22041-18-5Relevant academic research and scientific papers
COMPOUNDS USEFUL IN HIV THERAPY
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Page/Page column 43, (2019/05/22)
The invention relates to compounds of Formulas (I), (II) and (III) salts thereof, pharmaceutical compositions thereof, as well as methods of treating, curing or preventing HIV in subjects.
Reaction of methyl diazoacetate with amines catalyzed by Ru 2(OAc)4Cl
Maidanova,Bakeeva,Sultanova,Biglova,Dokichev
experimental part, p. 1461 - 1465 (2011/03/17)
Reactions of primary and secondary amines with methyl diazoacetate in the presence of Ru2(OAc)4Cl gave the corresponding N-substituted glycine methyl esters in almost quantitative yield. Catalytic decomposition of methyl diazoacetate
POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
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, (2010/04/23)
A positive resist composition comprises (A) a resin component which becomes soluble in an alkaline developer under the action of an acid and (B) an acid generator. The resin (A) is a polymer comprising recurring units containing a non-leaving hydroxyl group represented by formula (1) wherein R1 is H, methyl or trifluoromethyl, X is a single bond or methylene, m is 1 or 2, and the hydroxyl group attaches to a secondary carbon atom. The composition is improved in resolution when processed by lithography.
NK1 and NK3 antagonists
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Page/Page column 27, (2010/02/14)
The invention is to a compound exhibiting neurokinin inhibitory properties, a pharmaceutical composition comprising same and a method of treatment for neurokinin-mediated conditions.
Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process
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, (2008/06/13)
Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.
Amine compounds, resist compositions and patterning process
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, (2008/06/13)
Novel amine compounds having a nitrogen-containing cyclic structure and a hydrating group such as a hydroxy, ether, ester, carbonyl, carbonate group or lactone ring are useful for use in resist compositions for preventing a resist film from thinning and also for enhancing the resolution and focus margin of resist.
An unexpected photoadduct of N-carbomethoxymethylpyrrolidine with a chiral butenolide and benzophenone: X-ray structure and synthetic utility
Santiago De Alvarenga, Elson,Cardin, Christine J.,Mann, John
, p. 1457 - 1466 (2007/10/03)
The regio- and stereoselective photoinduced addition of N-carbomethoxymethylpyrrolidine to 5(S)-tert-butyldimethylsiloxymethyl-furan-2(5H)-one in the presence of benzophenone yields 3(R)-[N-diphenylhydroxymethyl)carbomethoxymethylpyrrolidin- 2'-yl]-4(S)-tert-butyldimethylsiloxymethyl)-butan-4-olides (epimeric at C-2'), and we report the X-ray structure of the major adduct together with its conversion into the 1-azabicyclo[4.3.0]-nonane ring system.
New indium-mediated reactions of enamines
Bossard, Fabienne,Dambrin, Valery,Lintanf, Valeie,Beuchet, Pierre,Mosset, Paul
, p. 6055 - 6058 (2007/10/02)
New reactions of enamines were observed with allyl bromide or methyl bromoacetate in the presence of indium powder in THF, yielding respectively homoallylamines and β-aminoesters.
