refractive Index: 1.4-1.402
• Boiling Point: 31.8 °C at 760 mmHg
• Flash Point: -27 °C
• PSA: 0.00000
• Density: 1.34 g/cm³
• LogP: 1.42000
• Storage Temp.: Refrigerator
• Sensitive.: Air & Moisture Sensitive
• Solubility.: Soluble in benzene, ether, heptane, chloroform and carbon tetrac
• Water Solubility.: decomposes
• Hydrogen Bond Donor Count: 0
• Hydrogen Bond Acceptor Count: 0
• Rotatable Bond Count: 0
• Exact Mass: 133.891310
• Heavy Atom Count: 4
• Complexity: 8
• Transport DOT Label: Dangerous When Wet Flammable Liquid Corrosive

Purity/Quality:

99% ^*data from raw suppliers

Trichlorosilane ^*data from reagent suppliers

Safty Information:

• Pictogram(s): F+,C
• Hazard Codes: F+,C
• Statements: 12-14-17-20/22-29-35
• Safety Statements: 16-26-36/37/39-43-45-7/9-43A

MSDS Files:

SDS file from LookChem

Total 1 MSDS from other Authors

Useful:

• Chemical Classes: Toxic Gases & Vapors -> Chlorosilanes
• Canonical SMILES: [SiH](Cl)(Cl)Cl
• Inhalation Risk: No indication can be given about the rate at which a harmful concentration of this substance in the air is reached on evaporation at 20 °C.
• Effects of Short Term Exposure: The substance is corrosive to the eyes, skin and respiratory tract. Corrosive on ingestion. Inhalation of the vapour may cause lung oedema. Inhalation may cause asthma-like reactions. Exposure could cause death. Medical observation is indicated.
• Uses: It can be used the raw material for polymer organic silicon compound, it can also be used in industrial instrumentation. It can be used the raw material for producing organic silicon compound, it is also the basic raw material of production polysilicon. In organic synthesis. Trichlorosilane is used in process of hydrosilylation. It is also used for reductive hydrazination which is a high yielding method for preparation of 1,1-disubstituted hydrazines.
• Production method: The method of boiling chlorination Silicon powder after dried is added into boiling chloride furnace, and reacts with dry hydrogen chloride gas which passes into the furnace of at 340 ℃. The generated crude trichlorosilane goes through the wet dust collector, condenser tube and comes into distillation column to separate silicon tetrachloride, trichlorosilane gas from the distillation column is condensed to obtain finished trichlorosilane. Si + 3HCl → SiHCl3 + H2

Technology Process of Trichlorosilane

There total 118 articles about Trichlorosilane which guide to synthetic route it. The literature collected by LookChem mainly comes from the sharing of users and the free literature resources found by Internet computing technology. We keep the original model of the professional version of literature to make it easier and faster for users to retrieve and use. At the same time, we analyze and calculate the most feasible synthesis route with the highest yield for your reference as below:

synthetic route:

Reference yield: 72.9%

tetrachlorosilane (10026-04-7,53609-55-5) + hydrogen (1333-74-0) → trichlorosilane (10025-78-2)

Guidance literature:

In neat (no solvent); SiCl4 reacted with H2 in thermo-plasma at 50 kW at 3500-5000 K;

DOI:10.1134/S0020168510030076

Reference yield: 6.14%

tetrachlorosilane (10026-04-7,53609-55-5) + hydrogen (1333-74-0) + silicon (7440-21-3) → trichlorosilane (10025-78-2)

Guidance literature:

copper(l) chloride; at 525 ℃; Product distribution / selectivity;

Reference yield:

1,2-Dichloropropane (26198-63-0,78-87-5) → tetrachlorosilane (10026-04-7,53609-55-5) + allyltrichlorosilane (107-37-9) + 1,2-bis-trichlorosilanyl-propane (18171-37-4) + trichlorosilane (10025-78-2)

Guidance literature:

at 300 ℃; Produkt 5: 2-Dichlorsilyl-1-trichlorsilyl-propan;

upstream raw materials:

1,2-Dichloropropane

chloroform

hydrogenchloride

tetrachlorosilane

Downstream raw materials:

2-(chloromethyl)-3-(trichlorosilyl)propene

2-(Dichlorosilanyl-diphenyl-methyl)-pyridine

(E)-1-phenyl-2-trichlorosilylethene

2-trichlorosilylethylpyridine

Refernces

• 1、 Hurd, D. T.. "-". . p. 1545 - 1548. Retrieved 1945.
• 2、 Wu, Qingyou,Chen, Hanbin,Li, Yuliang,Tao, Xumei,Huang, Zhijun,Shang, Shuyong,Yin, Yongxiang,Dai, Xiaoyan. "Preparation of trichlorosilane from hydrogenation of silicon tetrachloride in thermal plasma". . p. 251 - 254. Retrieved 2010.
• 3、 Taylor, A. G.,Walden, B. V. de G.. "-". . p. 842 - 843. Retrieved 1944.
• 4、 Oehme, H.,Weiss, H.. "REACTION OF 2,4,6-TRI-t-BUTYLPHENYLLITHIUM WITH BROMOTRICHLOROSILANE. GENERATION OF TRICHLOROSILYLLITHIUM, LiSiCl3". . p. C16 - C18. Retrieved 1987.
• 5、 Acker, J?rg,Bohmhammel, Klaus. "Compensation effect in trichlorosilane synthesis". . p. 151 - 157. Retrieved 2003.
• 6、 Raml, Walter,Hengge, Edwin. "The Amine Catalysed Cleavage of Oligochloropolysilanes with HCl". . p. 29 - 36. Retrieved 1980.
• 7、 Thorshaug, Knut,Swang, Ole,Dahl, Ivar M.,Olafsen, Anja. "An experimental and theoretical study of spin-spin coupling in chlorosilanes". . p. 9801 - 9804. Retrieved 2006.
• 8、 Acker, Joì?rg,Bohmhammel, Klaus. "Reactivity of intermetallic compounds: A solid state approach to direct reactions of silicon". . p. 5105 - 5117. Retrieved 2002.
• 9、 Moore, C. B.,Biedrzycki, J.,Lampe, F. W.. "Infrared Laser Photochemistry of SiH4-HCl Mixtures". . p. 7761 - 7765. Retrieved 1984.